The invention relates to distributing feed vapor more evenly across the interior space of a reactor vessel utilizing a distributor pipe at the inlet end that initially directs the flow of reactants through a flange plate and a series of ring plates. The ring plates are physical spaced such that vapor along the wall of the inlet is mildly obstructed by the flange plate and the ring plates cause the vapor to alter course temper down any diverse velocities that may create hot spots within the catalyst bed. At the end of the distributor pipe is a deflector which directs the feed vapor upwardly and outwardly in the head space of the reactor vessel.

The invention relates to distributing reactants more evenly across the interior space of a reactor vessel utilizing a distributor at the inlet end that initially directs the flow of reactants through a flange plate and a series of ring plates. The ring plates are physical spaced such that vapor along the wall of the inlet is mildly obstructed by the flange plate and the ring plates cause the vapor to alter course temper down any diverse velocities that may create hot spots within the catalyst bed.

A gas processing vessel of cylindrical shape having a cylindrical shell of the vertical axis, a gas distribution device and a first particulate material, the distribution device being fixed in the vessel next to a gas inlet or outlet orifice recessed into a lower end wall, a cover being designed to be in contact without a weld with the lower end wall and having a diameter greater than or equal to one third of the diameter of the vessel, a second particulate material with an equivalent diameter De greater than or equal to 10 mm and greater than the dimensions of the openings in the cover, and a means for centering the cover above the inlet or outlet orifice, the means being fixed to the pipe that is connected to the orifice.

The invention relates to distributing reactants more evenly across the interior space of a reactor vessel utilizing a distributor at the inlet end that initially directs the flow of reactants through a series of circumferential nozzles. The nozzles are physical spaced such that the first nozzle provides the reactants into the vessel to spread radially and broadly outwardly into the vessel and each successive circumferential nozzle to deliver reactants in a less broadly distribution or dispersion where the interior space is filled with reactants without broadly diverse velocities that may create hot spots within the catalyst bed. The invention further includes a catalyst support tray having through holes that are sized and spaced to limit higher velocity regions within the catalyst bed and cause a more even distribution of the flow and thereby reduce hot spots within the catalyst bed.

The invention relates to distributing reactants more evenly across the interior space of a reactor vessel utilizing a distributor at the inlet end that initially directs the flow of reactants through a series of circumferential nozzles. The nozzles are physical spaced such that the first nozzle provides the reactants into the vessel to spread radially and broadly outwardly into the vessel and each successive circumferential nozzle to deliver reactants in a less broadly distribution or dispersion where the interior space is filled with reactants without broadly diverse velocities that may create hot spots within the catalyst bed. The invention further includes a catalyst support tray having through holes that are sized and spaced to limit higher velocity regions within the catalyst bed and cause a more even distribution of the flow and thereby reduce hot spots within the catalyst bed.

The invention relates to equalizing and distributing vapor more evenly across the interior space of a reactor vessel utilizing an equalizing section and distributor section at the inlet end and a fixed valve tray at the bottom of the reactor to equalize and distribute the flow.

The invention relates to distributing reactants more evenly across the interior space of a reactor vessel utilizing a distributor at the inlet end that initially directs the flow of reactants through a series of circumferential nozzles. The nozzles are physical spaced such that the first nozzle provides the reactants into the vessel to spread radially and broadly outwardly into the vessel and each successive circumferential nozzle to deliver reactants in a less broadly distribution or dispersion where the interior space is filled with reactants without broadly diverse velocities that may create hot spots within the catalyst bed.

The invention relates to equalizing and distributing reactants more evenly across the interior space of a reactor vessel utilizing a combination equalizer and distributor at the inlet end that initially impedes with uneven flow rates of vapor and then directs the flow of vapor through a series of circumferential nozzles. The nozzles are physical spaced such that the first nozzle provides the reactants into the vessel to spread radially and broadly outwardly into the vessel and each successive circumferential nozzle to deliver reactants in a less broadly distribution or dispersion where the interior space is filled with reactants without broadly diverse velocities that may create hot spots within the catalyst bed.

Methods and apparatus for cross flow process reactors are disclosed. A disclosed example includes a process chamber having an inlet and an outlet to allow a flow of fluid to flow therethrough and a plurality of trays disposed within the process chamber, and containing bulk material to treat the fluid. The example apparatus also includes a flow director to divide the flow into a plurality of partial flow streams, where each partial flow stream is to be directed towards at least one tray of the plurality of trays.

An apparatus comprising a reactor inlet distributor and a perforated deflector. In this apparatus the relationship between the diameter of the perforated deflector (D.sub.D), the height of the opening of the inlet distributor pipe of the reactor inlet distributor (H.sub.SLOT) and the outer diameter of the inlet distributor pipe (OD.sub.DP) is:
D.sub.D=OD.sub.DP+2(xH.sub.SLOT) wherein x is at least .