Provided in certain embodiments herein are alternating current electrospray systems and processes for manufacturing depositions, such as thin layer depositions. In some embodiments, processes and systems provided herein are suitable for and configured to manufacture uniform depositions, such as having uniform thickness.

Provided herein is a device for forming a conductive film. The device includes a deposition device and an air supply. The deposition device is configured to form a wet film having conductive nanostructures and a fluid carrier on a web. The web is moved in a first direction while forming the wet film. The air supply is disposed at a side of the web and configured to apply an air flow onto the wet film. The air flow is directed onto the wet film in a second direction perpendicular to the first direction to reorient a direction of some conductive nanostructures in the wet film to define reoriented conductive nanostructures.

An intumescent mesh has a flexible grid with a plurality of strands that form a series of openings in the flexible grid, and an intumescent coating applied to the flexible grid. The intumescent coating is made of an expandable graphite and a polymer-based carrier as ingredients and having an activation temperature above which the intumescent coating swells. The grid is sized such that the intumescent coating permits airflow through the flexible grid until the intumescent coating is exposed to temperatures at or above the activation temperature, whereupon the intumescent coating swells to seal the openings and prevent air flow through the flexible grid.

A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generator to form a standing wave in the space, causing the droplet supplier to supply the droplet to a node of the standing wave generated in the space, and bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece.

A coating tank 1 provided with a net belt passage opening is prepared, a slurry obtained by dispersing a rare-earth-compound powder in a solvent is continuously supplied to the coating tank 1 to cause the coating tank 1 to overflow, and a plurality of sintered magnet bodies 10 are arranged on a net belt conveyor 5, continuously conveyed horizontally thereon, and passed through the slurry in the coating tank 1 via the net belt passage opening, to apply the slurry to the sintered magnet bodies. The slurry is subsequently dried to continuously apply the powder to the plurality of sintered magnet bodies. As a result, the rare-earth-compound powder can be uniformly applied to the surfaces of the sintered magnet bodies, and the application operation can be performed extremely efficiently.

Provided in certain embodiments herein are gas controlled electrospray systems and processes for manufacturing depositions, such as thin layer films. In some embodiments, processes and systems provided herein are suitable for and configured to manufacture uniform depositions, such as having uniform thickness.

A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generator to form a standing wave in the space, causing the droplet supplier to supply the droplet to a node of the standing wave generated in the space, and bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece.

An applicator head for a curtain applicator for coating a continuous material web with liquid or pasty application medium. The applicator head has an outlet edge extending substantially over the width of the applicator head. The application medium passes out of the applicator head in a free-falling curtain. A rinsing device allows the outlet edge to be supplied with a flowing gaseous rinsing medium. There is also described a method for coating a continuous material web by way of such a curtain applicator. The application medium passes out of the applicator head in the form of a free-falling curtain and subsequently comes into contact with the material web. The region of at least one of the outlet edges can be supplied with a flowing gaseous rinsing medium.

Provided herein is a device for forming a conductive film. The device includes a deposition device and an air supply. The deposition device is configured to form a wet film having conductive nanostructures and a fluid carrier on a web. The web is moved in a first direction while forming the wet film. The air supply is disposed at a side of the web and configured to apply an air flow onto the wet film. The air flow is directed onto the wet film in a second direction perpendicular to the first direction to reorient a direction of some conductive nanostructures in the wet film to define reoriented conductive nanostructures.

A method for applying a multi-layer coating includes passing a substrate through a nip defined by two rolls to apply a first thickness of a first liquid coating material, applying a second liquid coating material on the first liquid coating material having the first thickness as applied by passing through the nip, and controlling a thickness of the applied second liquid coating material.