A method and composition of matter for detecting and decontaminating hazardous chemicals, the composition of matter including: a magnetic material for any of chemisorbing, molecularly dissociating, or decomposing a hazardous chemical, wherein the magnetic material changes its magnetic moment upon any of chemisorption, decomposition, and molecular dissociation of the hazardous chemical and the change in magnetic moment is used to detect the presence of the hazardous chemical, and wherein the hazardous chemical includes any of toxic industrial chemicals, chemical warfare agents, and chemical warfare agent related compounds.

Systems and apparatuses for neutralizing acidic compounds in flue gases emitted from a heat recovery coke oven. A representative system includes a spray dry absorber having a barrel that includes a plurality of wall plates that form sidewalls of the barrel. The wall plates include a steel plate and a corrosion resistant alloy cladded to the steel plate and the wall plates are oriented such that the corrosion resistant alloy faces toward and is in fluid communication with an interior area of the barrel. The alloy is resistant to corrosion caused by the acidic compounds in the flue gas and can prevent the steel plate from being corroded by these acidic compounds.

The present disclosure includes a system for processing waste from a chemical vapor deposition process. The system can include an inlet configured to be connected to one or more chemical vapor deposition systems, the inlet configured for receiving an effluent comprising one or more waste gases, a vacuum component in fluid communication with the inlet, the vacuum component configured for maintaining a vacuum of about 0.5 Torr to about 3.5 Torr and actuatable for removing the one or more waste gases from the one or more chemical vapor deposition systems, and a fluid line fluidly connecting the inlet to the vacuum component; and a controller in communication with the vacuum component.

A detoxifying device 100 having an inner wall 104 that forms a flow passage 103 through which treatment gas flows includes a first piping 130 that forms a part of the flow passage 103, a replaceable piping section 170 that forms a part of the flow passage 103 at the position downstream of the first piping 130, and is connected thereto for sprinkling the cleaning water to remove the solid product adhering to the inner wall 104, and a second piping 150 that forms a part of the flow passage 103 at the position downstream of the piping section 170, and is connected thereto.

An apparatus and method for treating a semiconductor process gas comprises a gas inlet allowing a treatment target gas (or gas to be treated) to flow therethrough; a catalytic reaction portion including a catalyst and configured to allow the treatment target gas to be brought into contact with the catalyst; a space velocity controller between the gas inlet and the catalytic reaction portion, the space velocity controller extending from the gas inlet in a diagonal direction in relation to the gas inlet; a differential pressure buffer portion between the space velocity controller and the catalytic reaction portion and including a filter; and a gas outlet configured to externally discharge a product formed as the treatment target gas comes into contact with the catalyst.

An exhaust gas processing system including a process chamber in which an exhaust gas is produced; an exhaust gas measurer receiving the exhaust gas and measuring a concentration of the exhaust gas; a solid producing gas processor receiving the exhaust gas and removing a solid producing gas contained in the exhaust gas; a gas supply supplying dilution and cooling gases to the solid producing gas processor; a processed gas measurer receiving, as a processed gas, the exhaust gas free of the solid producing gas and measuring a temperature of the processed gas and ingredients of the processed gas; and a controller receiving results of measurement of the concentration of the exhaust gas from the exhaust gas measurer and results of measurement of the temperature of the processed gas and the ingredients of the processed gas from the exhaust gas measurer and controlling the gas supply based on the measurement results.

A regenerator vessel for adsorbing halogen-containing material from a regenerator vent gas stream has a plurality of catalyst nozzles disposed at a top portion of the regenerator vessel. A first gas outlet is associated with a chlorination zone, and a second gas outlet associated with a combustion zone. A drying zone is in fluid communication with an air heater and the drying zone located in a bottom portion of the regenerator vessel. The first gas outlet is configured to withdraw a first gas stream from the chlorination zone and the second gas outlet is configured to withdraw a second gas stream from the combustion zone. The top portion of the regenerator vessel has an adsorption zone having a vent gas inlet port, a vent gas outlet port, and a portion of an annular catalyst bed.

A contaminated gas stream can be passed through an in-line mixing device, positioned in a duct containing the contaminated gas stream, to form a turbulent contaminated gas stream. One or more of the following is true: (a) a width of the in-line mixing device is no more than about 75% of a width of the duct at the position of the in-line mixing device; (b) a height of the in-line mixing device is no more than about 75% of a height of the duct at the position of the in-line mixing device; and (c) a cross-sectional area of the mixing device normal to a direction of gas flow is no more than about 75% of a cross-sectional area of the duct at the position of the in-line mixing device. An additive can be introduced into the contaminated gas stream to cause the removal of the contaminant by a particulate control device.

An injection lance assembly for creating a higher degree of turbulence and dispersion of a treating agent into a fluid stream.

A unit for recovering hydrogen chloride from an aqueous liquid which includes hydrogen chloride and is contaminated with compounds of low or no volatility, the unit having an evaporation unit for forming, from the liquid, a vapour which contains hydrogen chloride and a liquid concentrate which is contaminated with the compounds of low or no volatility, a first distillation unit for separating the hydrogen-chloride-containing vapour into a first top product and a first bottom product, and a second distillation unit for separating a hydrogen-chloride-containing aqueous fluid into a second top product and a second bottom product, one of these two distillation units being configured to be able to implement therein a distillation above the ambient pressure, and the other of these two distillation units being configured to be able to implement therein a distillation below the ambient pressure.