Patent classifications
B05D3/065
System and process for selectively and locally treating the surface of parts, especially via deposition of material
Process for selectively and locally treating the surface of a part, whereina part having a surface to be treated is provided, said surface being defined by a direction P and a direction Q; three-dimensional profilometric data are acquired from the surface to be treated, in order to obtain a set F1 of three-dimensional data on the surface to be treated, said set F1 associating a height with each point in the plane PQ; this set F1 of digital data is processed digitally with a view to subtracting said curves, to obtain a set F2 of reprocessed three-dimensional data; this set F2 of data is processed digitally, to obtain a set F3 of binary data on the surface to be treated, said digital processing attributing, to each point on the surface, a first binary value or a second binary value, depending on at least one criterion related to the height of the point on the surface; the surface is selectively and locally treated using said set F3 of binary data, said surface treatment being performed only at points on the surface the binary datum of which has said first or said second binary value.
Process for preparing a processed filament, including interaction of a segment with at least one beam of electromagnetic radiation of a first kind
One aspect relates to a process for preparing a processed filament, including provision of a filament, including a segment. At least in the segment, the filament includes a core, including a first metal, a first layer which is superimposed on the core, and includes a polymer, and a second layer which is superimposed on the first layer, and includes a second metal. The segment of the filament is processed by interaction of the segment with at least one beam of electromagnetic radiation of a first kind. The electromagnetic radiation of the first kind has a spectrum with a peak wavelength in the range from 430 to 780 nm. Further, one aspect relates to a processed filament, obtainable by the process; a filament; an electrical device, including at least a part of the processed filament.
PREPARATION OF SULFONAMIDE-CONTAINING ANTIMICROBIALS AND SUBSTRATE TREATING COMPOSITIONS OF SULFONAMIDE-CONTAINING ANTIMICROBIALS
A quaternary ammonium sulfonamide compound of formula (I): wherein R=(II), C.sub.1-C.sub.3 linear or branched alkyl, R.sub.1 and R.sub.2 are the same or different and selected from C.sub.1 to C.sub.18 linear or branched alkyl, R.sub.3 and R.sub.4 are the same or different and selected from C.sub.1 to C.sub.4 linear or branched alkyl, CF.sub.3, OR.sub.5 where R.sub.5 is C.sub.1 to C.sub.8 linear or branched alkyl or polyethylene oxide, l is 1, 2, 3, 4, 5, 6, 7 or 8, m is 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16 or 17, n is 0, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17 or 18, wherein the aryl groups of R may be substituted or unsubstituted, X=halogen, and Y=(III) wherein R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 are the same or different and selected from C.sub.1 to C.sub.6 linear or branched alkyl and the benzophenone is selected from the group consisting of substituted benzophenone and unsubstituted benzophenone, process for preparing the compound and antimicrobial surface coating compositions of the compound.
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Photoswitchable graphene membranes
Graphene composites are disclosed. The graphene composites may include, for example, a photoswitchable layer, a graphene layer, and a substrate. The graphene composites may, in some embodiments, include a graphene layer with photoswitchable surface characteristics. Methods of making the graphene composite are further disclosed. Devices and systems configured to make and use the composites are also disclosed.
Light irradiating device
The light irradiating device includes a substrate; a plurality of light emitting diode elements disposed on a surface of the substrate; a cooling unit which is disposed on a rear surface of the substrate; an inner wall which is disposed to enclose a light passage area through which light of the plurality of light emitting diode elements passes; a housing which accommodates the substrate, the plurality of light emitting diode elements, the cooling unit, and the inner wall and generates a space between the inner wall and the housing; an air inlet which introduces air in the light passage area onto the rear surface of the substrate; a flow channel which passes through the rear surface of the substrate and connects the air inlet and the space; and a circulation port which is provided to discharge the air in the space to the light passage area.
PIEZORESISTIVE MATERIAL EXHIBITING AN OPTIMAL GAUGE FACTOR
The present invention relates to a multilayer composite material comprising:
a base layer
a metallic layer consisting of an insulating matrix phase and of a metallic particles phase, said metallic particles being distributed in the insulating matrix, wherein a volume fraction being the ratio between the volume of metallic particles and the volume of the metallic layer corresponds to a critical volume fraction *+, with 0<5%, the critical volume fraction * being the volume fraction for which an increase of conductivity of the metallic layer as a function of the volume fraction has a maximum value.
Optical device fabrication
Transparent conductive coatings are polished using particle slurries in combination with mechanical shearing force, such as a polishing pad. Substrates having transparent conductive coatings that are too rough and/or have too much haze, such that the substrate would not produce a suitable optical device, are polished using methods described herein. The substrate may be tempered prior to, or after, polishing. The polished substrates have low haze and sufficient smoothness to make high-quality optical devices.
FILM PRODUCTION METHOD AND SYSTEM
A film production method and system are provided. The film production method includes: forming an ink layer on the base substrate covering the surface of the base substrate, the ink layer including a solvent and a film-forming material dissolved in the solvent; blowing gas to the ink layer so that the solvent in the ink layer spreads towards the periphery of the base substrate; removing the solvent in the ink layer so that the film-forming material in the ink layer forms a film covering the surface of the base substrate. The film production system applies to the film production method described above.
DIGITAL EMBOSSING
A method of forming a digital embossing on a surface by bonding hard press particles to a carrier. A liquid binder pattern is applied on the carrier by a digital drop application head. Hard press particles are applied on the carrier and the binder pattern such that some hard press particles are bonded to the carrier by the liquid pattern and non-bonded press particles are removed. The carrier with the bonded hard press particles is pressed to the surface and an embossing is formed when the carrier with the hard press particles is removed.
Methods for forming and using silver metal
A method for providing electrically-conductive silver-containing metal in a thin film or one or more thin film patterns on a substrate. Electrically-conductive metallic silver is provided from a non-hydroxylic-solvent soluble silver complex represented by the following formula (I):
(Ag.sup.+).sub.a(L).sub.b(P).sub.c (I)
wherein L represents an -oxy carboxylate; P represents a 5- or 6-membered N-heteroaromatic compound; a is 1 or 2; b is 1 or 2; and c is 1, 2, 3, or 4, provided that when a is 1, b is 1, and when a is 2, b is 2. A photosensitizer can also be present. The reducible silver ions in the photosensitive thin film or photosensitive thin film pattern can be photochemically converted to electrically-conductive metallic silver in the thin films or thin film patterns by irradiation with electromagnetic radiation having a wavelength within the range of at least 150 nm and up to and including 700 nm.