Disclosed is a reactor system that contains multiple millireactors, each including a millitube, a first feed line, a second feed line, and a third feed line. Each of the first and second feed lines has a hydraulic damper disposed therein. Also disclosed is a process for conducting in a millitube a triphasic flow reaction that requires a liquid reactant, a gas reactant, and a catalyst.

Various embodiments disclosed relate to method of forming organosilicon products. In various embodiments, the present invention provides a method of forming an organosilicon product that can include contacting a first side of a silicone membrane with a nonvolatile liquid reactant. The method can include contacting a second side of the membrane with a gaseous reactant. The contacting can be sufficient to react the gaseous reactant with the liquid reactant to form an organosilicon product on the first side of the silicone membrane. The silicone membrane can be substantially impermeable to the liquid reactant and substantially permeable to the gaseous reactant.

Apparatus for undertaking a chemical reaction includes an elongate housing and a receptacle. The elongate housing may include a cooling means, and end fittings, which may include ports where fluids may be introduced and/or removed. In use of the apparatus, a chemical reaction product is formed within the receptacle. Subsequently the receptacle containing the chemical reaction product is withdrawn from the elongate housing.

A one-to-many parallelized millireactor system capable of high throughput production in millireactors. Also disclosed is a method for carrying out multi-phase reactions.

Disclosed is a reactor system that contains multiple millireactors, each including a millitube, a first feed line, a second feed line, and a third feed line. Each of the first and second feed lines has a hydraulic damper disposed therein. Also disclosed is a process for conducting in a millitube a triphasic flow reaction that requires a liquid reactant, a gas reactant, and a catalyst.

The present invention relates to a solution reaction apparatus and solution reaction method using the same, and more particularly a solution reaction apparatus and a solution reaction method using the same, wherein a reaction vessel is made by using a sealing member, a reaction vessel forming member, and a substrate serving as the bottom part of the reaction vessel so as to cause one side of a reaction solution only to contact the solution, thereby adjusting the temperature of the substrate differently from the temperature of the solution. The solution reaction apparatus of the present invention can control temperature of the substrate and temperature of the reaction solution separately, thereby it can control the temperature of the solution above the boiling point of the solution, and can react the solution while constantly maintaining the concentration of the solution by the solution circulatory device. Accordingly, it has an effect of freely forming various nanostructures on the substrate.

Provided herein are high throughput continuous or semi-continuous reactors and processes for manufacturing graphenic materials, such as graphene. Such processes are suitable for manufacturing graphenic materials at rates that are up to hundreds of times faster than conventional techniques, and have little batch-to-batch variation. Also provided herein are graphenic compositions of matter, including large, high quality and/or highly uniform graphene.

The system includes a reactor vessel having a reactor space bound by a reactor wall. The reactor vessel is arranged for holding a mixture of a catalyst and formic acid in the reactor space. The reactor vessel includes a mixture inflow opening for allowing the mixture to enter the reactor space and a mixture outflow opening for allowing said mixture to exit the reactor space, and a gas outflow opening for allowing hydrogen originating from the mixture to exit the reactor space. A method for hydrogen production includes: providing the formic acid and the catalyst into the reactor space; withdrawing the mixture from the reactor space; heating and/or cooling the mixture to a predetermined temperature range outside the reactor space; and introducing the heated and/or cooled mixture into the reactor space in a predetermined direction having a tangential component arranged for stirring said mixture in the reactor space.

The system includes a reactor vessel having a reactor space bound by a reactor wall. The reactor vessel is arranged for holding a mixture of a catalyst and formic acid in the reactor space. The reactor vessel includes a mixture inflow opening for allowing the mixture to enter the reactor space and a mixture outflow opening for allowing said mixture to exit the reactor space, and a gas outflow opening for allowing hydrogen originating from the mixture to exit the reactor space. A method for hydrogen production includes providing the formic acid and the catalyst into the reactor space; withdrawing the mixture from the reactor space; heating and/or cooling the mixture to a predetermined temperature range outside the reactor space; and introducing the heated and/or cooled mixture into the reactor space in a predetermined direction having a tangential component arranged for stirring said mixture in the reactor space.