Method for manufacturing a horology component, including manufacturing (E1) a first structure (10) from a first photosensitive resin (31) having at least one layer of photosensitive resin having a first pattern obtained by polymerizing the first photosensitive resin by irradiation through at least one mask (4), then developing the first photosensitive resin; and transforming (E2) the first structure (10) into a second structure (1) by structuring at least one surface of the first structure by the addition of a second photosensitive resin (32) to the at least one surface, the second structure (1) being intended to at least partially form a manufacturing mold for the horology component.

Method for manufacturing a master pattern for a mold for a horology component, wherein the method includes manufacturing a first structure from a first photosensitive resin comprising at least one layer of photosensitive resin comprising a first pattern obtained by polymerizing the first photosensitive resin by irradiation through at least one mask, then developing the first photosensitive resin; and transforming the first structure into a second structure by structuring at least one surface of the first structure by the addition of a second photosensitive resin to the at least one surface.

A method of transfer printing comprises globally heating an array of stamps, where each stamp comprises a shape memory polymer with a light absorbing agent dispersed therein, and pressing the array of stamps to a donor substrate comprising a plurality of inks. Each stamp is thereby compressed from an undeformed adhesion-off configuration to a deformed adhesion-on configuration. The array of stamps is then cooled to rigidize the shape memory polymer and bind the plurality of inks to the stamps in the deformed adhesion-on configuration. The plurality of inks remain bound to the stamps while the array of stamps is positioned in proximity with a receiving substrate. A selected stamp in the array is then locally heated using a concentrated light source. The selected stamp returns to the undeformed adhesion-off configuration, and the ink bound to the selected stamp is released and transfer printed onto the receiving substrate.

Method of manufacturing a micromechanical component intended to cooperate with another micromechanical component, the method comprising the steps of providing a substrate, forming a mould on said substrate, said mould defining sidewalls arranged to delimit said micromechanical component, providing particles on at least said sidewalls, depositing a metal in said mould so as to form said micromechanical component, and liberating said micromechanical component from said mould and removing said particles.

Described are optical elements or displays using micro-structures and nano-structures formed conformally thereon that operate to generate optical effects. Such elements and displays may be useful for applications such as displays, and anti-counterfeiting.

Method for manufacturing a horology component, including manufacturing (E1) a first structure (10) from a first photosensitive resin (31) having at least one layer of photosensitive resin having a first pattern obtained by polymerizing the first photosensitive resin by irradiation through at least one mask (4), then developing the first photosensitive resin; and transforming (E2) the first structure (10) into a second structure (1) by structuring at least one surface of the first structure by the addition of a second photosensitive resin (32) to the at least one surface, the second structure (1) being intended to at least partially form a manufacturing mold for the horology component.

The invention relates to a nanocomposite elastic mold for thermal nanoimprint, the mold comprising an elastic substrate, to which a plurality of rigid individual nanofeatures are bonded. The bonding of the rigid individual nanofeatures to the elastic substrate is performed by a process which uses a sacrificial substrate and a sacrificial coating.

In an embodiment, an article having an impact textured surface comprises a plurality of vertical pillars; and a plurality of annular impact features; wherein a first portion of the vertical pillars is located in an annulus of the plurality of annular impact features and a second portion of the vertical pillars is located in an area around the plurality of annular impact features; wherein a height of the plurality of annular impact features is at least 10 nanometers greater than a height of the plurality of vertical pillars. In another embodiment, a method of making the article comprises molding the impact textured surface from a mold comprising a plurality of holes and a plurality of annular track features; wherein the plurality of holes corresponds to the plurality of pillars and the plurality of annular track features corresponds to the plurality of annular impact features.

The method comprises contacting a silicon substrate with a silver salt and an acid for a time effective to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate. The spikes have a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to 10 micrometers, and a density of about 10 to 100 per square microns. The nanostructures provide antimicrobial properties and can be transferred to the surface of various materials such as polymers.

The invention relates in particular to a method for creating patterns in a layer (410) to be etched, starting from a stack comprising at least the layer (410) to be etched and a masking, layer (420) on top of the layer (410) to be etched, the masking layer (420) having at least one pattern (421), the method comprising at least: a) a step of modifying at least one zone (411) of the layer (410) to be etched via ion implantation (430) vertically in line with said at least one pattern (421); b) at least one sequence of steps comprising: b1) a step of enlarging (440) the at least one pattern (421) in a plane in which the layer (410) to be etched mainly extends; b2) a step of modifying at least one zone (411, 411) of the layer (410) to be etched via ion implantation (430) vertically in line with the at least one enlarged pattern (421), the implantation being carried out over a depth less than the implantation depth of the preceding, modification step; c) a step of removing (461, 462) the modified zones (411, 411, 411), the removal comprising a step of etching the modified zones (411, 411, 411) selectively with respect to the non-modified zones (412) of the layer (410) to be etched.