B82B3/0038

Stabilized metal monolayer structure

A stabilized elementary metal structure is disclosed. The stabilized elementary metal structure may include an elementary metal having at least one layer and having a two-dimensional layer structure, and an organic molecular layer provided on at least one of a top surface and a bottom surface of the elementary metal.

Systems and methods for mechanosynthesis

Methods, systems, and devices are disclosed for performing mechanosynthesis, including those that involve bulk chemical preparation of tips, multiple tips for supplying feedstock, and use of sequential tips such as in a thermodynamic cascade; such features may simplify starting requirements, increase versatility, and/or reduce complexity in the mechanosynthesis equipment and/or process.

Process for producing graphene
11136240 · 2021-10-05 ·

The invention relates to the production of carbon nanomaterials, for example graphene, and can be used to produce graphene for use in nanoelectronics. Graphene is produced by stratifying graphite particles, differing in that graphite particles undergo electrodynamic fluidization in a vacuum in which the energy of the graphite particles exceeds the work necessary for their cleavage along the cleavage planes on graphene layers during brittle fracture when striking against the electrodes. The method makes it possible to obtain graphene with high productivity, economy and purity of the product.

Superhydrophobic and superoleophobic nanosurfaces

Devices, systems and techniques are described for producing and implementing articles and materials having nanoscale and microscale structures that exhibit superhydrophobic, superoleophobic or omniphobic surface properties and other enhanced properties. In one aspect, a surface nanostructure can be formed by adding a silicon-containing buffer layer such as silicon, silicon oxide or silicon nitride layer, followed by metal film deposition and heating to convert the metal film into balled-up, discrete islands to form an etch mask. The buffer layer can be etched using the etch mask to create an array of pillar structures underneath the etch mask, in which the pillar structures have a shape that includes cylinders, negatively tapered rods, or cones and are vertically aligned. In another aspect, a method of fabricating microscale or nanoscale polymer or metal structures on a substrate is made by photolithography and/or nano imprinting lithography.

QUANTUM DOT, LIGHT EMITTING MATERIAL AND MANUFACTURING METHOD OF QUANTUM DOT
20210179937 · 2021-06-17 · ·

A quantum dot, a light emitting material, and a manufacturing method of quantum dot are provided. A ratio of an emission intensity to an absorption intensity of the quantum dot at a characteristic wavelength ranges from 1.5×10.sup.8 CPS/Abs. to 2.0×10.sup.9 CPS/Abs. The characteristic wavelength is a shorter wavelength of two wavelengths corresponding to half of a maximum intensity of an emission peak of the quantum dot.

METHOD FOR PREPARATION OF OXIDE SUPPORT-NANOPARTICLE COMPOSITES
20210188656 · 2021-06-24 ·

There is provided a method for preparation of oxide support-nanoparticle composites, in which metal nanoparticles decorate with uniform size and distribution on the surface of an oxide support, and thus, high performance oxide support-nanoparticle composites that can be applied in the fields of heterogeneous catalysis can be provided.

Quantum dot, light emitting material and manufacturing method of quantum dot comprising thermal treatment of solution containing formed quantum dot
11008512 · 2021-05-18 · ·

A quantum dot, a light emitting material, and a manufacturing method of quantum dot are provided. A ratio of an emission intensity to an absorption intensity of the quantum dot at a characteristic wavelength ranges from 1.5×10.sup.8 CPS/Abs. to 2.0×10.sup.9 CPS/Abs. The characteristic wavelength is a shorter wavelength of two wavelengths corresponding to half of a maximum intensity of an emission peak of the quantum dot.

Systems and Methods for Mechanosynthesis

Methods, systems, and devices are disclosed for performing mechanosynthesis, including those that involve bulk chemical preparation of tips, multiple tips for supplying feedstock, and use of sequential tips such as in a thermodynamic cascade; such features may simplify starting requirements, increase versatility, and/or reduce complexity in the mechanosynthesis equipment and/or process.

Thin film substrates including crosslinked carbon nanostructures and related methods

A method of making a thin film substrate involves exposing carbon nanostructures to a crosslinker to crosslink the carbon nanostructures. The crosslinked carbon nanostructures are recovered and disposed on a support substrate. A thin film substrate includes crosslinked carbon nanostructures on a support substrate. The crosslinked carbon nanostructures have a crosslinker between the carbon nanostructures. A method of performing surface enhanced Raman spectroscopy (SERS) on a SERS-active analyte involves providing a SERS-active analyte on such a thin film substrate, exposing the thin film substrate to Raman scattering, and detecting the SERS-active analyte.

PHOTOVOLTAIC DEVICES BASED ON GUIDED NANOWIRE ARRAYS

This invention relates to photovoltaic devices such as photovoltaic cells and photodetectors. The invention provides processes for fabrication of the devices and methods of use thereof. The invention is further related to controlled growth of nanowire arrays using elongated shapes as guides on the surface.