A glove coating device capable of supplying a coating layer in which pores are uniformly mixed is provided. The glove coating device includes: i) a dipping bath that is adapted to receive a coating liquid; ii) a coating liquid circulation tank installed in the dipping bath and that is spaced apart from a bottom surface of the dipping bath; iii) an impeller located in the dipping bath and that is adapted to transfer the coating liquid to the coating liquid circulation tank; iv) a motor positioned above the impeller to drive the impeller; and v) a drive shaft extending in the vertical direction to interconnect the motor and the impeller. The coating liquid circulation tank includes i) a first side opened to allow the coating liquid to be introduced; a second side formed on the opposite side of the first side and opened in a direction away from the bottom side to apply the coating liquid to overflow; and a flow passage communicating with the first side and the second side. The flow passage includes i) a first flow passage portion that is adapted to communicate with the first side and having a predetermined width that is smaller than the width of the coating liquid circulation tank, and ii) a second flow passage portion communicating with the first flow passage portion and the second side and gradually widening a width of the second flow passage portion from the first flow passage portion to the second side.

Aspects of the disclosure include systems and methods for removing a sample from a carrier material and depositing the sample onto a substrate. The sample can be placed in an aperture of a substrate guide on a stage within a cavity. Etching fluid can be introduced into the cavity to etch the carrier material from the sample and then drained. A rinsing material can be introduced into the cavity to rinse the etching fluid and then drained. A sample deposition process can be performed wherein rinsing fluid is introduced into the cavity to raise the sample guide and sample above the level of a substrate on a substrate holder. The substrate holder can be positioned relative to the sample guide so that the sample within the aperture aligns with the substrate on the substrate holder. The rinsing fluid is drained so that the sample is lowered onto the substrate.

Aspects of the disclosure include systems and methods for removing a sample from a carrier material and depositing the sample onto a substrate. The sample can be placed in an aperture of a substrate guide on a stage within a cavity. Etching fluid can be introduced into the cavity to etch the carrier material from the sample and then drained. A rinsing material can be introduced into the cavity to rinse the etching fluid and then drained. A sample deposition process can be performed wherein rinsing fluid is introduced into the cavity to raise the sample guide and sample above the level of a substrate on a substrate holder. The substrate holder can be positioned relative to the sample guide so that the sample within the aperture aligns with the substrate on the substrate holder. The rinsing fluid is drained so that the sample is lowered onto the substrate.

Aspects of the disclosure include systems and methods for removing a sample from a carrier material and depositing the sample onto a substrate. The sample can be placed in an aperture of a substrate guide on a stage within a cavity. Etching fluid can be introduced into the cavity to etch the carrier material from the sample and then drained. A rinsing material can be introduced into the cavity to rinse the etching fluid and then drained. A sample deposition process can be performed wherein rinsing fluid is introduced into the cavity to raise the sample guide and sample above the level of a substrate on a substrate holder. The substrate holder can be positioned relative to the sample guide so that the sample within the aperture aligns with the substrate on the substrate holder. The rinsing fluid is drained so that the sample is lowered onto the substrate.

Aspects of the disclosure include systems and methods for removing a sample from a carrier material and depositing the sample onto a substrate. The sample can be placed in an aperture of a substrate guide on a stage within a cavity. Etching fluid can be introduced into the cavity to etch the carrier material from the sample and then drained. A rinsing material can be introduced into the cavity to rinse the etching fluid and then drained. A sample deposition process can be performed wherein rinsing fluid is introduced into the cavity to raise the sample guide and sample above the level of a substrate on a substrate holder. The substrate holder can be positioned relative to the sample guide so that the sample within the aperture aligns with the substrate on the substrate holder. The rinsing fluid is drained so that the sample is lowered onto the substrate.

A device comprising a rotating means enclosed in a housing and having a horizontally arranged rotating shaft. Containers for cassettes containing samples are mounted on the rotating shaft and are joined in the form of a vertically arranged ring. The device has a means for rotating the rotating shaft at a variable speed and vessels containing processing and infiltrating liquids, said vessels being arranged outside the housing and being connected thereto by pipes for feeding in and discharging said liquids. The device additionally contains a mechanism for orienting the containers for cassettes containing samples, which mechanism is arranged between the ring of containers and the wall of the device, has a separate means for transferring the containers for cassettes containing samples into a horizontal or inclined position and holds same in the horizontal or inclined position.

A device and method is provided for treating surfaces, in particular for colouring moulded parts, said device comprising a container for receiving moulded parts and a first cover. The container can be closed, preferably, by using the first cover. A system is also provided for introducing liquid and/or powdery surface treatment agents into an inner chamber of the closed container. The system comprises a capsule in which the surface treatment agents which are to be introduced are accommodated.

A device and method is provided for treating surfaces, in particular for colouring moulded parts, said device comprising a container for receiving moulded parts and a first cover. The container can be closed, preferably, by using the first cover. A system is also provided for introducing liquid and/or powdery surface treatment agents into an inner chamber of the closed container. The system comprises a capsule in which the surface treatment agents which are to be introduced are accommodated.

In order to provide a device and a method for treating workpieces (102), which allow optimum treatment of the workpieces, a treatment station (114) comprises a treatment chamber (136) that can be flooded for the purpose of treating the workpiece.

In order to provide a device and a method for treating workpieces (102), which allow optimum treatment of the workpieces, a treatment station (114) comprises a treatment chamber (136) that can be flooded for the purpose of treating the workpiece.