The present invention relates to an electrode assembly comprising nano-scale-LED elements and a method for manufacturing the same and, more specifically, to an electrode assembly comprising nano-scale-LED elements and a method for manufacturing the same, in which the number of nano-scale-LED elements included in a unit area of the electrode assembly is increased, the light extraction efficiency of individual nano-scale-LED elements is increased so as to maximize light intensity per unit area, and at the same time, nano-scale-LED elements on a nanoscale are connected to an electrode without a fault such as an electrical short circuit.

A method for orienting elongated objects arranged on the surface of a substrate, the elongated objects extending according to an initial orientation, the method including depositing on the surface of the substrate at least one layer of a soft material covering at least partially a portion of the elongated objects, and applying a mechanical stress on at least one portion of the layer of soft material in such a way as to modify the orientation of at least one portion of the elongated objects.

Described herein are metal nanoparticle superstructures and methods and compounds for making the same.

A method of depositing nanowire chains includes applying a nanowire mixture to a chain-site. The chain-site includes a patterned conductive film covering at least a portion of a surface of a substrate. The patterned conductive film includes a gap. The method also includes, after applying the nanowire mixture, forming a nanowire chain suspended adjacent to a portion of the patterned conductive film by generating an electric field proximate to the patterned conductive film; and depositing the nanowire chain across the gap by removing a liquid portion of the nanowire mixture. An average length of the nanowires of the nanowire mixture is less than a width of the gap.

A method for orienting elongated objects arranged on the surface of a substrate, the elongated objects extending according to an initial orientation, the method including depositing on the surface of the substrate at least one layer of a soft material covering at least partially a portion of the elongated objects, and applying a mechanical stress on at least one portion of the layer of soft material in such a way as to modify the orientation of at least one portion of the elongated objects.

An apparatus and method for magnetic particle manipulation enables the particle to be rotated and translated independently using magnetic fields and field gradients, which produce the desired decoupled translational and rotational motion. The apparatus and the method for manipulation may be implemented in parallel, involving many particles. The rotational magnetic field used to induce rotational motion may be varied to induce particle motion, which is either in phase or out of phase with the rotational magnetic field. The magnetic fields and gradients described herein may be generated with permanent magnets, electromagnets, or some combination of permanent magnets and electromagnets.

A method of patterning a block copolymer layer, the method including: providing a substrate with a guide pattern formed on a surface thereof; forming a block copolymer layer on the substrate with the guide pattern, the block copolymer layer including a block copolymer; and directing self-assembly of the block copolymer on the substrate according to the guide pattern to form n/2 discrete domains, wherein the guide pattern includes a block copolymer patterning area having a 90-degree bending portion, and an outer apex and an inner apex of the 90-degree bending portion are each rounded, the outer apex having a first curvature radius r.sub.1, and the inner apex having a second curvature radius r.sub.2, respectively, and the width of the patterning area W, the first curvature radius r.sub.1 and the second curvature radius r.sub.2, satisfy Inequation 1: $ 2 + 2 - ( 1 + 2 ) [ ( n + 2 ) 2 n ( n + 1 ) ] 1 3 r 1 - r 2 W 2 + 2< Apparatuses comprising films with free-standing region 12291447 · 2025-05-06 · Canatu Oy · Bjørn Mikladal An apparatus, comprising a film (103) comprising a network of conductive and/or semi-conductive high aspect ratio molecular structures is presented. The apparatus also comprises a frame (102) arranged to support the film (103) at least at least two support positions so that a free-standing region (101) of the film (103) extends between the at least two support positions. The two or more electrical contact areas electrically coupled to the film (103), and these electrical contact areas are arranged to pass electric charge across the free-standing region (101) of the film (103) at a current between 0.01 and 10 amperes. GENERAL MAGNETIC ASSEMBLY APPROACH TO CHIRAL STRUCTURES AT ALL SCALES 20250201454 · 2025-06-19 · Yadong Yin, Zhiwei Li A method of assembling a chiral superstructure includes applying a quadrupole magnetic field to a plurality of magnetic nanostructures and configuring the plurality of magnetic nanostructures into a chiral superstructure by controlling a magnitude and a direction of the quadrupole magnetic field. A magnetic chiral superstructure includes a plurality of magnetic nanostructures assembled into a chiral superstructure by applying a quadrupole magnetic field to the plurality of magnetic nanostructures and configuring the plurality of magnetic nanostructures into a chiral superstructure by controlling a magnitude and a direction of the quadrupole magnetic field. APPARATUS FOR THE PRECISION ASSEMBLY OF SMALL PARTICLES 20250267919 · 2025-08-21 · Matthew J. BAUER A chamber and surrounding system for the assembly of high yielding, high density, accurately and deterministically placed discrete nano or microparticles or particle arrays are provided, where the positioning of the particles is maintained during a supercritical drying process. The nanoparticle assembly chamber is based upon the dielectrophoretic force generated AC electrodes patterned on a substrate and contacted with electrical feedthroughs, a secondary electrophoretic force generated by a DC electrode opposite the substrate to force particles from the bulk solution near the substrate surface to increase deposition rate, and a fluidic pump to flow solution containing nanoparticles over the substrate surface. The magnitude of the dielectrophoretic forces and electrophoretic force can be adjusted by the geometric parameters, the bias potential applied to the DC bias electrode, and the magnitude of the AC electric field applied to the substrate electrodes. $