A deposition apparatus includes: discharge nozzles arranged at predetermined intervals in a processing compartment in a deposition chamber, wherein each of the discharge nozzles comprises a discharge port that discharges aerosolized particulates toward a corresponding surface treatment object; linear motor single-axis robots arranged at predetermined intervals in a direction perpendicular to a nozzle arrangement direction; and nozzle head units that each adjust a mutual distance between the discharge port and a surface of the corresponding surface treatment object based on a shape of the corresponding surface treatment object, the nozzle head units moving along the nozzle arrangement direction, and the nozzle head units being arranged in each of the linear motor single-axis robots.

A method for manufacturing a golf ball having a non-uniform dot pattern is provided. Firstly, a semi-finished product of a golf ball is provided, which includes a ball body and a base layer covering an outer surface of the ball body. After that, the semi-finished product of the golf ball is rotated at a predetermined rotation speed, and a color paint is applied to the semi-finished product of the golf ball in a spraying manner from each of an upper position and a lower position.

Disclosed herein is a plasma coating system, including a plasma treatment device configured to generate a plasma discharge to treat a product; a coating station that treats the product with a liquid coating; and a transport surface that transports a product from the plasma treatment device to the coating station.

A method of dispensing a fluid in a semiconductor manufacturing process includes providing a substrate, positioning a nozzle above the substrate, and determining a cross-sectional shape of the nozzle. The method also includes configuring the nozzle to have the determined cross-sectional shape and applying the fluid to the substrate through the nozzle with the determined cross-sectional shape.

Presented is a door painting and drying assembly configured to hold an unfinished door for finishing by a single painter. The assembly includes an inner rim having a first rim member and a second rim member oriented perpendicular to one another, an outer rim consisting of a third rim member, and a fourth rim member oriented perpendicular to one another. The outer rim is rotatably configured over the inner rim such that the outer rim remains concentric with the inner rim during rotation. The assembly includes a beam attached across the fourth rim member, a sliding member slidably configurable on the beam. The sliding member includes slots for receiving a door support member to support a base portion of an unfinished door. The assembly further includes a vertical door support with a bracket adjustably mounted thereto to clamp to a mount attached on a hanging stile of the unfinished door.

The present invention relates to a substrate treatment apparatus including: a substrate support assembly having a chuck base installed rotatably with a rotating shaft; a fluid supply unit for supplying treatment fluid to top of a substrate; and a back nozzle assembly disposed in a hollow portion formed on a central portion of the chuck base to dispense the treatment fluid to the underside of the substrate.

A method of manufacturing a tubular member for an exhaust gas treatment device according to at least one embodiment of the present invention, the tubular member including a tubular main body made of a metal and an insulating layer formed on at least an inner peripheral surface of the tubular main body, the insulating layer containing glass, includes steps of: forming a coating film by spraying a coating liquid for insulating layer formation onto the inner peripheral surface of the tubular main body; and firing the coating film to obtain the insulating layer. The spraying is performed while the tubular main body is rotated with a length direction thereof being a rotation axis.

Proposed are a chemical liquid supply unit, a substrate processing apparatus having the same, and a chemical liquid supply method. More particularly, proposed is a technique for supplying chemical liquids of different flow rates, in which a chemical liquid is supplied at the same flow rate to each of a plurality of chemical liquid lines and the flow rate of the chemical liquid is adjusted through a flow control valve disposed on at least one chemical liquid line selected among the plurality of chemical liquid lines, so that the plurality of chemical liquid lines can supply chemical liquids at different flow rates.

Method and system for thermal transfer printing are disclosed. The system includes a transfer member having an imaging surface on the front side, a coating station at which a monolayer of particles made of, or coated with, a thermoplastic polymer is applied to the imaging surface, an imaging station at which electromagnetic radiation (EM) is applied via the rear side of the transfer member to selected regions of the particles-coated imaging surface to render the particles thereon tacky within the selected regions, and a transfer station at which only the regions of the particles coating that have been rendered tacky are transferred to a substrate. The transfer member includes on its rear side a body transparent to EM radiation and on its front side an EM radiation absorbing layer, the imaging surface being formed on, or as part of, the absorbing layer.

A lithography apparatus includes a wafer chuck configured to hold a wafer, a fluid source configured to contain a fluid to be applied towards the wafer during a lithography process, a dispensing nozzle positioned above the wafer chuck and in fluid communication with the fluid source, the dispensing nozzle having an adjustable cross-section, and a mechanical mechanism operable to apply a force towards an outer surface of the dispensing nozzle to change the adjustable cross-section.