A method of manufacturing semiconductor arrays is provided. A method of manufacturing semiconductor arrays may comprise applying a functionalization layer to a semiconductor wafer surface, depositing probes on the functionalized semiconductor wafer surface, and processing the printed semiconductor wafer into individual semiconductor arrays. The wafer processing steps and array finishing steps may be performed following functionalization and probe deposition in a manner that preserves the integrity of the probes.

An article having a surface treated to provide a protective coating structure in accordance with the following method: vapor depositing a first layer on a substrate, wherein the first layer is a metal oxide adhesion layer selected from the group consisting of an oxide of a Group IIIA metal element, a Group IVB metal element, a Group VB metal element, and combinations thereof; vapor depositing a second layer upon the first layer, wherein the second layer includes a silicon-containing layer selected from the group consisting of silicon oxide, silicon nitride, and silicon oxynitride; and vapor depositing a third layer upon the second layer, wherein the third layer is a functional organic-comprising layer, wherein the functional organic-comprising layer is a SAM.

A microfluidic product utilizing gradient surface energy coatings for fluid control comprising a plurality of fluid passages wherein at least one fluid passage comprises a coating configured to control liquid flow wherein the coating configured to control liquid flow comprises a gradient surface energy coating from a proximal location to a distal location on a surface of the fluid passage. The product can include uniform regions and surface gradient regions in the same passage. Coating compositions and product dimensions can be selected to provide control over different flow properties including fluid velocity, reduction and acceleration of fluid flow, and starting and stopping fluid flow.

The present invention provides a functional film having an optical functional layer that exhibits an optical function and is capable of suppressing deterioration of the optical functional layer, and a method thereof. The functional film includes an optical functional layer, a resin layer which surrounds end surfaces of the optical functional layer, and gas barrier supports between which the optical functional layer and the resin layer are sandwiched, in which an oxygen permeability of the resin layer is 10 cc/(m.sup.2.Math.day.Math.atm) or less, and a difference between a thickness of the optical functional layer and the resin layer is within 30%; and a production method including forming a frame-shaped resin layer on a surface of a first gas barrier support, filling the inside of the frame with a polymerizable composition which becomes an optical functional layer, laminating a second gas barrier support on the resin layer, and curing the polymerizable composition.

Devices, systems and techniques are described for producing and implementing articles and materials having nano-scale and microscale structures that exhibit superhydrophobic, superoleophobic or omniphobic surface properties and other enhanced properties. In one aspect, a surface nanostructure can be formed by adding a silicon-containing buffer layer such as silicon, silicon oxide or silicon nitride layer, followed by metal film deposition and heating to convert the metal film into balled-up, discrete islands to form an etch mask. The buffer layer can be etched using the etch mask to create an array of pillar structures underneath the etch mask, in which the pillar structures have a shape that includes cylinders, negatively tapered rods, or cones and are vertically aligned. In another aspect, a method of fabricating microscale or nanoscale polymer or metal structures on a substrate is made by photolithography and/or nano imprinting lithography.

One embodiment of the invention provides: a microchip including a sample collection section and an analysis section, in which the sample collection section and the analysis section are imparted with both hydrophilicity and a positively-charged layer; an analysis system including the microchip; and a method of producing the microchip. The microchip includes: a sample collection section for collecting a sample; and an analysis section for analyzing the sample. In the microchip, a cationic polymer bonded with a hydrophilization substance is immobilized on inner walls of the sample collection section and the analysis section.

In biosciences and related fields, it can be useful to modify surfaces of apparatuses, devices, and materials that contact biomaterials such as biomolecules and biological micro-objects. Described herein are surface modifying and surface functionalizing reagents, preparation thereof, and methods for modifying surfaces to provide improved or altered performance with biomaterials.

A roughened silicon surface is formed by a process including repetitively performed roughening cycles. Each roughening cycles including a step for depositing a non-planar polymeric layer over an area of a silicon body and a step for plasma etching the polymeric layer and the area of the silicon body etch in a non-unidirectional way. As a result, a surface portion of the silicon body is removed, in a non-uniform way, to a depth not greater than 10 nm.

Systems and methods for forming an electrostatic MEMS switch that is used to switch a source of current or voltage. At least one surface of the MEMS switch may be rotated on approach to another substrate, such that when the surfaces are separated, the forces are shearing forces rather than static frictional forces.

A microelectromechanical systems (MEMS) structure includes a substrate, an epitaxial polysilicon cap located above the substrate, a first cavity portion defined between the substrate and the epitaxial polysilicon cap, and a first graphene component having at least one graphene surface immediately adjacent to the first cavity portion.