A programmable, electronically controlled sprinkler system has a hermetically sealed internal chamber which encloses all of the internal water flow, valves, mechanical and rotational components and a plurality of magnetic coupling arrangements which allow external motors to control operation of the internal mechanical components without requiring any hydraulic seals.

The disclosure relates to an applicator (RZ), in particular a rotary atomizer, for the application of a coating agent, in particular a two-component paint, comprising a first coating agent connection (SL) for feeding a first coating agent, in particular a basic resin of a two-component paint, a first coating agent strand (L1-L4), which extends in the applicator (RZ) from the first coating agent connection (SL) and carries the first coating agent, and a first valve (SLV1), which is arranged in the first coating agent strand (L1-L4) and controls the flow of the first coating agent, wherein the first valve (SLV1) can be controlled by a first control signal. It is proposed that a first pressure-relief valve (SLV1), which is actuated by its own medium, is arranged in the first coating agent strand (L1-L4) and, to avoid a problem being caused by excessive pressure, opens automatically when the pressure upstream of the first pressure-relief valve (SLV1) exceeds a certain maximum pressure.

A fluid discharge mechanism includes a valve chamber having a linking portion linked to a pressurization space for a fluid, a first communication portion formed on a side opposite to the linking portion, and a second communication portion formed at a location between the linking portion and the first communication portion; a main flow channel communicating the second communication portion with a discharge opening; a sub-flow channel communicating the first communication portion with the main flow channel; and a valve member located inside the valve chamber and formed so as to move forward to the first-communication-portion side when the pressurization-space side reaches a predetermined pressure, to open the second communication portion, thereby performing the discharge, and so as to move backward to the communication-portion side after completion of the discharge.

A substrate processing apparatus includes a liquid processing tank, a movement mechanism, an ejector, and a controller. The liquid processing tank stores a processing liquid. The movement mechanism moves a plurality of substrates immersed in the liquid processing tank to a position above the liquid surface of the processing liquid. The ejector ejects a vapor of an organic solvent toward portions of the plurality of substrates that are exposed from the liquid surface. The controller changes an ejection flow rate of the vapor ejected by the ejector as the plurality of substrates are moved up.

A programmable, electronically controlled sprinkler system has a hermetically sealed internal chamber which encloses all of the internal water flow, valves, mechanical and rotational components and a plurality of magnetic coupling arrangements which allow external motors to control operation of the internal mechanical components without requiring any hydraulic seals.

A programmable, electronically controlled sprinkler system has a hermetically sealed internal chamber which encloses all of the internal water flow, valves, mechanical and rotational components and a plurality of magnetic coupling arrangements which allow external motors to control operation of the internal mechanical components without requiring any hydraulic seals.

A programmable, electronically controlled sprinkler system has a hermetically sealed internal chamber which encloses all of the internal water flow, valves, mechanical and rotational components and a plurality of magnetic coupling arrangements which allow external motors to control operation of the internal mechanical components without requiring any hydraulic seals.

A programmable, electronically controlled sprinkler system has a hermetically sealed internal chamber which encloses all of the internal water flow, valves, mechanical and rotational components and a plurality of magnetic coupling arrangements which allow external motors to control operation of the internal mechanical components without requiring any hydraulic seals.

Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, a gas flow control system for achieving improved transient response in apparatuses for controlling gas flow is disclosed. Specifically, by providing a command to an apparatus to deliver a predetermined mass flow rate at a future turn on time, the apparatus is able to pre-pressurize a P1 volume so that the response time of the apparatus is no longer dependent on the speed of the apparatus's control valves and the limitations of the control loop.

An irrigation management system which allows for modulation of the watering gradient along crop rows. The system may include dual drip lines which allow for selection of gradients based upon the time each of the dual lines is active. The system may utilize pressure sensitive valves which select drip lines based upon the inlet feed water pressure. The system may include drip emitters which modify flow rates based upon inlet feed water pressure.