One embodiment provides a rinse basin and blower system configured to clean a pipette including: a rinse basin comprising: a hollow tube enclosed at one end; wherein the hollow tube comprises an upper port and a lower port; and the lower port being tapered toward the hollow tube; and wherein the rinse basin is connected to a blower system; the blower system comprising: a waste reservoir that receives, from the rinse basin, a waste product comprising: air and liquid, wherein the waste reservoir separates the liquid from the air; a dryer that receives the air from the waste reservoir and further separates any remaining liquid from the air; and a blower that receives the air from the dryer and exhausts the air.

Washing apparatus and methods used to process additively fabricated (e.g., 3D printed) parts are described herein. The apparatus and methods may be used to wash uncured liquid resin from the parts.

An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and drying the continuous substrate.

The present invention discloses a molten salt ultrasonic cleaning machine. the molten salt ultrasonic cleaning machine includes a tank body, a molten salt heating system, an ultrasonic application system and a stirring system, wherein the tank body is configured to accommodate molten salt and a to-be-cleaned workpiece; the tank body includes a bottom wall, and a side wall arranged circumferentially in a surrounding way; the molten salt heating system is configured to heat the molten salt in the tank body; the ultrasonic application system is configured to apply ultrasonic impact to the to-be-cleaned workpiece in the tank body; and the stirring system includes a stirring rod which is rotatably arranged in the tank body. When the molten salt ultrasonic cleaning machine provided by the present invention cleans a workpiece, the stirring rod rotates to improve the flowability of the molten salt. In combination with the ultrasonic impact, rapid removal of pollutants in the complex space of the workpiece and pollutants on the bottom layer of the surface is accelerated, so that the cleaning efficiency is improved. Moreover, the improvement of the molten salt flowability can promote complete reaction between the unreacted paint and residues which float on the surface of the liquid level, and the molten salt, so that the quantity of generated waste gas is reduced.

A material cleaning device and a cooking appliance. The material cleaning device comprises: a cleaning chamber, an air inlet, a material inlet, and a water inlet being provided on the cleaning chamber, the air inlet, the material inlet, and the water inlet being respectively used for transporting air flows, a material to be cleaned, and water for cleaning the material to the cleaning chamber; and a stirring assembly provided in the cleaning chamber and being capable of rotating in the cleaning chamber under the action of the air streams, so as to stir the material and the water in the cleaning chamber. The material cleaning device drives the stirring assembly to rotate by means of air streams, so as to make the stirring assembly stir the material and the water in the cleaning chamber, thereby implementing automatic cleaning. The material cleaning device features a simple structure, and is easy to use.

Method of making a three-dimensional object, comprising the steps of: (a) providing a carrier platform on which the three-dimensional object can be formed; (b) producing the three-dimensional object, (c) immersing the object in a wash liquid with the object remaining adhered to the carrier platform; (d) agitating (i) the object in said wash liquid, (ii) the wash liquid with the object immersed therein, or (iii) both the object and the wash liquid, to at least partially remove residual resin from the surface of the object; (e) separating the object from the wash liquid, with the object remaining adhered to the carrier platform, (f) agitating the object to at least partially remove residual wash liquid from the surface thereof; and (g) repeating steps (c) through (f) to remove additional polymerizable resin from the surface thereof, wherein steps (c) through (f) are carried out in the same vessel.

Compositions or finishing solutions configured to remove unwanted material, such as uncured material or resin, from additively manufactured objects are disclosed herein, in one example, the finishing solution includes a first glycol ether and a second glycol ether and/or a high flash point hydrocarbon, wherein the finishing solution has a flash point of at least 93.3° C. In alternative examples, the finishing solution may also include a third glycol ether, a high flash point alcohol, and/or an acetate of a glycol ether.

A cleaning system for a meat-packing plant includes a tank with a potassium-based cleaner disposed in the tank. A track has a gambrel disposed on the track. The track includes a dip over the tank to dip the gambrel into the potassium-based cleaner as the gambrel moves along the track. A processed animal carcass is removed from the gambrel prior to the gambrel being dipped into the potassium-based cleaner. A fresh animal carcass is disposed on the gambrel after the gambrel is dipped into the potassium-based cleaner.

A kitchen machine has an automatic cleaning function. The kitchen machine comprises a vessel, an agitator located in the vessel, a motor configured to rotate the agitator, a heater configured to heat the vessel, a temperature sensor configured to detect a temperature of the vessel, and a controller configured, for cleaning the vessel, to control, based on a temperature detected by the temperature sensor, at least one of a rotation speed of the motor, a rotation duration of the motor, a rotation direction of the motor, a heating temperature of the heater, and a heating duration of the heater.

A substrate processing device according to the present embodiment includes a processing tank configured to be capable of accumulating a liquid. A conveyer can array a plurality of semiconductor substrates in such a manner that front surfaces of the semiconductor substrates face a substantially horizontal direction, and transport the semiconductor substrates into the processing tank. A plurality of liquid suppliers can supply the liquid toward an inside of the processing tank from a lower portion of the processing tank. A plurality of current plates are arranged on at least either one end side or the other end side of an array of the semiconductor substrates. The current plates are provided in a first gap region above the semiconductor substrates in gaps between the conveyer and a sidewall of the processing tank on both sides of the conveyer as viewed from an array direction of the semiconductor substrates.