A fine particle manufacturing apparatus and a fine particle manufacturing method are provided. The apparatus includes a raw material supply part supplying a raw material; a plasma torch in which the thermal plasma flame is generated and the raw material supplied by the raw material supply part is vaporized by using the thermal plasma flame to form a mixture in a gas phase state; and a plasma generation part generating the thermal plasma flame inside the plasma torch. The plasma generation part includes a first coil encircling the plasma torch; a second coil encircling the plasma torch and disposed below the first coil; a first power supply part supplying a high-frequency electric current to the first coil; and a second power supply part supplying an amplitude-modulated high-frequency electric current to the second coil. The first coil and the second coil are arranged in the longitudinal direction of the plasma torch.

Embodiments of the subject invention relate to a small modular self-contained surface plasma device for decontamination of air and surfaces within enclosed volumes. Embodiments of the subject invention relate to a method and apparatus using the technical process of dielectric barrier discharge (DBD) surface plasma generation from ambient atmosphere for decontamination of air and surfaces within enclosed volumes. The primary application mode is for preservation of perishable commodities within industrial shipping containers through reduction of surface spoilage organisms and destruction of evolved gaseous ethylene that causes premature ripening. Additional implementations include deployment for oxidation of surfaces and/or container atmospheres in applications to diminish or eradicate pesticides, toxins, chemical residues, and other natural or introduced contaminants. Other embodiments envisioned include incorporation of device capabilities and or ancillary modules for feedback input (e.g. ozone sensor(s) to maintain steady state levels, self-tuning circuitry to adjust operating frequency), communication (e.g. among modules, RFID data loggers, Wi-Fi output), and programing (e.g. user input of container volume, transit time, ozone level, etc.).

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

A gas processing device includes: a casing that includes a first end having a first opening region constituting an intake port, a second end having a second opening region constituting an exhaust port, and a main body portion on the inside of which is formed a hollow portion; a discharge lamp that has a tube body which is disposed in the hollow portion and which has a shape extending in the first direction, a first electrode, and a second electrode, the discharge lamp that emits ultraviolet rays from the tube body; a power supply unit arranged outside the casing; and a first power supply line and a second power supply line that are wired so as to pass through a side closer to the first end than the main body portion, and that electrically connect the power supply unit to the first electrode and the second electrode.

Synthetic materials that are useful as heterogeneous catalysts or electrocatalysts. The materials can be used to catalyze oxidation and/or reduction reactions and/or oxygen/hydrogen evolution/oxydation reactions.

Method for transforming a gas mixture into a gas mixture of higher added value, comprising a step of injecting a gas mixture into a pulsed plasma reactor, a dissociation step using pulsed discharges to generate a shock wave between two electrodes to produce gases, and a step of releasing the produced gases to an area where they can be cooled down and/or separated and/or collected. The dissociation step is also designed to provide passive re-ignition of the plasma in the event that the latter is blown out by the continuous stream of gas in the reactor.

The present disclosure is related to the field of chemistry and provides methods and devices for stimulation of endothermic reactions in gas phase with high activation barriers by nanosecond pulsed electrical discharge. It can be used for, e.g., CO.sub.2 functionalization of methane, H.sub.2S dissociation, hydrogen and syngas production, for processing ammonia synthesis and dissociation, etc. Some embodiments include methods and devices associated with the stimulation of plasma chemical reactions with nanosecond pulse electric discharge in the presence of gas flow.

A torch stinger apparatus may comprise one or more sets of plasma generating electrodes and at least one hydrocarbon injector contained within the electrodes. The electrodes may be concentric. The at least one hydrocarbon injector may be cooled. A method of making carbon particles using the apparatus is also described.

A reactor system and a method for the production and/or treatment of particles in an oscillating process gas stream. The reactor system includes a reaction unit and a pulsation device. A pulsation that has a pulsation frequency and a pulsation pressure amplitude can be imposed on the process gas by means of the pulsation device. The pulsation device can adapt a pulation frequency and/or pulsation pressure amplitude of the pulsation to one of the inherent resonance frequencies of a resonator.

The invention relates to a pressure loss production device (1) having a process gas inflow (2) that has a process gas inflow inlet (5), a process gas inflow outlet (6), a process gas inflow longitudinal center axis (A-A), and a process gas inflow cross-sectional surface (7), having a process gas distributor (3) that has a process gas distributor longitudinal center axis (B-B), a process gas distributor cross-sectional surface (8), a process gas distributor inlet (10) arranged on a first end face (9) and a process gas distributor outlet (12) arranged on a second end face (11), and having a process gas outflow (4) that comprises a process gas outflow inlet (13), a process gas outflow outlet (14), a process gas outflow longitudinal center axis (C-C), and a process gas outflow cross-sectional surface (15), wherein the process gas inflow (2) is connected with the first end face (9) of the process gas distributor (3), and the second end face (11) of the process gas distributor (3) is connected with the process gas outflow (4), in such a manner that a continuous flow path (16) is formed, wherein the process gas inflow (2) and process gas outflow (4) are arranged, relative to one another, in such a manner that the process gas inflow longitudinal center axis (A-A) and the process gas outflow longitudinal center axis (C-C) are arranged offset from one another, and to its use in a reactor system (31).