A clip for holding a pair of nozzle inserts for use with an irrigation sprinkler includes at least two flexible attachment arms, each attachment arm provided with an elongated slot and a retention shoulder on an inside surface thereof, adjacent the elongated slot. Each attachment arm is adapted to be received in an opening in a respective nozzle insert and retained therein by the retention shoulder. A related tool includes a pair of gripper arms and a respective pair of jaws extending from the gripper arms, pivotally secured to one another. One jaw is formed with a pair of parallel prongs, and the other jaw is formed with a flat head projecting toward the pair of prongs. The jaws are adapted to engage the nozzle insert and disengage the retention shoulder to permit removal of the nozzle insert from the clip.

Provided are a nozzle device for a plant protection unmanned aerial vehicle and a droplet diameter control method thereof. The nozzle device for a plant protection unmanned aerial vehicle includes a flexible nozzle body, a magnetostrictive sleeve, and a coil. The flexible nozzle body is provided with a nozzle exit, a periphery of the flexible nozzle body is provided with a guide surface at a position corresponding to the nozzle exit, the magnetostrictive sleeve is sleeved on the periphery of the flexible nozzle body and abutted against the guide surface. The coil is wound around the periphery of the magnetostrictive sleeve. When the coil is supplied with a current to generate a magnetic field, the magnetostrictive sleeve can move relative to the guide surface, the guide surface squeezes the nozzle exit to deform the nozzle exit, thus adjusting the size of the nozzle exit.

A jetting valve with two stage calibrating structures is disclosed, the jetting valve includes: a casing having an accommodating space; a piezoelectric actuating unit disposed on one side of the accommodating space; a spraying unit disposed on the other side of the accommodating space; a displacement amplifying element is arranged at the bottom of the accommodating space and leans against on the spraying unit, the bottom end of the piezoelectric driving unit is in contact with the displacement amplifying element; a sensing unit is arranged on the periphery of the displacement amplifying element to sense the movement of the spraying unit; a control unit, connected to the sensing unit and the piezoelectric actuating unit, adjusting the voltage supplied to the piezoelectric driving unit according to data obtained by the sensing unit; and a liquid supply unit connected to the spraying unit. In accordance with the present invention, a dispenser may be corrected its starting position for dispensing by large-range and small-range correction, and achieve the effect of rapid and accurate spraying calibration.

A lithography apparatus for semiconductor manufacturing includes a wafer chuck configured to support a wafer, a fluid source configured to contain a fluid selected from a photoresist or a photoresist developer, a delivery conduit in fluid communication with the fluid source, a dispensing outlet positioned above the wafer chuck, and a gas sprayer in a proximity region of the orifices of the dispensing outlet. The dispensing outlet includes orifices. Each of the orifices has a different cross-sectional shape. The delivery conduit is operable to be in fluid communication with one of the orifices for the fluid to flow through. The gas sprayer is operable to spray an inert gas to adjust an ambient pressure in the proximity region.