Patent classifications
B29C2059/023
Method and apparatus for generating a superficial structure
A method and related apparatus for producing an embossing on a substrate using a digital printing technology includes the application of an embossing liquid, for example a water-based liquid, on a non-polymerized resin layer and the subsequent polymerization of the resin with UV curing.
Method for determining pattern of mold for imprint, imprint method, and apparatus
A determination method for determining a pattern of a mold is disclosed. The pattern of the mold is used in imprint processing of forming a pattern on imprint material by performing the steps of pressing the imprint material on a substrate against the pattern of the mold in an atmosphere containing condensable gas to be liquefied due to compression, curing the imprint material, and releasing the mold from the imprint material. A processor calculates a shrinkage amount of the pattern on the imprint material. The pattern on the imprint material shrinks by desorbing condensate liquid, which is produced through liquefaction of the condensable gas between the imprint material and the pattern of the mold in the pressing step and which is dissolved in the imprint material, from the imprint material after completion of the pressing step.
CONFORMAL MICRO- OR NANOPATTERNED NANOIMPRINT LITHOGRAPHY MASTER AND METHODS OF MAKING AND USING THE SAME
A conformal micro- or nanopatterned nanoimprint lithography (NIL) master and methods of making and using same is disclosed. A conformal foil or film master with a patterned surface is provided for imprinting a substantially uniform pattern on a non-flat substrate. The conformal foil or film master may be mounted to a soft backing, which may be mounted to a rigid backing, to form conformal master structure. When pressed against a non-flat substrate, the conformal foil or film master substantially conforms to the contours and/or topology of the non-flat substrate to provide a substantially uniform pattern thereon.
PRESS ELEMENT AND METHOD FOR MANUFACTURING PRESS ELEMENTS
A Press element and a method for manufacturing a structured press element, wherein a heterogeneous mask is applied on a metallic base element, after which a surface treatment is carried out and the heterogeneous mask has a certain resistance to the surface treatment.
EMBOSSED FILM, SHEET FILM, TRANSFER COPY, AND METHOD FOR PRODUCING EMBOSSED FILM
There is provided an embossed film in which the frequency of loss of concavities is smaller, the embossed film including: a film main body; and a plurality of concavities formed on a surface of the film main body. A diameter of an opening surface of the concavity is larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of loss of concavities in one end portion of the film main body and the rate of loss of concavities in the other end portion of the film main body is 10 ppm or less.
REPLICATION TOOL
The present invention relates to a replication tool for replicating an element from a replication material, the replication tool comprising a replication side, a plurality of cavities on the replication side, each defining the shape of one element or a group of elements, the replication tool further comprising at least one bump portion, protruding, on the replication side, from the cavities, and further comprising means for confining the replication material to a predetermined area of the tool, when the tool is pressed against a substrate, which predetermined area exceeds the desired volume of the element in at least one direction along the surface of the substrate.
FORMED FILMS AND APPARATUS FOR MANUFACTURING THE SAME
A formed film includes a first surface generally located in a first plane, a second surface generally located in a second plane parallel to and spaced from the first plane, and a third surface generally located in a third plane parallel to and spaced from the first plane and the second plane, in between the first plane and the second plane. A porous structure extends between the second surface and the third surface. A plurality of raised areas have sidewalls that extend between the first surface and the third surface, and top portions that define the first surface. The plurality of sidewalls, the porous structure, and the first plane define a plurality of gathering volumes.
IMPRINTING APPARATUS AND IMPRINTING METHOD
An imprinting apparatus includes a first conveyer unit, a flexible imprinting mold film and a driving roller set. The first conveyer is adapted to convey a workpiece to a working region of the imprinting apparatus. The flexible imprinting mold film has imprinting segments. At least one of the imprinting segments is located in the working region. The workpiece is adapted to be imprinted in the working region through the corresponding imprinting segment. The flexible imprinting mold film is partially rolled around the driving roller set, the imprinting segment located in the working region is expanded from the driving roller set, and the driving roller set is adapted to drive the flexible imprinting mold film, such that at least another one of the imprinting segments rolled around the driving roller set is expanded from the driving roller set and moved to the working region. Besides, an imprinting method is also provided.
MICROTOPOGRAPHIC PATTERN TRANSFER TOOL
A hand-operated tool for embossing a membrane or other soft pliable implant with microgrooves or microgeometries is disclosed. The tool includes an embossing surface such as a pressure plate or roller that includes a specific microgroove or microtopographical pattern. This allows a user such as a clinician to create an embossed surface on a membrane or other implantable device at the time of surgery for the purposes of directing cellular orientation and migration, increasing cell migration velocity and enhancing re-epithelialization rates in various medical and dental applications.
Imprint apparatus and method of manufacturing article
The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.