The present disclosure relates to a bottle treatment machine including a pump/nozzle protector in the form of a screen. The screen includes an at least partially perforated surface and the screen is provided for passing a liquid of the bottle treatment machine therethrough. The bottle treatment machine further includes at least one scraper which rests at least partially on the at least partially perforated surface of the screen. The screen and the at least one scraper are arranged to be rotatable relative to one another. The present disclosure further relates to a method for cleaning the screen of the bottle treatment machine.

The present disclosure relates to a bottle treatment machine including a pump/nozzle protector in the form of a screen. The screen includes an at least partially perforated surface and the screen is provided for passing a liquid of the bottle treatment machine therethrough. The bottle treatment machine further includes at least one scraper which rests at least partially on the at least partially perforated surface of the screen. The screen and the at least one scraper are arranged to be rotatable relative to one another. The present disclosure further relates to a method for cleaning the screen of the bottle treatment machine.

Proposed is A POD cleaning apparatus including: a separate unit separating a POD introduced through an introducing inlet; a first transportation unit transporting a separation POD resulting from the separation in the separation unit; a plurality of cleaning chambers in each of which the separation POD transported by the first transportation unit is cleaned and dried; a chamber in which the separation POD dried in the cleaning chamber is vacuum-processed; a second transportation transporting the separation dried in the cleaning chamber to the vacuum chamber; and an assembly unit assembling the vacuum-processed separation PODs, in which each of the plurality of cleaning chambers includes: a cleaning sub-chamber where the separation POD transported by the first transportation unit is accommodated and cleaned; and a drying chamber where the separation POD transported from the cleaning sub-chamber is dried, and in which the cleaning sub-chamber and the drying chamber are spatially separated.

A pig cleaning and transportation system is disclosed. Exemplary implementations include a platform with a plurality of apertures; a plurality of securing mechanisms, each mechanism within each aperture and configured to hold a pig and allow it to rotate around its longitudinal axis; a base underneath the platform; and a cleaning element connected to the base and positioned on each longitudinal side of the platform in pressure contact with the pigs on the plurality of securing mechanisms, each cleaning element including at least one cleaning material surface.

An automated refurbishment system for cleaning and testing recycled child-safe containers. The system takes in durable, child-safe container bodies and caps after usage, washes the container parts reduce an amount of contaminants, and then dries the washed parts. The system then assembles the child-safe container bodies to caps, and tests the assembled child-safe containers, to assess the functionality of the child-safe features. The clean and tested refurbished child-safe containers can then be reused to dispense controlled substances (e.g., pharmaceuticals). Specific modules of the system can be interchanged to allow compatibility with different styles and designs of child-safe containers. The refurbishment system facilitates the recycling and reuse of durable, child-safe containers as an alternative to the current practice of using single-use, disposable plastic child-safe containers to dispense prescription pills and other controlled substances.

Disclosed herein are various embodiments of container washing systems and methods. The exemplary systems may include a foot valve, the foot valve having an input for a fluid, a tray having a grate, the grate configured to support the container; and a rotatable assembly having one or more nozzles, wherein actuation of the foot valve opens a fluid path from the foot valve to the nozzles, such that a fluid may be sprayed above the tray and into the interior of the container.

Provided are methods and systems for cleaning various semiconductor substrate storage articles, in particular, FOUP doors. The FOUP doors and other similar articles often have openings that may get contaminated with cleaning liquids if not covered. The described cleaning system includes contact points for engaging the article and covering these openings. The contact points may be also used for supporting the article and for pressurizing the openings in the article with a gas. The gas may be supplied through one or more contact points. It prevents liquids from getting into the openings if even the openings are not completely sealed. The pressurization may be maintained through the entire wet portion of the cleaning process. The article may be rotated within the cleaning system while cleaning and/or other liquids or gases are dispensed through a set of spraying nozzles. Spraying nozzles may move to enhance cleaning of the article.

Described and depicted is a method for filling packages that are open on one side, in particular cardboard composite packages, with free-flowing products, in particular foodstuffs, in a filling machine. In order to allow the heating, sterilisation and/or drying to be carried out at high throughputs more reliably and with less complexity in terms of the equipment and/or method, it is provided that preheating air and/or drying air and/or sterilising agent is introduced into the packages that are open on one side and that a volume of preheating air and/or drying air and/or sterilising agent, said volume corresponding to at least three times the volume of the package that is open on one side, is introduced into at least one, preferably at least substantially each, package that is open on one side.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.