A one-to-many parallelized millireactor system capable of high throughput production in millireactors. Also disclosed is a method for carrying out multi-phase reactions.

Disclosed is a reactor system that contains multiple millireactors, each including a millitube, a first feed line, a second feed line, and a third feed line. Each of the first and second feed lines has a hydraulic damper disposed therein. Also disclosed is a process for conducting in a millitube a triphasic flow reaction that requires a liquid reactant, a gas reactant, and a catalyst.

The invention relates to a process for producing trimeric and/or quaternary silicon compounds or trimeric and/or quaternary germanium compounds, where a mixture of silicon compounds or a mixture of germanium compounds is exposed to a nonthermal plasma, and the resulting phase is subjected at least once to a vacuum rectification and filtration.

An apparatus for halogenation of a polymer is disclosed. The apparatus includes a reactor, at least one light source, a stirrer and a heater. The reactor contains a slurry of the polymer. The light source is disposed outside of the reactor at a distance ranging from 0.5 centimeter to 2 centimeters for facilitating irradiance of the slurry. The light source radiates a light of wavelength in the range of 250 nm to 355 nm. The stirrer is adapted to agitate the slurry. The heater is adapted to heat the slurry of the polymer. The blades on the stirrer and light source are arranged in such a way that slurry is maintained in uniform motion and reacted homogeneously to achieve desired conversion efficiently.

The present invention relates to a solution reaction apparatus and solution reaction method using the same, and more particularly a solution reaction apparatus and a solution reaction method using the same, wherein a reaction vessel is made by using a sealing member, a reaction vessel forming member, and a substrate serving as the bottom part of the reaction vessel so as to cause one side of a reaction solution only to contact the solution, thereby adjusting the temperature of the substrate differently from the temperature of the solution. The solution reaction apparatus of the present invention can control temperature of the substrate and temperature of the reaction solution separately, thereby it can control the temperature of the solution above the boiling point of the solution, and can react the solution while constantly maintaining the concentration of the solution by the solution circulatory device. Accordingly, it has an effect of freely forming various nanostructures on the substrate.

Provided herein are high throughput continuous or semi-continuous reactors and processes for manufacturing graphenic materials, such as graphene. Such processes are suitable for manufacturing graphenic materials at rates that are up to hundreds of times faster than conventional techniques, and have little batch-to-batch variation. Also provided herein are graphenic compositions of matter, including large, high quality and/or highly uniform graphene.