An object has a durable superhydrophic, self-cleaning, and icephobic coating includes a substrate and a layer disposed on the substrate, the layer resulting from coating with a formulation having an effective amount of hierarchical structuring micro/nanoparticles, liquid silane having one or more groups configured to graft to a hierarchical structuring micro/nanoparticle and at least another group that results in hydrophobicity. The hierarchical structuring micro/nanoparticles are dispersed in the liquid silane. Another effective amount of synthetic adhesive, selected from thermosetting binders, moisture curing adhesives or polymers that form a strong interaction with a surface, is in solution with a solvent. Upon curing, the layer has a contact angle greater than 90° and a sliding angle of less than 10° and, less than 5% of an area of the layer is removed in a Tape test.

A method for manufacturing an imprint mold which can prevent accumulation of the transferring resin at the joining portion of the film mold is provided. A method for manufacturing an imprint mold, including a winding step to wind a resin film mold onto a cylindrical transferring roll, the resin film mold being provided with a reverse pattern of a desired fine concave-convex pattern and the resin film mold being wound onto the transferring roll so that a gap without the reverse pattern is provided at a butting portion of both ends of the resin film mold; a resin filling step to fill a resin composition into the gap; and a pattern forming step to form a pattern substantially the same as the reverse pattern onto the resin composition, is provided.

A riblet forming system incorporates a gantry which supports a laser and a paint applicator is positioned and moved over an aerodynamic surface. A computer control system is connected for control of the gantry on a predetermined path over the aerodynamic surface and further connected to the laser to control cutting a riblet topography along the predetermined path in a predeposited paint layer.

Polyvinyl acetal films with less blocking tendency and which allow for escape of gas during laminating to form laminated composities are prepared by a process for embossing a film comprising plasticized polyvinyl acetal with a roughness Rz on at least one surfaces of 20 to 100 μm by the steps of a. extruding of plasticised polyvinyl acetal to a film with a stochastic roughness of the surfaces of Rz=1 to 70 μm, b. embossing at least one surface of the film obtained in step a) with channels having a depth of 5-50 μm, a width of 10-200 μm and a pitch of 50-2500 μm, wherein c. the surface roughness of the elevations between the channels is at most 20% lower as obtained in step a).

A demolding device for use in an imprint machine, in which machine a foil is intermittently passed in a feed direction over a press region where a stamp is pressed against the foil for imprinting a surface pattern. The demolding device includes a carrier, a pressing roller mounted in the carrier, and a demolding roller mounted parallel to the pressing roller in the carrier, wherein the carrier is configured to slide over the press region against the feed direction while rolling the foil under the pressing roller and over the demolding roller for detaching the foil from the stamp after imprinting of the pattern.

There is provided a filler-filled film, a sheet film, a stacked film, a bonded body, and a method for producing a filler-filled film, the filler-filled film including: a film main body; a plurality of concavities formed on a surface of the film main body; and a filler put in each of the concavities. A diameter of an opening surface of the concavity is at least larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of filling of the fillers in one end portion of the film main body and the rate of filling of the fillers in another portion of the film main body is less than 0.5%.

An imprint apparatus includes: a first driving mechanism configured to move at least one of a mold holder and a substrate holder such that a mold and an imprint material are contact with each other; a second driving mechanism configured to move at least one of the holders such that the substrate is aligned with the mold; a measurement device configured to measure relative positions between a mold mark and a substrate mark in a state in which the mold and the imprint material are not in contact with each other; and a controller configured to control the second driving mechanism based on information of a relationship between a moving amount of at least one of the holders, and change in relative positions between the marks, information of the moving amount, and information of the measured relative positions.

A roller-type depressing device, an imprint device and an imprint method utilizing the same which can depress an object like a die or a molding target by controlling the depressing force of a roller is provided. A roller-type depressing device to depress the object with a roller includes a pressure adjusting plate provided with the roller, a roller moving unit moving the roller relative to the object, a pressure adjusting unit holding the pressure adjusting plate in such a way that force produced by a pressure difference in fluid applied to both faces of the pressure adjusting plate acts on the roller, a pressure receiving stage receiving the pressure of the roller via the object, and a pressure adjuster adjusting the pressure difference in fluid applied to both faces of the pressure adjusting plate.

A nanostructure die with a concavely curved nanostructured die surface for seamless embossing of at least one peripheral ring of a jacket surface of an embossing roll in a step-and-repeat process and an embossing roll for continuous embossing of nanostructures with an embossing layer, which has been applied on a body of revolution, with a jacket surface with at least one peripheral ring which is made seamless at least in the peripheral direction and which is embossed in the step-and-repeat process. Furthermore, the invention relates to a method and a device for producing such an embossing roll for continuous embossing of nanostructures as well as a method for producing such a nanostructure die and a method for producing an embossing substrate.

A method of forming a cured layer on a substrate can include applying on the exterior surface of the substrate a first liquid film and subjecting the first liquid film to actinic radiation in at least one first region of the film. The actinic radiated region can modify the substrate surface such that the drop spreading of a region not subjected to actinic radiation is larger than the drop spreading in a region subjected to actinic radiation.