Patent classifications
B23K26/064
ELECTROMAGNETIC RADIATION SYSTEM
An electromagnetic radiation system (100) for directing an electromagnetic radiation beam at a target (130). The electromagnetic radiation system comprises an electromagnetic radiation source (110) for providing the electromagnetic radiation beam, a head (120) for projecting the electromagnetic radiation beam on to the target (130); and an umbilical assembly (140) connecting the electromagnetic radiation source (110) to the head (120) and configured to transmit the electromagnetic radiation beam to the head. The electromagnetic radiation system further comprises an optical isolator (150) positioned between the electromagnetic radiation source (110) and the umbilical assembly (140).
LASER IRRADIATION DEVICE
To provide a laser irradiation apparatus which suppresses adhesion of foreign matters to an optical element, a laser irradiation device includes: emission optical systems, which form a beam in which laser light generated by a laser oscillator converges on a predetermined beam spot, and continuously change an irradiation direction or the like of the beam; and a protective member which is arranged between the emission optical system and the beam spot, and protects the emission optical system from foreign matters scattered from an irradiation object side, and the protective member has an aperture through which the beam passes and moves in connection with a change of the irradiation direction or the like of the beam so that the aperture is positioned on a path of the beam.
LASER PROCESSING DEVICE, AND METHOD FOR MANUFACTURING CHIP
This laser processing apparatus is for forming modified regions in an object, which includes a sapphire substrate having a C-plane as a main surface, along cutting lines by focusing laser light on the object, and is provided with a laser light source, a spatial light modulator, and a focusing optical system. The spatial light modulator performs aberration correction by a first aberration correction amount smaller than an ideal aberration correction amount when the modified region is formed along a first cutting line along an a-axis direction of the sapphire substrate, and performs aberration correction by a second aberration correction amount smaller than the ideal aberration correction amount and different from the first aberration correction amount when the modified region is formed along a second cutting line along an in-axis direction of the sapphire substrate.
Apparatus and method of adaptive laser cutting control based on optical inspection
An apparatus and method of improving the stability and repeatability of the laser cutting of an RFID antenna is disclosed. The present invention provides direct feedback from an optical inspection of the cutting process to the control system to determine the shape of the RFID antennas that are being cut and compare the same to the desired RFID antenna shape or pattern. When appropriate, the present invention enables a user to employ both short term and long term feedback data to make modifications to the laser cutting process to improve the same and reduce waste.
Apparatus and method of adaptive laser cutting control based on optical inspection
An apparatus and method of improving the stability and repeatability of the laser cutting of an RFID antenna is disclosed. The present invention provides direct feedback from an optical inspection of the cutting process to the control system to determine the shape of the RFID antennas that are being cut and compare the same to the desired RFID antenna shape or pattern. When appropriate, the present invention enables a user to employ both short term and long term feedback data to make modifications to the laser cutting process to improve the same and reduce waste.
IRRADIATION DEVICES WITH OPTICAL MODULATORS FOR ADDITIVELY MANUFACTURING THREE-DIMENSIONAL OBJECTS
An irradiation device for additively manufacturing three-dimensional objects may include a beam generation device configured to generate an energy beam, an optical modulator including a micromirror array disposed downstream from the beam generation device, and a focusing lens assembly disposed downstream from the optical modulator. The micromirror array may include a plurality of micromirror elements configured to reflect a corresponding plurality of beam segment of the energy beam along a beam path incident upon the focusing lens assembly. The focusing lens assembly may include one or more lenses configured to focus the plurality of beam segments such that for respective ones of a plurality of modulation groups including a subset of micromirror elements, a corresponding subset of beam segments are focused to at least partially overlap with one another at a combination zone corresponding to the respective modulation group.
OPTICAL FIBER, LASER GENERATOR, LASER PROCESSING APPARATUS, AND METHOD OF MANUFACTURING OPTICAL FIBER
An optical fiber includes: a center core; an inner ring layer, located outside of the center core in a radial direction, that has a refractive index lower than a refractive index of the center core; an outer core, located outside of the inner ring layer in the radial direction, that has a refractive index higher than the refractive index of the inner ring layer; and an outer ring layer, located outside of the outer core in the radial direction, that has a refractive index lower than the refractive index of the outer core. A relative refractive index difference Δ.sub.CF between the center core and the inner ring layer varies along a longitudinal direction such that the relative refractive index difference Δ.sub.CF at a location along the longitudinal direction is smaller than a relative refractive index difference Δ.sub.PF between the outer core and the outer ring layer.
BEAM MULTIPLEXER FOR WRITING REFRACTIVE INDEX CHANGES IN OPTICAL MATERIALS
A refractive index writing system includes a pulsed laser source, an objective lens for focusing an output of the pulsed laser source to a focal spot in an optical material, and a scanner for relatively moving the focal spot with respect to the optical material along a scan region. A beam multiplexer divides the output of the laser source into at least two working beams that are focused to variously shaped focal spots within the optical material. A controller controls at least one of a temporal and a spatial offset between the focal spots of the working beams together with the relative speed and direction of the scanner for maintaining an energy profile within the optical material along the scan region above a nonlinear absorption threshold of the optical material and below a breakdown threshold of the optical materials.
Laser processing device and laser processing method
A laser processing device and a laser processing method are provided. The laser processing device includes: at least two lasers each configured to generate a laser beam; focusing members corresponding to the at least two lasers respectively and configured to adjust focus positions of at least two laser beams generated by the at least two lasers; and a beam combination member configured to receive the at least two laser beams whose focus positions have been adjusted, and output the at least two laser beams coaxially.
Laser processing device and laser processing method
A laser processing device and a laser processing method are provided. The laser processing device includes: at least two lasers each configured to generate a laser beam; focusing members corresponding to the at least two lasers respectively and configured to adjust focus positions of at least two laser beams generated by the at least two lasers; and a beam combination member configured to receive the at least two laser beams whose focus positions have been adjusted, and output the at least two laser beams coaxially.