An apparatus for cleaning and cooking seafood or crustacea has a container with an interior volume defined by wall, a basket removably received in the interior volume of the container, a pipe positioned adjacent to the wall and having a plurality of apertures adapted to direct a flow of water toward a portion of the wall spaced from the pipe such that the flow water creates a cyclonic path in the basket within the container, and a connector fluid equally connected to the pipe and having a portion extending outwardly of the wall of the container. The wall of the container has a taper that matches a taper of the wall of the basket. The basket has a slotted configuration overlying the pipe. A pot is spaced from the container and serves to removably receive the basket.

A washing bucket has a container having an interior defined by wall and a bottom, a fluid inlet affixed to the wall of the container so as to communicate with the interior of the container in order to deliver a fluid into an interior of the container, and a connector affixed to the fluid inlet at an end exterior of the container. The fluid inlet is positioned adjacent to a bottom of the container. The connector is adapted to allow a hose or a conduit to be connected to the fluid inlet. A pipe is connected to the fluid inlet. The pipe has a plurality of apertures adapted to direct the fluid from the fluid inlet into the interior of the container. The pipe extends generally vertically upwardly from the fluid inlet.

An apparatus for cleaning and cooking seafood or crustacea has a container with an interior volume defined by a tapered wall, a basket removably received in the interior volume of the container, a pipe positioned adjacent to the wall of the container and having a plurality of apertures adapted to direct the flow of water through holes of the basket, and a connector fluidically connected to the pipe and having a portion extending outwardly of the tapered wall of the container. The basket is tapered so as to be nestable within the tapered wall of the container. The basket has an indentation with holes extending over the pipe. A pot is spaced from the container and nestably removably receives the basket therein.

A substrate processing system includes a substrate processing set and a substrate holding unit. The substrate processing set includes a substrate supporting part for supporting a vertical substrate. The substrate holding unit includes two cantilevers and two substrate holding parts. Each of the substrate holding parts is respectively located on each of the cantilevers. The two substrate holding parts are used for holding the substrate vertically. When the substrate holding unit moves next to the substrate processing set and the two substrate holding parts touch the substrate, the two substrate holding parts hold the substrate.

An apparatus and method of cleaning a food processor including providing a food processor base that includes a rotary power driver having a rotatable shaft. A bowl is mounted on the base. A food processing blade attached to the shaft within the bowl. A cleaning accessory is placed in the bowl above the food processing blade. A cleaning fluid is introduced into the bowl, and the food processing blade with the rotatable shaft agitate the cleaning fluid in conjunction with the cleaning accessory.

A mop washing bucket has a container with an interior volume defined by a bottom and a wall extending upwardly from the bottom, a fluid inlet affixed adjacent to the bottom of the container, and a fluid outlet formed on the container in a location above the fluid inlet. The fluid inlet is adapted to be connected to a water hose. The fluid inlet extends through the wall of the container so as to have one end in the interior volume of the container and another end exterior of the wall of the container. The fluid outlet is adapted to allow water from the interior volume of the container to flow outwardly of the container.

A sprayer apparatus includes a spray nozzle in fluid communication with a reservoir for an aqueous salt solution; at least two electrodes spaced apart from each other integrated into the reservoir; a controller structured to apply electricity to the at least two electrodes, wherein the controller controls an application of electricity to cause a first one of the at least two electrodes to be positively charged and a second one of the at least two electrodes to be negatively charged; and wherein the sprayer apparatus is configured to produce air bubbles during application of electricity, wherein the air bubbles cause agitation and mixing of the aqueous salt solution.

A parts-washing method is described. The method comprises: (a) contacting a part with an aqueous liquid cleaning composition in a contact zone at a temperature of less than 45 degrees C., wherein the aqueous liquid cleaning composition comprises at least one alkoxylate surfactant; (b) passing at least part of the aqueous liquid cleaning composition from the contact zone to a separation housing; (c) separating the aqueous liquid cleaning composition in the separation housing to form an upper oily phase, an intermediate aqueous phase and a lower particulate phase; and (d) withdrawing at least a portion of the intermediate aqueous phase for use as the aqueous liquid cleaning composition in the contact zone.

The present disclosure provides a wafer cleaning apparatus and a cleaning method. The wafer cleaning apparatus includes a tank and a wafer holder. The tank includes a bottom wall, a lateral wall, and a partition wall. The lateral wall is connected to the bottom wall. The partition wall is movably mounted on the lateral wall and divides a cleaning space defined by the bottom wall and the lateral wall into a first compartment and a second compartment. A passage communicating with the first compartment and the second compartment is formed when the partition wall is moved away from the bottom wall and immersed in a cleaning fluid received in the cleaning space. The wafer holder is adapted to be immersed in the cleaning fluid and to move between the first compartment and the second compartment. The present disclosure further provides a method of cleaning the wafer.

An apparatus, a method, and a computer program product for cleaning and collecting microplastics and modelling workflow for microplastic autonomous filtration. The apparatus may include a cleaning chamber through which water containing the microplastics flows. The apparatus may also include a transducer configured to generate microbubbles of a size that causes the microbubbles to clean microplastics flowing through the cleaning chamber. The apparatus may also include a filter chamber located above the cleaning chamber, where the filter chamber includes a microplastic collection device operable to collect the microplastics.