B22F3/162

Tungsten Target
20200016660 · 2020-01-16 ·

There is provided a tungsten sputtering target that can provide a film deposition rate with less fluctuation over the target life, A tungsten sputtering target, wherein an area ratio of crystal grains having any of {100}, {110} and {111} planes oriented to a sputtering surface is 30% or less for any of the orientation planes, and an area ratio in total of crystal grains having orientation planes oriented to the sputtering surface other than {100}, {110} and {111} planes is 46% or more, the area ratio being obtained by an analysis of a cross section perpendicular to the sputtering surface with an inverse pole figure mapping using electron backscatter diffraction.

Tungsten Target
20200016660 · 2020-01-16 ·

There is provided a tungsten sputtering target that can provide a film deposition rate with less fluctuation over the target life, A tungsten sputtering target, wherein an area ratio of crystal grains having any of {100}, {110} and {111} planes oriented to a sputtering surface is 30% or less for any of the orientation planes, and an area ratio in total of crystal grains having orientation planes oriented to the sputtering surface other than {100}, {110} and {111} planes is 46% or more, the area ratio being obtained by an analysis of a cross section perpendicular to the sputtering surface with an inverse pole figure mapping using electron backscatter diffraction.

PROCESSES AND SYSTEMS FOR DOUBLE-PULSE LASER MICRO SINTERING
20200009655 · 2020-01-09 ·

Processes and systems that include one or more laser beam sources configured to provide laser irradiation with one or more laser pulse groups to at least a portion of powder particles on a solid surface at one or multiple locations thereof. Sintering laser pulse(s) is provided to induce coalition of at least some of the powder particles into a more continuous medium, and pressing laser pulse(s) is provided to produce pressure pulse(s) on at least a portion of the powder particles and/or the more continuous medium. Laser pulse groups may include one or more of the sintering laser pulses followed by one or more of the pressing laser pulses with a time delay between a last of the sintering laser pulse(s) and a first of the pressing laser pulse(s).

PROCESSES AND SYSTEMS FOR DOUBLE-PULSE LASER MICRO SINTERING
20200009655 · 2020-01-09 ·

Processes and systems that include one or more laser beam sources configured to provide laser irradiation with one or more laser pulse groups to at least a portion of powder particles on a solid surface at one or multiple locations thereof. Sintering laser pulse(s) is provided to induce coalition of at least some of the powder particles into a more continuous medium, and pressing laser pulse(s) is provided to produce pressure pulse(s) on at least a portion of the powder particles and/or the more continuous medium. Laser pulse groups may include one or more of the sintering laser pulses followed by one or more of the pressing laser pulses with a time delay between a last of the sintering laser pulse(s) and a first of the pressing laser pulse(s).

Catalyst enhanced MgAl-based hydrogen storage material
20190390307 · 2019-12-26 ·

The invention provides a catalyst enhanced MgAl-based hydrogen storage material, which is prepared by the following method: provide Mg and Al metal raw materials: weigh the Mg and Al metal raw materials according to a molar ratio of Mg: Al=(16-18): (11-13); perform the first vacuum melting on the Mg and Al metal raw materials; and crush the primary Mg alloy ingots to obtain the primary Mg alloy blocks; provide Ti, Zr and V metal raw materials weigh the primary Mg alloy blocks, and the Ti, Zr and V metal raw materials; perform ball milling treatment to obtain composite metal powder; press the composite metal powder into the loose alloy ingots; perform hot pressing treatment on the loose alloy ingots to obtain the dense alloy ingots, perform heat treatment on the dense alloy ingot; and wire cut the dense alloy ingots after heat treatment.

Catalyst enhanced MgAl-based hydrogen storage material
20190390307 · 2019-12-26 ·

The invention provides a catalyst enhanced MgAl-based hydrogen storage material, which is prepared by the following method: provide Mg and Al metal raw materials: weigh the Mg and Al metal raw materials according to a molar ratio of Mg: Al=(16-18): (11-13); perform the first vacuum melting on the Mg and Al metal raw materials; and crush the primary Mg alloy ingots to obtain the primary Mg alloy blocks; provide Ti, Zr and V metal raw materials weigh the primary Mg alloy blocks, and the Ti, Zr and V metal raw materials; perform ball milling treatment to obtain composite metal powder; press the composite metal powder into the loose alloy ingots; perform hot pressing treatment on the loose alloy ingots to obtain the dense alloy ingots, perform heat treatment on the dense alloy ingot; and wire cut the dense alloy ingots after heat treatment.

Tungsten target
11939647 · 2024-03-26 · ·

There is provided a tungsten sputtering target that can provide a film deposition rate with less fluctuation over the target life. A tungsten sputtering target, wherein an area ratio of crystal grains having any of {100}, {110} and {111} planes oriented to a sputtering surface is 30% or less for any of the orientation planes, and an area ratio in total of crystal grains having orientation planes oriented to the sputtering surface other than {100}, {110} and {111} planes is 46% or more, the area ratio being obtained by an analysis of a cross section perpendicular to the sputtering surface with an inverse pole figure mapping using electron backscatter diffraction.

Tungsten target
11939647 · 2024-03-26 · ·

There is provided a tungsten sputtering target that can provide a film deposition rate with less fluctuation over the target life. A tungsten sputtering target, wherein an area ratio of crystal grains having any of {100}, {110} and {111} planes oriented to a sputtering surface is 30% or less for any of the orientation planes, and an area ratio in total of crystal grains having orientation planes oriented to the sputtering surface other than {100}, {110} and {111} planes is 46% or more, the area ratio being obtained by an analysis of a cross section perpendicular to the sputtering surface with an inverse pole figure mapping using electron backscatter diffraction.

Method of making sintered part

A method of making a sintered part includes a step of applying a machining process to a compacted part with a tool to make a machined compacted part having a cogwheel shape, and a step of sintering the machined compacted part to make a sintered part, wherein the machining process is such that a surface of the compacted part on a side where the tool exits is supported by a plate member having a tooth pattern with same specifications as a tooth pattern of the cogwheel shape, and the tool is used to machine portions of the compacted part corresponding to tooth spaces of the plate member.

MOLTEN METAL JETTING FOR ADDITIVE MANUFACTURING
20190375003 · 2019-12-12 ·

In molten metal jetting, where droplets of metal are jetted to 3D print a part, each layer may be traversed each successive layer with a normalizing grinding wheel or other leveling device such as a layer to level each successive layer, and/or the melt reservoir or printing chamber may be filled with an anoxic gas mix to prevent oxidation.