A structured monolithic catalyst has a structured monolithic carrier and a coating of active components. The coating of active components comprises active metal components and a substrate. The active metal components conclude a first metal element, a second metal element, a third metal element and a fourth metal element. The first metal element includes Fe and Co; the second metal element is at least one selected from the group consisting of the metal elements of the Group IA and/or IIA; the third metal element is at least one selected from the group consisting of the non-noble metal elements of the Groups IB to VIIB; and the fourth metal element is at least one selected from the group consisting of the noble metal elements.

An object of the present invention is to increase the reduction performance of nitrogen oxides compared to existing three-way catalysts; simultaneously inhibit the emission of ammonia and nitrous oxide; simplify a process by means of a method of further doping an iridium-ruthenium catalyst into a commercial three-way catalyst; and expand the scope of application. The present invention provides a catalyst for simultaneously inhibiting the emission of ammonia and nitrous oxide by doping an iridium-ruthenium catalyst component into a three-way catalyst (TWC), a diesel oxidation catalyst, or a lean NOx trap supported on a honeycomb support.

The disclosure provides a method of converting carbon dioxide into a reaction product. The method comprises providing a switchable dual function material (DFM) loaded with carbon dioxide; and contacting the switchable DFM loaded with carbon dioxide and a co-reactant, thereby causing the carbon dioxide to react with the co-reactant to produce the reaction product. The switchable DFM comprises an adsorbent, configured to adsorb carbon dioxide; and a switchable catalyst configured to catalyse the conversion of carbon dioxide into a reaction product. The disclosure extends to the switchable DFM per se.

The present invention relates to a method for producing a molding catalyst for obtaining chlorine (Cl.sub.2) through an oxidation reaction of hydrogen chloride (HCl), and more specifically, to a method for producing an oxidation reaction molding catalyst by adding heterogeneous material to a ruthenium oxide (RuO.sub.2)-supported catalyst having titanium oxide (TiO.sub.2) as a supporting body, and molding so as to be usable in a fixed bed reactor to produce chlorine (Cl.sub.2) from hydrogen chloride (HCl).

An abatement apparatus includes: an abatement chamber configured to receive aneffluent stream and to provide an abated effluent stream; a wet scrubber located downstream of the abatement chamber, the wet scrubber being configured to receive the abated effluent stream and provide a scrubbed effluent stream; and a catalyst bed located downstream of the wet scrubber, the catalyst bed being configured to receive the scrubbed effluent stream and provide a remediated effluent stream. In this way, undesirable compounds present in the abated effluent stream, which are there because they were either already present in the effluent stream and were insufficiently abated by the abatement chamber or because they are abatement by-products generated within the abatement chamber, can be remediated, removed or reduced by the catalyst bed prior to being vented by the abatement apparatus.

A system and a process for reducing greenhouse gas emissions are disclosed herein. The system may include a combustion zone, a catalytic converter, a methanation reactor, a compressor, a normal venting unit, a vacuum protection unit, and a control system. The process may include feeding a fuel, a methane-containing gas, and an oxygen-containing gas into a first reactor unit, and producing a combustion products stream comprising carbon monoxide, carbon dioxide, and water. The process may include cooling the combustion products stream via a cooling system, feeding the cooled exhaust stream and hydrogen to a second reactor unit. The second reactor unit may include a first catalyst for reacting oxygen with carbon monoxide to form carbon dioxide, and a second catalyst for reacting carbon dioxide with hydrogen to produce methane. The process may include recovering an effluent from the second reactor unit and feeding it to the first reactor unit.

The present invention relates to a ruthenium-containing catalytically active composition for exhaust-gas aftertreatment catalysts, which composition contains a doped refractory oxide which is provided at least with ruthenium and is selected from the group consisting of aluminum oxide, magnesium oxide, silicon oxide, molybdenum oxide, tungsten oxide, titanium oxide, mixtures thereof, and composite oxides of two or more thereof and a cerium-zirconium oxide which comprises at least one element other than cerium from the group of rare earths. The invention also relates to a preparation containing the catalytically active composition, to methods for preparing same, to a catalyst having the catalytically active composition, and to a method in which the composition is used.

The present invention relates to a method for producing a molding catalyst for obtaining chlorine (Cl.sub.2) through an oxidation reaction of hydrogen chloride (HCl), and more specifically, to a method for producing an oxidation reaction molding catalyst by adding heterogeneous material to a ruthenium oxide (RuO.sub.2)-supported catalyst having titanium oxide (TiO.sub.2) as a supporting body, and molding so as to be usable in a fixed bed reactor to produce chlorine (Cl.sub.2) from hydrogen chloride (HCl).

A preparation method for a highly chlorine- and water-resistant catalyst is provided. A mixture of at least one of SnO.sub.2, GeO.sub.2, and MoO.sub.2 with CeO.sub.2 is used as a catalyst support, face-centered cubic ruthenium oxide is used as an active component, and the catalyst with excellent chlorine- and water-resistance is prepared through selective adsorption regulation, which can realize safe and efficient purification of chlorine-containing organic waste gas at temperatures below 250 C.

A method for controlling the semiconductor process environment is provided. The method includes placing a cleaning member in a processing chamber of a semiconductor processing tool. The method also includes creating a vacuum in the processing chamber. Furthermore, the method includes eliminating at least one compound from the residues in the processing chamber by the cleaning member. The cleaning member is configured to facilitate physical adsorption, catalysis, or chemical reactions with the residues in the processing chamber.