Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load.

This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30 C. to 90 C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 10.sup.8 or more bubbles per 1 mL.

Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30 C. to 90 C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 10.sup.8 or more bubbles per 1 mL.

A retaining system for a solenoid assembly of a liquid adhesive dispensing system includes a quick-release mechanism configured to secure the solenoid assembly in place. The quick-release mechanism engages an air tube of the solenoid and thereby secures the entire solenoid assembly to a manifold. The quick-release mechanism can release the solenoid, facilitating easy removal of the entire solenoid assembly, by a simple turning, pushing, or pulling action on the quick-release mechanism. The released solenoid can then be removed and replaced, thereby minimizing downtime caused due to the replacement of a faulty solenoid.

A shisha device comprises a cooling element (13) disposed along an airflow channel to cool an aerosol. The cooling element unit utilizes active cooling and may additionally utilize passive cooling. The cooling element may comprise a conduit (21) comprising a thermally conductive material. The cooling element may be integrally formed with an accelerating element (14) disposed along the airflow channel. Cooling may occur before or during acceleration of the aerosol by the accelerating element. The cooling may contribute to the condensation in the aerosol.

Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load.

This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30 C. to 90 C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 10.sup.8 or more bubbles per 1 mL.

There is disclosed a spray gun for spray deposition of 2D material onto substrate surfaces so as to allow for subsequent laser patterning or etching of said material into a metamaterial. The gun comprises: a housing 1 capable of accepting a propulsion device for propulsion of the material, wherein said housing 1 accommodates a reservoir for loading material to be deposited by spraying: and a nozzle 4 for directing the material to be sprayed by the gun. The nozzle 4 includes converging and diverging inner bore sections so as to enable propulsion of material at a supersonic speed.

A retaining system for a solenoid assembly of a liquid adhesive dispensing system includes a quick-release mechanism configured to secure the solenoid assembly in place. The quick-release mechanism engages an air tube of the solenoid and thereby secures the entire solenoid assembly to a manifold. The quick-release mechanism can release the solenoid, facilitating easy removal of the entire solenoid assembly, by a simple turning, pushing, or pulling action on the quick-release mechanism. The released solenoid can then be removed and replaced, thereby minimizing downtime caused due to the replacement of a faulty solenoid.

An apparatus (200) for smoothing a surface of an object (100). The apparatus includes a chamber (210), a reservoir (324) configured to hold a liquid (322), and a nebulizer assembly (212) configured to generate a mist (104) from the liquid into the chamber. The nebulizer assembly includes a mesh (732), a vibrating element (731), and a wick (736). The object is received in the chamber and the mist is configured to surround the object.

A retaining system for a solenoid assembly of a liquid adhesive dispensing system includes a quick-release mechanism configured to secure the solenoid assembly in place. The quick-release mechanism engages an air tube of the solenoid and thereby secures the entire solenoid assembly to a manifold. The quick-release mechanism can release the solenoid, facilitating easy removal of the entire solenoid assembly, by a simple turning, pushing, or pulling action on the quick-release mechanism. The released solenoid can then be removed and replaced, thereby minimizing downtime caused due to the replacement of a faulty solenoid.

An apparatus for dispensing a liquefied fluid including a housing, a main reservoir at least partially disposed within the housing, wherein the main reservoir is adapted to receive a substance, a heating element positioned to melt the substance into liquefied fluid, a second reservoir in fluid communication with the main reservoir, and a nozzle in fluid communication with the second reservoir, wherein the substance is dispensable from the nozzle as liquefied fluid.