Patent classifications
B41J2/45
Surface-emitting laser module, optical scanner device, and image forming apparatus
A disclosed surface-emitting laser module includes a surface-emitting laser formed on a substrate to emit light perpendicular to its surface, a package including a recess portion in which the substrate having the surface-emitting laser is arranged, and a transparent substrate arranged to cover the recess portion of the package and the substrate having the surface-emitting laser such that the transparent substrate and the package are connected on a light emitting side of the surface-emitting laser. In the surface-emitting laser module, a high reflectance region and a low reflectance region are formed within a region enclosed by an electrode on an upper part of a mesa of the surface-emitting laser, and the transparent substrate is slanted to the surface of the substrate having the surface-emitting laser in a polarization direction of the light emitted from the surface-emitting laser determined by the high reflectance region and the low reflectance region.
Surface-emitting laser module, optical scanner device, and image forming apparatus
A disclosed surface-emitting laser module includes a surface-emitting laser formed on a substrate to emit light perpendicular to its surface, a package including a recess portion in which the substrate having the surface-emitting laser is arranged, and a transparent substrate arranged to cover the recess portion of the package and the substrate having the surface-emitting laser such that the transparent substrate and the package are connected on a light emitting side of the surface-emitting laser. In the surface-emitting laser module, a high reflectance region and a low reflectance region are formed within a region enclosed by an electrode on an upper part of a mesa of the surface-emitting laser, and the transparent substrate is slanted to the surface of the substrate having the surface-emitting laser in a polarization direction of the light emitted from the surface-emitting laser determined by the high reflectance region and the low reflectance region.
Laser printing system
The invention describes a laser printing system (100) for illuminating an object moving relative to a laser module of the laser printing system (100) in a working plane (180), the laser module comprising at least two laser arrays of semiconductor lasers and at least one optical element, wherein the optical element is adapted to image laser light emitted by the laser arrays, such that laser light of semiconductor lasers of one laser array is imaged to one pixel in the working plane of the laser printing system, and wherein the laser printing system is a 3D printing system for additive manufacturing and wherein two, three, four or a multitude of laser modules (201, 202) are provided, which are arranged in columns (c1, c2) perpendicular to a direction of movement (250) of the object in the working plane (180), and wherein the columns are staggered with respect to each other such that a first laser module (201) of a first column of laser modules (c1) is adapted to illuminate a first area (y1) of the object and a second laser module (202) of a second column (c2) of laser modules is adapted to illuminate a second area (y2) of the object, wherein the first area (y1) is adjacent to the second area (y2) such that continuous illumination of the object is enabled.
Material property capacitance sensor
A system may include a controller configured to cause a capacitance probe to subject a material to a first electric signal having a first frequency and determine a first capacitance of the material at the first frequency. The controller is configured to cause the capacitance probe to subject the material to a second electric signal at a second frequency and determine a second capacitance of the material at the second frequency. The material includes at least a first constituent phase and a second constituent phase. The first constituent phase and the second constituent phase have substantially similar dielectric constants at the first frequency and substantially different dielectric constants at the second frequency. The controller is further configured to determine a porosity of the material based on the first capacitance and determine a relative phase composition of the first constituent phase and the second constituent phase based on the second capacitance.
Radiating device and media exposure device
This invention relates to a media exposing device for exposing media. The media exposure device includes a holding structure; a substrate having a plurality of diodes mounted thereon; and a radiation modification element for modifying the radiation emitted by the diodes. The substrate and the radiation modification element are secured by the holding structure in an arrangement wherein the diodes can emit radiation from the device and wherein the radiation modification element is spaced from the diodes in the radiation path of the diodes; and a telecentric lens secured to the holding structure in an arrangement wherein the telecentric lens is substantially in register with the radiation path of the diodes.
EXPOSURE DEVICE, LED HEAD, IMAGE FORMING APPARATUS AND IMAGE READING APPARATUS
An exposure device includes a first light emitting element substrate including a plurality of first light emitting elements arranged at an arrangement interval T in a longitudinal direction, and a second light emitting element substrate including a part in the longitudinal direction that overlaps with a part of the first light receiving element substrate so as to form an overlapping region. The first and second light emitting element substrates are shifted from each other in a direction perpendicular to the longitudinal direction. The second light emitting element substrate includes a plurality of second light emitting elements arranged in the longitudinal direction. The second light emitting elements are arranged at the arrangement interval T at least outside the overlapping region. When an interval between two of the second light emitting elements of the second light emitting element substrate disposed in the overlapping region is expressed as a specified interval TS, the specified interval TS and the arrangement interval T satisfy:
T≦TS≦2T.
LIGHT ILLUMINATING APPARATUS
Provided is a light illuminating apparatus for irradiating light of a line shape extending in a first direction and having a line width in a second direction. The light illuminating apparatus includes light emitting units, each including a substrate, light sources arranged at an interval along the first direction on the substrate and placed such that a direction of an optical axis is matched to a direction perpendicular to the substrate surface, and optical devices placed on optical paths of each light source to shape light from each light source into light with a predetermined divergence angle, wherein the light emitting units are arranged on an arc having its center at the irradiation position when viewed in the first direction, and an irradiation width in the second direction of light from the light emitting units is approximately equal within a preset range in a direction perpendicular to the irradiation surface.
EXPOSURE HEAD, EXPOSURE UNIT, METHOD OF MANUFACTURING EXPOSURE UNIT, LIGHT RECEIVING HEAD, LIGHT RECEIVING UNIT, AND METHOD OF MANUFACTURING LIGHT RECEIVING UNIT
An exposure unit includes first and second exposure heads. The first exposure head includes: first light emitting devices each emitting a first light beam; a first optical system performing imaging of each of the first light beams; a first coupler; and a first base member. The first coupler is provided at a first position, in the first base member, based on a position at which the imaging performed by the first optical system is performed. The second exposure head includes: second light emitting devices each emitting a second light beam; a second optical system performing imaging of each of the second light beams; a second coupler; and a second base member. The second coupler is provided at a second position, in the second base member, based on a position at which the imaging performed by the second optical system is performed and is fit into the first coupler.
EXPOSURE HEAD, EXPOSURE UNIT, METHOD OF MANUFACTURING EXPOSURE UNIT, LIGHT RECEIVING HEAD, LIGHT RECEIVING UNIT, AND METHOD OF MANUFACTURING LIGHT RECEIVING UNIT
An exposure unit includes first and second exposure heads. The first exposure head includes: first light emitting devices each emitting a first light beam; a first optical system performing imaging of each of the first light beams; a first coupler; and a first base member. The first coupler is provided at a first position, in the first base member, based on a position at which the imaging performed by the first optical system is performed. The second exposure head includes: second light emitting devices each emitting a second light beam; a second optical system performing imaging of each of the second light beams; a second coupler; and a second base member. The second coupler is provided at a second position, in the second base member, based on a position at which the imaging performed by the second optical system is performed and is fit into the first coupler.
OPTICAL PRINT HEAD, IMAGE FORMING APPARATUS INCLUDING THE OPTICAL PRINT HEAD, AND MANUFACTURING METHOD OF THE OPTICAL PRINT HEAD
A holding member 505 includes a first side wall portion 505a and a second side wall portion 505b, and a part of a surface 803b of a substrate 502 on a side opposite from a mounting surface 803 and a holding member 505 are fixed to each other by an adhesive. In the first side wall portion 505a, an inserting hole 801 opposing a corner portion 502 as of the substrate 502 in a widthwise direction of the substrate 502, and also, in the second side wall portion 505b, an inserting hole 801 opposing a corner portion 502bs of the substrate 502.