B24B7/24

POLISHING LIQUID, METHOD FOR MANUFACTURING GLASS SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK
20220119680 · 2022-04-21 ·

Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, and a difference between D95 and D5 is 3 μm or more.

GLASS MANUFACTURING APPARATUS AND GLASS MANUFACTURING METHOD USING THE SAME
20220009828 · 2022-01-13 ·

A glass manufacturing apparatus includes a support configured to hold a glass including a first flat portion, a second flat portion, and a curved portion connecting one side of the first flat portion and one side of the second flat portion. The support includes a first flat surface supporting the first flat portion, a second flat surface facing the first flat surface and supporting the second flat portion, and a curved surface connecting the flat surface to the second flat surface and supporting the curved portion.

Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk
11214713 · 2022-01-04 · ·

Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, and a difference between D95 and D5 is 3 μm or more.

POLISHING LIQUID AND METHOD FOR MANUFACTURING GLASS SUBSTRATE
20230287244 · 2023-09-14 ·

Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, D100 is 3 μm or more, D50 is 0.8 to 2.4 μm, and Dpeak−D5 is less than D95−Dpeak.

Electrochemical Discharge-assisted Micro-grinding Device for Micro-components of Brittle and Hard Materials

The invention provides an electrochemical discharge-assisted micro-grinding device for micro-components of brittle and hard materials. The device includes a micro-grinding tool, grinding fluid, a workpiece, an auxiliary electrode, a processing groove, and a pulsed DC power supply; the processing groove is filled with grinding fluid; the micro-grinding tool, the workpiece, and the auxiliary electrode are immersed in the grinding fluid; the micro-grinding tool is composed of a conductive grinding tool base, an electroplating layer, and insulated superabrasives. The micro-grinding tool is connected to the negative electrode of the pulsed DC power supply; the grinding fluid is composed of H.sub.2O.sub.2, Na.sub.2CO.sub.3, EDTA-Fe-Na, and deionized water; the workpiece material is brittle and hard; a large number of micro structures need to be produced on the surface of the workpiece.

Electrochemical Discharge-assisted Micro-grinding Device for Micro-components of Brittle and Hard Materials

The invention provides an electrochemical discharge-assisted micro-grinding device for micro-components of brittle and hard materials. The device includes a micro-grinding tool, grinding fluid, a workpiece, an auxiliary electrode, a processing groove, and a pulsed DC power supply; the processing groove is filled with grinding fluid; the micro-grinding tool, the workpiece, and the auxiliary electrode are immersed in the grinding fluid; the micro-grinding tool is composed of a conductive grinding tool base, an electroplating layer, and insulated superabrasives. The micro-grinding tool is connected to the negative electrode of the pulsed DC power supply; the grinding fluid is composed of H.sub.2O.sub.2, Na.sub.2CO.sub.3, EDTA-Fe-Na, and deionized water; the workpiece material is brittle and hard; a large number of micro structures need to be produced on the surface of the workpiece.

Methods and apparatus for glass laminate edge finishing and glass laminates formed thereby

An apparatus for finishing a cut edge of a glass laminate includes a support including a surface and an edge, a rail disposed adjacent the support and extending substantially parallel to the edge, a carrier coupled to the rail, and a finishing tool coupled to the carrier and including an abrasive surface positioned adjacent the edge. The carrier is translatable along the rail to translate the abrasive surface relative to the edge. A method includes securing a glass laminate to a support and contacting a cut edge of the glass laminate with an abrasive surface of a finishing tool coupled to a carrier. The carrier is translated along a rail to move the abrasive surface along the cut edge of the glass laminate and transform the cut edge into a finished edge. The glass laminate can have an edge strength of at least about 100 MPa.

Methods and apparatus for glass laminate edge finishing and glass laminates formed thereby

An apparatus for finishing a cut edge of a glass laminate includes a support including a surface and an edge, a rail disposed adjacent the support and extending substantially parallel to the edge, a carrier coupled to the rail, and a finishing tool coupled to the carrier and including an abrasive surface positioned adjacent the edge. The carrier is translatable along the rail to translate the abrasive surface relative to the edge. A method includes securing a glass laminate to a support and contacting a cut edge of the glass laminate with an abrasive surface of a finishing tool coupled to a carrier. The carrier is translated along a rail to move the abrasive surface along the cut edge of the glass laminate and transform the cut edge into a finished edge. The glass laminate can have an edge strength of at least about 100 MPa.

Machine and method for grinding and/or polishing slabs of stone material, such as natural or agglomerated stone, ceramic and glass
11648636 · 2023-05-16 · ·

A grinding and/or polishing machine (10) for slabs of stone material, such as natural or agglomerated stone, ceramic or glass, comprises a support bench (12) for the slabs to be machined and at least one machining station (14) with a pair of bridge-like support structures (16, 18) arranged opposite each other with, above, a beam supporting a plurality of machining spindles (26). First relative movement means (19) move the slab in a longitudinal direction with respect to the machining station (14), while the beam moves transversely with respect to its length by means of second movement means (21). Each spindle is supported on the beam so that it can be swivelled by associated movement means (34, 35, 40, 50, 60) about an oscillation axis (33) which is parallel to, but separate from the motorized vertical axis (32) of the spindle. The spindles thus oscillate about the respective oscillation axes (33) in cooperation with the longitudinal and transverse movements, respectively, of the first and second movement means (19 and 21) so as to polish and/or grind the surface of a slab on the support bench.

GLASS-CERAMIC ARTICLE
20230150083 · 2023-05-18 ·

A glass-ceramic article includes at least one substrate, such as a plate, made of glass-ceramic, the substrate having a face including a microtexturing such that the arithmetic mean surface roughness Ra, measured according to standard ISO 4287, is between 0.14 and 0.40 μm, and the total roughness, Rt, measured according to standard ISO 4287, is between 1.15 and 5.00 μm.