A roasting and glazing apparatus includes a housing having a top peripheral surface with an opening defined by an interior edge, a roaster bowl movable from within the housing, through the opening, to an elevated position above the housing, and a pour tray configured to detachably couple to the interior edge, and to receive and guide a fluid exiting the roaster bowl when the roaster bowl is in the elevated position. The pour tray has a bottom surface and a mounting bracket extending from the bottom surface. The mounting bracket is configured to detachably couple to the interior edge of the housing defining the opening. In an assembled configuration, the bottom surface of the pour tray is oriented at an angle relative to the top peripheral surface of the housing and supported by a shoulder or side peripheral surface of the housing.

A surface cleaning apparatus, such as a steam mop, includes a steam delivery system having a steam delivery pathway. A fragrance dispenser for receiving a fragrant material is provided on the apparatus, and a portion of the steam delivery pathway is in heat exchange relationship with the fragrance dispenser to heat the fragrant material in the fragrance dispenser by heat transfer from the steam in the pathway. Fragrance is dispensed from apparatus via heat transfer utilizing the steam pathway as a thermal radiation source.

The present invention relates to a withdrawal plate suitable for an apparatus for withdrawing a sprayed paint to solve a failure of a painting facility and a contamination problem due to paint sludge, which includes: a square frame constituted by left and right side frames 91, an upper frame 92, and a base frame 93; and slats 94 arranged at a predetermined interval within the square frame, in which the left and right side frames 91 facing each other are included in one direction, and the slat 94 is fixed the left and right side frames 91 in an oblique state so that a front is lifted up and moves down backwards when viewed from the side, and multiple slats are consecutively arranged at a predetermined interval in a vertical direction.

A substrate processing method includes a liquid film forming step of forming a liquid film of the processing liquid on the upper surface of the substrate; a liquid filling heating step of supplying a heating medium to a space between a heater unit and the substrate to thereby fill the space with the heating medium, and heating the heating medium by the heater unit, an opening defining step of defining an opening in the central region of the liquid film in a state where the substrate is heated in the liquid filling heating step such that the temperature of the substrate is the boiling point of the processing liquid or higher, and an opening enlarging step of enlarging the opening while rotating the base to thereby rotate the substrate. The liquid filling heating step is executed in parallel with the opening enlarging step at least during part of a period of the opening enlarging step.

A kennel comprising: (a) a feeding system including: (i) one or more water bowls; (ii) one or more water storage in communication with the one or more water bowls; (iii) one or more food bowls; and (iv) one or more food storage in communication with the one or more food bowls; (b) a communication system including: (i) one or more cameras; (ii) one or more speakers; (iii) one or more microphones; or (iv) a combination of (i), (ii), and (iii); (c) an entry system including: a cleaning system; and (d) a remote device including an application that is in communication with the kennel so that a user can control the feeding system, the communication system, the entry system, or a combination thereof.

A method for removing particles from a semiconductor wafer surface is disclosed. A wafer is being spun on a spin coater contained within a condensing environment. Liquid vapor is then infused into the condensing environment to allow some of the liquid vapor to be condensed onto a surface of the wafer on which particles may adhere while the wafer is being spun. Next, a set of light pulses is applied to the surface of the spinning wafer. Finally, an electric grid is utilized to remove the particles off the surface of the wafer.

An apparatus for steam treatment of a conditioner head and/or conditioner disk in a chemical mechanical polishing system includes a conditioner cleaning cup, a boiler to generate steam, one or more nozzles positioned to direct steam inwardly into a cavity defined by the load cup, and a supply line running from the boiler to the one or more nozzles to supply steam to the one or more nozzles.

A method of processing a plurality of substrates includes immersing the plurality of substrates into a bath solution contained in a bath chamber; generating gas bubbles in the bath solution; projecting light from a light source toward the bath chamber; generating light sensor data by capturing light emanating off the bath chamber after interacting with the gas bubbles with a light sensor; and converting the light sensor data into a metric for the bath solution.

Methods and compositions for cleaning industrial equipment (e.g. biofuel or corn ethanol plant equipment) in place at high temperatures using acidic methane sulfonic acid compositions having a low pH.

A kennel comprising: (a) a feeding system including: (i) one or more water bowls; (ii) one or more water storage in communication with the one or more water bowls; (iii) one or more food bowls; and (iv) one or more food storage in communication with the one or more food bowls; (b) a communication system including: (i) one or more cameras; (ii) one or more speakers; (iii) one or more microphones; or (iv) a combination of (i), (ii), and (iii); (c) an entry system including: a cleaning system; and (d) a remote device including an application that is in communication with the kennel so that a user can control the feeding system, the communication system, the entry system, or a combination thereof.