B01J19/1843

Fouling protection for an oligomerization reactor inlet

Disclosed herein are systems and processes which prevent fouling of a reactor inlet of an oligomerization reactor. The systems and processes involve placement of an inlet sleeve around at least a portion of a reactor inlet such that a curtain of inert material flows through an annular space coaxially with respect to an outer surface of the end of the reactor inlet and into the reactor.

METHOD FOR CONVEYING REACTION TUBE UNIT

A method for conveying a reaction tube unit including a vertical reaction tube and a gas supply pipe provided at a distance from an inner wall of the vertical reaction tube along a longitudinal direction thereof, the method includes: arranging a buffer inside the reaction tube between the inner wall and the gas supply pipe to alleviate a collision; placing the reaction tube unit attached with the buffer on a carriage via a vibration isolator; and conveying the reaction tube unit by moving the carriage.

Reactor for the hydrothermal oxidation treatment of an organic material in a reaction medium

A reactor for hydrothermal oxidation treatment of an organic material in a reaction medium, comprising: a confinement member housed in a chamber and defining a confinement zone and a peripheral zone; at least one inlet for an oxidising fluid into the peripheral zone; a first cooling system, with an external circulation cold loop having a fluid inlet and outlet, opening into a first portion of the peripheral zone; a heating system, with an external circulation hot loop having a fluid inlet and outlet opening into a second portion of the peripheral zone; a channel with a mouth, a channel stirring system; a second cooling system for creating a temperature gradient along the channel between a cold temperature and the reaction temperature; each circulation loop being equipped with a circulator and with a heat exchanger.

Controlled thin film vapor generator for liquid volume reduction
10350508 · 2019-07-16 · ·

A reactor comprising a plurality of vessels, each having a heat exchange surface for processing a fluid as a thin film flow, the vessels arranged in a concentric manner; a plurality of annular spaces situated between the vessels; and a pathway for directing a heat exchange fluid from one vessel to an adjacent vessel for creating a temperature differential between the heat exchange surfaces and the fluid being processed. A system comprising a fluid source, a reactor, and a vapor outlet and a processed fluid outlet through generated vapor and processed fluid are directed out of the reactor, respectively. A method comprising providing a plurality of concentrically arranged surfaces in spaced relation, distributing a fluid to be processed against the surfaces in a controlled manner to form a substantially uniform thin film flow thereon, and evaporating at least a portion of the fluid being processed along the plurality of surfaces.

Pressurized Taylor Vortex reactor

A reaction apparatus includes a hollow chamber with a stirring shaft. The chamber is maintained at a predetermined pressure and accepts at least two reactants from two storage tanks. The stirring shaft rotates around an axis and creates a reaction product. Taylor vortexes are created while the pressure minimizes the volume possession of the gas phase. The reaction product of micron and sub-micron particles is removed from the chamber and depressurized.

Fouling Protection for an Oligomerization Reactor Inlet

Disclosed herein are systems and processes which prevent fouling of a reactor inlet of an oligomerization reactor. The systems and processes involve placement of an inlet sleeve around at least a portion of a reactor inlet such that a curtain of inert material flows through an annular space coaxially with respect to an outer surface of the end of the reactor inlet and into the reactor.

Fouling protection for an oligomerization reactor inlet

Disclosed herein are systems and processes which prevent fouling of a reactor inlet of an oligomerization reactor. The systems and processes involve placement of an inlet sleeve around at least a portion of a reactor inlet such that a curtain of inert material flows through an annular space coaxially with respect to an outer surface of the end of the reactor inlet and into the reactor.

METHODS AND APPARATUS FOR SYNTHESIZING COMPOUNDS BY A LOW TEMPERATURE PLASMA DUAL-ELECTRIC FIELD AIDED GAS PHASE REACTION
20190055655 · 2019-02-21 ·

Method and apparatus for synthesizing compounds by a low temperature plasma dual-electric field aided gas phase reaction are provided. The method utilizes two different electrode corona discharge fields in a plasma aided reactor to form a plasma dual-electric field, using electric energy to convert gas into gas molecules, atoms, ions and/or free radicals, and then reforming and reducing to obtain organic compounds such as aliphatic hydrocarbons, higher carbon ethers, higher carbon alcohols, higher carbon esters, lower carbon alcohols, and the like; also inorganic compounds such as N.sub.2, O.sub.2, H.sub.2SO.sub.4, NH.sub.3, and the like. The apparatus includes a reactor having a plasma region of two different corona discharge fields, wherein an alternating current corona discharge field or a positive corona discharge field is set in the first electric field, and a negative corona discharge field is set in the second electric field.

Fouling Protection for an Oligomerization Reactor Inlet

Disclosed herein are systems and processes which prevent fouling of a reactor inlet of an oligomerization reactor. The systems and processes involve placement of an inlet sleeve around at least a portion of a reactor inlet such that a curtain of inert material flows through an annular space coaxially with respect to an outer surface of the end of the reactor inlet and into the reactor.

Continuous nanosynthesis apparatus and process

A nanosynthesis apparatus includes an outer tube and an inner tube with surfaces that oppose each other across a gap as part of a reaction chamber. A deposition fluid flows along the reaction chamber to grow nanostructures such as graphene or carbon nanotubes on a substrate in the reaction chamber. The reaction chamber may have an annular cross-section, and the growth substrate may wrap around the inner tube in a helical manner. This configuration can allow a flexible film substrate to travel through the reaction chamber along a path that is significantly longer than the length of the reaction chamber while maintaining a uniform gap between the substrate and the reaction chamber wall, which can facilitate a uniform temperature distribution and fluid composition across the width of the substrate.