Patent classifications
B01D2239/0421
Chemical liquid purification method, chemical liquid manufacturing method, and chemical liquid
An object of the present invention is to provide a chemical liquid purification method by which a chemical liquid capable of inhibiting the occurrence of short in a semiconductor substrate manufactured by a photolithography process is obtained. Another object of the present invention is to provide a chemical liquid manufacturing method and a chemical liquid. The chemical liquid purification method of the present invention includes a purification step of filtering a liquid to be purified by using a filter, in which a filter satisfying a condition 1 or a condition 2 in the following test is used as the filter. Test: 1,500 ml of a test liquid formed of the organic solvent is brought into contact with the filter for 24 hours under a condition of 23° C., and a content of particles containing at least one kind of metal selected from the group consisting of Fe, Al, Cr, Ni, and Ti in the test liquid after the contact satisfies a predetermined condition.
Filter insert and sample vial using the same
A filter insert, a sample vial incorporating a filter insert, a method of using a sample vial containing a filter insert for chemical analysis, and a sample vial kit including a filter insert. The filter insert includes a cylindrical body having a proximal end, a protrusion extending radially from the proximal end of the cylindrical body and configured to set on the open end of a sample vial, a distal end, a cavity extending longitudinally through the cylindrical body from the proximal end to the distal end, and a filter assembly coupled with the distal end of the cylindrical body.
PROTECTIVE MASK, AIR FILTRATION ELEMENT AND AIR TREATMENT ELEMENT
A layer for a protective mask (100a, 100b, 200a) comprises at least a first sublayer (122b, 218b), wherein the first sublayer (122b, 218b) includes a first substrate and a layer of a plurality of nanoparticles (124b, 7) of a nanomaterial provided on the first substrate. The protective mask (100a, 100b, 200a) includes an outer layer (120b, 230a) which is made of an organic fibular network bonded with nanomaterials. An air filtration element (900, 1070, 1240) for attenuation of airborne contaminants includes negatively charged nanodiamonds (920, 1320). A filter (1100, 1200, 1500, 1600) for an air conditioning system (1130, 1530) or an air purifier (1230, 1630) comprises the air filtration element (900, 1070, 1240). An air treatment element (1140,1300,1540,1640) comprises nanodiamonds (920,1320) including colour centers. The protective mask (100a, 100b, 200a), the air filtration element (900, 1070, 1240), the air treatment element (1140,1300,1540,1640) and the filter (1100, 1200, 1500, 1600) overcome or at least partially ameliorate some of the deficiencies as associated with those of the prior art.
INFECTION CONTROL FILTER LABEL
An infection control filter label includes a frame and a filter membrane that covers a window through the frame. The frame may be removably secured to a cover for an item, such as a cushion (e.g., a pillow, a positioner, a mattress topper, a mattress, a seat cushion, etc.), bedding (e.g., a duvet, etc.), or the like to provide a sealed cover for the item. The sealed cover may be impermeable, with the infection control filter label limiting the passage of dust and microorganisms (e.g., fungi, bacteria, mold spores, etc.) from passing therethrough. Thus, the sealed cover may protect its contents from external factors (e.g., sick individuals, etc.) while protecting the environment outside the sealed cover from the contents of the sealed cover. Information about the item may be provided on the frame; for example, by printing, writing, or the like.
Filter unit, gas supply device, inside air conditioner, and cooling device for container
A space which is present between an air intake surface (90a) provided with an air intake port and an air filter (76) is regarded as a primary space (P) through which air flows into the air filter (76), and a plurality of spaces, each of which is present between one of other surfaces of the air filter (76) and a filter box (90), are regarded as secondary spaces (Q) into each of which the air flows out from the air filter (76), so that the air is taken out from side surfaces and an upper surface of a filter unit (75). This configuration reduces the increase in size of the filter unit (75) of a gas supply device (30) even if a dust holding capacity of the filter is made larger than before.
NOVEL FILTER MATERIAL, FACE MASK COMPRISING THE SAME AND METHOD OF MAKING THE SAME
The present invention provides a filter material comprising an antistatic substrate having a predefined antistatic capacity, and one or more layers of nanofibers applied on the substrate. The one or more layers of nanofibers may be fabricated to have gradient structure in various parameters including thickness of nanofiber layer, nanofiber pore size, nanofiber diameter, nanofiber content and the like to suit different filtration applications. The present invention also provides a face mask comprising the filter material and a method for making the filter material.
Linear compressor
Provided is a linear compressor. The linear compressor includes a cylinder disposed in a shell to define a compression space for a refrigerant, a piston installed to reciprocate in the cylinder, a motor assembly that allows the piston to move in an axial direction of the cylinder and thereby to compress the refrigerant introduced into the compression space, a nozzle which is provided in the cylinder and through which a portion of the refrigerant introduced into the compression space passes, and a cylinder filter installed in the cylinder and disposed at an inlet-side of the nozzle. At least one or more surfaces of the cylinder filter are oil-repellent coated.
ARTICLE FOR INFECTION PREVENTION FOR FOMITE MATERIALS
An embodiment is an article configured to inhibit or prevent pathogen growth. The article includes an inner layer configured to face a wearer's skin when the face covering article is applied to the face of the wearer; a middle layer adjacent to the inner layer; and an outer protection layer adjacent to the middle layer and opposite the inner layer and comprising a substrate and metal particles in the substrate, wherein the metal particles are configured to inhibit or prevent pathogen growth.
FILTERS, FILTER SYSTEMS, AND METHODS OF USE
The present disclosure provides for filters, filter systems, methods of using filter systems, and methods of detecting targeting airborne particles, and the like. The present disclosure provides for filters that can capture one or more types of targeted airborne particulates, where the presence of each of the targeted airborne particulates can then be detected. The filters can be used in industrial gas systems, laboratory gas systems, HVAC systems, portable filter systems, respirator systems, and other residential, commercial, or industrial air circulation or air control systems.
POLYMERIC FABRIC
The invention relates to a polymeric fabric comprising an outer functional layer having hydrophobic and oleophobic characteristics made of a first compound, and a second functional layer having hydrophobic characteristics made of a second compound, wherein the first and the second compound differ from each other. Further the outer functional layer at least partly coats the second layer. Additionally, the invention relates to a method of producing a polymeric fabric and an apparatus for producing a polymeric fabric.