A foreign object removal apparatus removes a foreign object attached on a can body by rinsing the can body. The foreign object removal apparatus includes a conveyance line configured to convey the can body, a destaticizing air blower configured to blow a destaticizing air to the conveyed can body, and a rinser configured to rinse the can body after blowing the destaticizing air using the destaticizing air blower.

The invention provides methods and compositions for reducing the amount of water required in an industrial process, especially a bottling process such as beer or beverage manufacturing. The method comprising the steps of: collecting water used to rinse cleaned and/or dirty recycled bottles, spraying the collected water at a food contacting piece of equipment as part of a CIP rinse, and passing the CIP second rinse water into a cooling tower as make-up water. The method allows for the re-use of water already in the system but by being careful where each water stream goes the water does not accumulate contaminants that would damage the cooling tower or foul the bottled product or vessel that is cleaned by CIP method.

The invention provides methods and compositions for reducing the amount of water required in an industrial process, especially a bottling process such as beer or beverage manufacturing. The method comprising the steps of: collecting water used to rinse cleaned and/or dirty recycled bottles, spraying the collected water at a food contacting piece of equipment as part of a CIP rinse, and passing the CIP second rinse water into a cooling tower as make-up water. The method allows for the re-use of water already in the system but by being careful where each water stream goes the water does not accumulate contaminants that would damage the cooling tower or foul the bottled product or vessel that is cleaned by CIP method.

This invention provides a method and a system for cleaning a container for storing wafers or masks. A contained with lid is washed directly after the container is loaded with lid opened in the cleaning system. Gas exchange rate in the washing station can be increased such that particles or AMC inside the container or attached to the lid can be carried out more easily. Then, contamination-free gas is purged to the container as well as lid in a high temperature environment. A vacuum station can be optionally adapted between the washing station and the contamination-free gas purging station to enhance the cleanliness of the container.

A pig cleaning and transportation system is disclosed. Exemplary implementations include a platform with a plurality of apertures; a plurality of securing mechanisms, each mechanism within each aperture and configured to hold a pig and allow it to rotate around its longitudinal axis; a base underneath the platform; and a cleaning element connected to the base and positioned on each longitudinal side of the platform in pressure contact with the pigs on the plurality of securing mechanisms, each cleaning element including at least one cleaning material surface.

Contaminant is prevented from migrating from a gripping hand and contaminating a substrate case after cleaning the substrate case. The apparatus cleans, in a state with no substrate, a substrate case C which holds a substrate, provided with a booth 10 which forms a clean space, provided with cleaning tanks 40, 50 which hold and clean the parts of the substrate case C in a separated status in the booth 10, provided with a conveyance mechanism 60 which grips part of the substrate case C by a gripping hand 70 and conveys them to and from the cleaning tanks 40, 50, making the gripping hand 70 stand by at a standby position Q in the booth 10 during cleaning of the substrate case C, and provided with a cleaning means 80 for cleaning the gripping hand 70 during cleaning of the parts. The cleaning means 80 is provided with a spray nozzle 81 which sprays a gas toward the gripping hand 70 and an exhaust fan 82 which exhausts the gas from the inside of the booth 10.

A blend of aliphatic hydrocarbons and polyglycol ether(s) is used in a process for cleaning railroad tank cars that have been gravity drained of hydrocarbon fluids but may be left with a residuum containing heavy hydrocarbons, paraffin and noxious gas. A simple recirculation system is established between the chemical source, the contaminated railcar, canister filters and back to the chemical source. Contaminates are removed from the cleaning chemical by the filters and there is no water or steam used which might otherwise damage the railcar.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

A cleaning device for cleaning an object having a peripheral edge defining a tubular portion of the object that is open at least one of its ends. The cleaning device has a cleaning enclosure, a first fluid feed duct for feeding fluid to the enclosure, and a first fluid discharge duct for discharging fluid from the enclosure. The cleaning enclosure has first and second enclosure portions. When the device is in its closed configuration at least one central zone of the second enclosure portion extends inside the first enclosure portion in order to define a reception space for receiving the object between the first enclosure portion and the central zone, which reception space extends all around the central portion.