An object having a high temperature resistance includes an inorganic substrate, an omniphobic non-stick coating, and an adhesion-promoting coating containing amorphic silicon dioxide and located between the inorganic substrate and the omniphobic non-stick coating.

A composition that is easily applied, clear, well-bonded, and superhydrophobic is disclosed. In one aspect, the composition includes a hydrophobic fluorinated solvent, a binder comprising a hydrophobic fluorinated polymer, and hydrophobic fumed silica nanoparticles. Also disclosed is a structure including a substrate coated with the composition, as well as a method for making the composition and a method of coating a substrate with the composition.

A method for bonding a polymeric fill material onto a surface of a substrate is described, and includes exposing the surface of the substrate to a microwave-generated argon-hydrogen plasma for a predetermined time period, applying, via a microwave plasma chemical vapor deposition process, a SiOx surface coating onto the surface of the substrate, and executing a post-treatment process to the SiOx surface coating. The polymeric fill material may be applied onto the substrate and subjected to curing.

A versatile, thermally stable and economically effective corrosion inhibition treatment for copper (Cu) metal and selected metals surface through a single step chemical vapor deposition (CVD) of selected inhibitor compounds at temperatures as low as 100-200 C. is described in this invention. The resulting CVD deposited inhibition coating is thermally stable to 300 C. and protects Cu and selected metals from active corrosion in various technologically important operational environments. The selective coating for copper metal is achieved by controlling the chemistry of bonding between the Copper metal surface and inhibitor material used. The technique can be accomplished by using one or more inhibitors separately or in combination in order to create an all-terrain stable & robust corrosion prevention coating for copper metal.

Provided herein is a film and methods of producing the same. The film includes a substrate and a layer adjacent to the substrate, wherein a surface of the layer comprises spaced apart protrusions. The methods include providing a substrate, depositing a layer on at least a portion of the substrate, decomposing the layer to form at least a first phase of material and a second phase of material, and removing at least a portion of the second phase from the decomposed layer to form a structured layer.

A method for forming a polyethylene and alumina nanocomposite coating on a substrate is described. The method may use microparticles of UHMWPE with nanoparticles of alumina to form a powder mixture, which is then applied to a heated steel substrate to form the nanocomposite coating. The nanocomposite coating may have a Vickers hardness of 10.5-12.5 HV.

A method of producing an article including a substrate and a layer a surface-treating agent containing a polyether group-containing silane compound on a surface of the substrate, wherein the polyether group-containing silane compound is () a compound represented by formula (1) or formula (2):

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Techniques regarding methods and/or apparatuses for protecting metal substrates during one or more lithography processes are provided. For example, one or more embodiments described herein can comprise a method that can include coating a metal substrate with a polymer film that self-assembles on a metal oxide positioned on a surface of the metal substrate. The method can also include covalently bonding the polymer film to the metal oxide.

An apparatus for vapor deposition of thin film coatings, including: a process controller; a plurality of precursor containers into which a plurality of coating precursors, each in the form of a liquid or a solid, are respectively placed; a plurality of precursor vapor reservoirs, each in communication with a respective one of said precursor containers; a plurality of in-line devices which control a vapor flow of a coating precursor vapor from one of said precursor containers into one of said precursor vapor reservoirs with which said precursor container is in communication upon receipt of a signal from said process controller; a plurality of precursor control valves which control vapor flow from said precursor vapor reservoir upon receipt of a signal from said process controller; and a process chamber for vapor deposition of said coating on a substrate when present in said process chamber.

A composition that is easily applied, clear, well-bonded, and superhydrophobic is disclosed. In one aspect, the composition includes a hydrophobic fluorinated solvent, a binder comprising a hydrophobic fluorinated polymer, and hydrophobic fumed silica nanoparticles. Also disclosed is a structure including a substrate coated with the composition, as well as a method for making the composition and a method of coating a substrate with the composition.