A liquid-repellent plastic molded body 1 according to the present invention has a liquid-repellent surface. The liquid-repellent surface has a re-entrant structure surface formed by an array of pillars 20 each having a head portion 20a with an enlarged diameter. At least a part of the re-entrant structure surface has a fluorine-containing surface in which fluorine atoms are distributed.

A coating booth includes a coating chamber in which coating is performed on a coated object by a coating device, a supply air chamber placed above the coating chamber, and a recovery chamber placed below the coating chamber. The coating booth is configured such that: air directed from the supply air chamber toward the recovery chamber flows through a predetermined region inside the coating chamber, the predetermined region including a passage region for the coated object; and the air directed from the supply air chamber toward the recovery chamber does not flow through a predetermined-region outside region inside the coating chamber.

This method allows a coating product to be applied to a component (13) being moved by a conveyor (12), along which conveyor at least one spray (62.1, 62.2) is arranged. It comprises automated steps involving determining, within a fixed frame of reference (X12, Y12, Z12), the coordinates of the points (A1, B1, C1, A2, B2, C2) of one or more lines (L1, L2) of the exterior profile of the component which are distributed along the length of the component, in assigning to each spray the points of each exterior profile line that lie within its field of spraying, in identifying, from among the points assigned to each spray, the point (A1, A2; B1, B2) closest to the spray for each exterior profile line, in determining, for each spray, a line (L3, L4) to follow that passes through all the points (A1, A2, B1, B2) closest to the spray as identified in step c), and in establishing a reference path for each spray according to the points on the line (L3, L4) to follow so that the application distance of each spray is adjusted automatically and independently according to the exterior profile of the component.

According to one embodiment, a cleaning device cleans a nozzle provided on a nozzle head of an electrospinning apparatus. The device includes a storage part and a cleaning part. The storage part is box-shaped, and one surface of the storage part is open. The cleaning part is provided inside the storage part, is flexible, and is capable of holding a solution.

An electrostatic painting device capable of reducing any AC or electromagnetic emissions when the device is powered on is provided. The emissions affect electronic components present during painting of various objects or even when the device is powered on. The electromagnetic induction into the conductive circuit elements in turn induces voltages and currents, which potentially harm the micro-electronic circuits. One such device includes a choke between a fluid tip and a high voltage source of the device to reduce these emissions. The voltage source may include at least one capacitor which supplies the AC emissions representing electromagnetic emissions risk during the discharge of paint from the device. The choke connected to the voltage source substantially reduces the emissions involved during the paint discharge, while allowing the discharge of electrons, thereby imparting negative DC charge to the paint and the workpiece, and preventing damage to electronic circuits during the process.

An electrostatic painting device capable of reducing any AC or electromagnetic emissions when the device is powered on is provided. The emissions affect electronic components present during painting of various objects or even when the device is powered on. The electromagnetic induction into the conductive circuit elements in turn induces voltages and currents, which potentially harm the micro-electronic circuits. One such device includes a choke between a fluid tip and a high voltage source of the device to reduce these emissions. The voltage source may include at least one capacitor which supplies the AC emissions representing electromagnetic emissions risk during the discharge of paint from the device. The choke connected to the voltage source substantially reduces the emissions involved during the paint discharge, while allowing the discharge of electrons, thereby imparting negative DC charge to the paint and the workpiece, and preventing damage to electronic circuits during the process.

Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load.

This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30 C. to 90 C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 10.sup.8 or more bubbles per 1 mL.

A curved substrate with a film includes a substrate having a first main surface, a second main surface and an end surface, and an antiglare film provided on the first main surface. The substrate has a flat portion and a bent portion. A value obtained by dividing a reflected-image diffusibility index value R of the bent portion by the sum of the reflected-image diffusibility index value R of the bent portion and a reflected-image diffusibility index value R of the flat portion is 0.3 or higher and 0.8 or less.

Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30 C. to 90 C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 10.sup.8 or more bubbles per 1 mL.

A spray system and method are described for controllably applying a coating of nanoparticles to a substrate. In particular, spray system arrangements are described that are configured to meet the goals of high quality nanoparticle deposition on a substrate with minimal waste of costly nanoparticle material. More particularly, a nanoparticle spray system is described herein that includes: a spray nozzle configured to emit a nanoparticle-laden spray flow; a conveyed substrate configured to be conveyed at a velocity; and a controller configured to operate in a feedback loop such that nanoparticles of the nanoparticle-laden spray flow are controllably deposited on a surface of the conveyed substrate.