The invention relates to a process for spraying an emulsion of water insoluble composition, such as an emulsified resin, with a centrifugal atomizer. The centrifugal atomizer comprises a housing, a rotary disc provided in a recess of the housing. An emulsion of a water insoluble composition is supplied to a chamber or formed in the atomizer, the chamber being formed between a front face and a cone of the rotary disc. A mist of air and an aqueous liquid is sprayed in the recess of the housing. The mist flushes the atomizer and limits or avoid water insoluble composition build-up. The invention also relates a centrifugal atomizer system adapted to perform such process.

A cleaning device for cleaning a liquid contact part of a discharge device, the liquid contact part including an operating space in which a rod-like member is operated, and a supply flow path, the cleaning device including a compressed gas source, a cleaning fluid supply tank, a plurality of supply mechanisms that supply compressed gas and a cleaning fluid, a cleaning fluid collection tank, a liquid contact part fixing jig to which the plural supply mechanisms and the cleaning fluid collection tank are fluidly connected, and which accommodates the liquid contact part of the discharge device, and a control device, wherein the cleaning fluid is supplied to the liquid contact part fixing jig in accordance with pressure values, which are specified separately for the plural supply mechanisms, by the control device. The liquid contact part can be cleaned with a uniform flow without disassembling the liquid contact part.

A slit nozzle is moved by a nozzle lifting/lowering mechanism and a nozzle sliding mechanism relative to substrates held in a substantially horizontal attitude by spin chucks. A development liquid is discharged on each substrate from a discharge port of the slit nozzle such that development processing for the substrate is performed. After the development liquid is discharged, the slit nozzle is moved to a waiting position excluding positions over the substrates held by the spin chucks. In waiting pods provided at the waiting positions, cleaning processing for the slit nozzle is performed by a cleaning liquid with gas bubbles mixed therein.

A method for a system having a plurality of primary fluid sources and a fluid output with a common pump includes halting pumping of a first fluid, isolating the common pump from the fluid output and the primary fluid sources, connecting an inlet of the common pump to a solvent source and a compressed air source, and an outlet of the common pump to a waste fluid dump, filling the common pump with a first purge volume of solvent, cycling the common pump in a flush mode, operating the common pump in a timed flow mode, and connecting an inlet of the common pump to a second primary fluid source, and an outlet of the common pump to the output line, and starting pumping of a second fluid from the second primary fluid source through the output line.

A self-cleaning negative-pressure ejector at least comprises a suction chamber, a jet pipe and a flushing member. A side wall of the suction chamber has at least one suction port for communicating with a first fluid pipeline. An exit port of the jet pipe is disposed in the suction chamber and ejects a second fluid so that a negative pressure is generated in the suction chamber, a first fluid in the first fluid pipeline enters the suction chamber, and a first included angle is between a direction in which the first fluid being sucked into the suction chamber and an ejection direction of the second fluid. The flushing member optionally provides a third fluid to flush the suction chamber and/or the first fluid pipeline.

A slit nozzle is moved by a nozzle lifting/lowering mechanism and a nozzle sliding mechanism relative to substrates held in a substantially horizontal attitude by spin chucks. A development liquid is discharged on each substrate from a discharge port of the slit nozzle such that development processing for the substrate is performed. After the development liquid is discharged, the slit nozzle is moved to a waiting position excluding positions over the substrates held by the spin chucks. In waiting pods provided at the waiting positions, cleaning processing for the slit nozzle is performed by a cleaning liquid with gas bubbles mixed therein.

Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.

Systems and methods for cleaning gun-style applicators are provided that reduce the costs associated with cleaning applicators as well as the cost and burden associated with disposing of containers of cleaning material when they are empty. An adapter of the system has a first end that couples with an output port of a canister of aerosolized cleaning material and a second end that couples with a first end of a hose having a second end that couples with an input port of the applicator. Actuation of a trigger of the applicator causes the aerosolized cleaning material to flow through a bore of the adapter, through the hose, through an internal portion of the gun-style applicator and out of a nozzle of the gun-style applicator.

An integrated fluid distributor includes a single case in which flow paths for different fluids are independently disposed. The integrated fluid distributor may also be capable of distributing and discharging respective fluids. The integrated fluid distributor includes a case, and a first flow path disposed within the case. The first flow path has a first inlet, a plurality of first outlets, and a plurality of first valves for a first fluid. The integrated fluid distributor also includes a second flow path disposed independently of the first flow path within the case. The second flow path has a second inlet, a plurality of second outlets, and a plurality of second valves for a second fluid.

A spray applicator is operable in a spray state, during which the applicator emits a plural component material formed within a mix chamber of the spray application, and a purge state, during which the spray applicator emits compressed air from the mix chamber. First and second portions of the purge air are provided to the mix chamber through separate flowpaths and combine within the mix chamber. Only one of the portions of purge air is routed through a dosing chamber to entrain solvent and carry the solvent to the mix chamber. The solvent assists in clearing residue from the mix chamber.