A patterning apparatus is provided. The patterning apparatus includes a plurality of liquid jet units arranged in one or more groups and configured to jet an anti-etching liquid onto a surface of a substrate. The patterning apparatus also includes a plurality of exposure units configured to expose light on the anti-etching liquid jetted on the surface of the substrate to heat and cure the jetted anti-etching liquid to form anti-etching patterns on the surface of the substrate. Further, the patterning apparatus includes a control unit configured to control motion status and jetting status of the plurality of liquid jet units and motion status and exposure status of the plurality of exposure units, so as to form the anti-etching patterns at a predetermined line width and thickness.

A system includes a machine tool having a clamp. The system also includes a processing head configured to be temporarily held by the clamp of the machine tool. The processing head is also configured to deposit one or more media onto a workpiece. The processing head includes a guide configured to direct energy from an energy source onto the workpiece and/or the one or more media. The processing head also includes one or more supplies including one or more reservoirs within the processing head. The one or more reservoirs are configured to receive the one or more media, store the one or more media as the processing head is moved from one location to another location, and provide the one or more media.

Present embodiments include an additive manufacturing tool configured to receive a metallic anchoring material and to supply a plurality of droplets to a part, wherein each droplet of the plurality of droplets comprises the metallic anchoring material and a mechanical oscillation system configured to mechanically oscillate a structural component of the additive manufacturing tool toward and away from the part, wherein the mechanical oscillation system comprises a motor, a cam coupled to the motor, and a piston coupled to the cam, wherein the piston is fixedly attached to the structural component.

A patterning apparatus is provided. The patterning apparatus includes a plurality of liquid jet units arranged in one or more groups and configured to jet an anti-etching liquid onto a surface of a substrate. The patterning apparatus also includes a plurality of exposure units configured to expose light on the anti-etching liquid jetted on the surface of the substrate to heat and cure the jetted anti-etching liquid to form anti-etching patterns on the surface of the substrate. Further, the patterning apparatus includes a control unit configured to control motion status and jetting status of the plurality of liquid jet units and motion status and exposure status of the plurality of exposure units, so as to form the anti-etching patterns at a predetermined line width and thickness.

A slurry arm is provided. The slurry arm includes: an arm body; a slurry line that extends through the arm body; an oxygen removal chamber provided in the arm body and configured to receive slurry from the slurry line; a purge gas supplier configured to supply a purge gas to the slurry in the oxygen removal chamber; and a main valve configured to selectively discharge gas from the oxygen removal chamber.

An apparatus for manufacturing a display apparatus is provided. The apparatus includes a stage that has a first surface and a second surface. A display substrate is arranged on the first surface, and the second surface is opposite to the first surface. The apparatus also includes a jig facing the second surface, a heat transfer unit arranged on the jig and including a protrusion pin protruding toward the second surface, and a laser unit configured to irradiate a laser beam to the heat transfer unit.

The invention relates to a coating device for surface finishing of a workpiece, comprising at least the following components: a tool chuck for holding a workpiece with a treatment surface; a coating unit with an application axis for application of a finishing layer in a region and along a feeding direction on said treatment surface; and an optical monitoring unit by means of which an application operation on said treatment surface can be detected in a focus region.

The coating device is characterized especially in that the focus region of the monitoring unit is directed onto the region of the current application operation upstream of the region in the feeding direction and/or at an inclination with respect to the application axis. With the coating device proposed here, the application quality can be monitored in-line in the coating process.

An apparatus for manufacturing a display apparatus is provided. The apparatus includes a stage that has a first surface and a second surface. A display substrate is arranged on the first surface, and the second surface is opposite to the first surface. The apparatus also includes a jig facing the second surface, a heat transfer unit arranged on the jig and including a protrusion pin protruding toward the second surface, and a laser unit configured to irradiate a laser beam to the heat transfer unit.