Implementations of the present disclosure relate to systems and techniques for abating F-gases present in the effluent of semiconductor manufacturing processes. In one implementation, a water and oxygen delivery system for a plasma abatement system is provided. The water and oxygen delivery system comprises a housing that includes a floor and a plurality of sidewalls that define an enclosed region. The water and oxygen delivery system further comprises a cylindrical water tank positioned on the floor, wherein a longitudinal axis of the cylindrical water tank is parallel to a plane defined by the floor and a length of the water tank is 1.5 times or greater than the diameter of the cylindrical water tank. The water and oxygen delivery system further comprises a flow control system positioned within the housing above the cylindrical water tank.

A system and process for the recovery of at least one halogenated hydrocarbon from a gas stream. The recovery includes adsorption by exposing the gas stream to an adsorbent with a lattice structure having pore diameters with an average pore opening of between about 5 and about 50 angstroms. The adsorbent is then regenerated by exposing the adsorbent to a purge gas under conditions which efficiently desorb the at least one adsorbed halogenated hydrocarbon from the adsorbent. The at least one halogenated hydrocarbon (and impurities or reaction products) can be condensed from the purge gas and subjected to fractional distillation to provide a recovered halogenated hydrocarbon.

The abatement apparatus includes a porous element at least partially defining a treatment chamber and through which treatment materials pass for introduction into the treatment chamber for treatment of an effluent gas stream; and an infra-red heating device operable to emit infra-red energy to heat the porous element which heats the treatment materials as they pass through the porous element into the treatment chamber. In this way, infra-red energy, rather than combustion, can be used to raise the temperature within the treatment chamber in order to treat the effluent gas stream. This allows the apparatus to be used in environments where no fuel gas exists or where the provision of fuel gas is considered undesirable. Also, heating the treatment materials as they pass through the porous sleeve, rather than simply using radiant heat to heat the treatment chamber enables significantly more energy to be imparted into the treatment materials.

Disclosed is a system for integrally treating a composite waste gas including nitrogen oxides (NO.sub.x and N.sub.2O), chlorofluorocarbons (CFCs), hydrochlorofluorocarbons (HCFCs), hydrofluorocarbons (HFCs), and perfluorinated compounds (PFCs). The system includes a first wet processor configured to wash and adsorb dust including gases, SO.sub.x, and ash dissolved in water, a decomposing reactor configured to receive waste gas processed in the first wet processor and process nitrogen oxides (NO.sub.x and N.sub.2O), fluorocarbons (CFCs), hydrochlorofluorocarbons (HCFCs), hydrofluorocarbons (HFCs), and perfluorinated compounds (PFCs) in the waste gas, and a second wet processor configured to receive the waste gas processed in the decomposing reactor and wash and adsorb the received waste gas. The system can efficiently treat a large amount of composite waste gas.

The invention relates to a method for cleaning flue gas, the flue gas to be cleaned and a sorption agent starting material in the form of a solid being injected into a reactor chamber of a fluidized-bed reactor, and a liquid being injected into the reactor chamber separately from the flue gas and the sorption agent starting material, the sorption agent starting material being contacted with the liquid in the fluidized-bed reactor and being converted to a sorption agent in the form of a solid.

A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a pair of multistage pump rotors each of which comprises a plurality of rotors arranged on a rotating shaft, and the at least one abatement part is connected to an interstage of the multistage pump rotors.

A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a main pump capable of evacuating gas from an atmospheric pressure and a booster pump for increasing an evacuation speed of the main pump, and the at least one abatement part for treating the exhaust gas is connected between the main pump and the booster pump.

Provided is a method of reducing a concentration of a fluorine-containing compound in a sample using a biocatalyst and an ionic liquid.

A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.

An apparatus for exhaust gas abatement under reduced pressure includes a reaction tube having, in an interior thereof, an exhaust gas treatment space in which an exhaust gas supplied from an exhaust gas source via a vacuum pump is heated by an electric heater or excited by a plasma for decomposition and/or reaction treatment. The apparatus also includes a downstream vacuum pump connected to an exhaust gas outlet located downstream of the reaction tube to reduce a pressure in a region located downstream of an outlet of the vacuum pump and including the interior of the reaction tube. The downstream vacuum pump is a water-sealed pump. The apparatus further includes a water-washing unit for washing a downstream end of an exhaust gas flow path in the reaction tube with washing water. The washing water supplied by the water-washing unit is reused as seal water for the downstream vacuum pump.