A chemical gas phase deposition process comprises steps of providing a high vacuum chamber, and inside the high vacuum chamber: positioning a substrate surface; positioning a mask parallel to the substrate surface, whereby the mask comprises one or more openings; adjusting a gap of determined dimension between the substrate surface and the mask; and orienting a plurality of chemical precursor beams of at least one precursor species towards the mask with line of sight propagation, each of the plurality of chemical precursor beams being emitted from an independent punctual source, and molecules of the chemical precursor pass through the one or more mask openings to impinge onto the substrate surface for deposition thereon. At least a part of the chemical precursor molecules decompose on the substrate surface at a decomposition temperature. The process further comprises adjusting a temperature of the substrate surface greater or equal to the chemical precursor molecule decomposition temperature, thereby remaining greater than a mask temperature, and maintaining the mask temperature below the decomposition temperature, thereby causing a decomposition of the chemical precursor and a growth of a film on the substrate surface, but not on the mask; and heating the substrate surface using a heating device.

A chemical gas phase deposition process comprises steps of providing a high vacuum chamber, and inside the high vacuum chamber: positioning a substrate surface; positioning a mask parallel to the substrate surface, whereby the mask comprises one or more openings; adjusting a gap of determined dimension between the substrate surface and the mask; and orienting a plurality of chemical precursor beams of at least one precursor species towards the mask with line of sight propagation, each of the plurality of chemical precursor beams being emitted from an independent punctual source, and molecules of the chemical precursor pass through the one or more mask openings to impinge onto the substrate surface for deposition thereon. At least a part of the chemical precursor molecules decompose on the substrate surface at a decomposition temperature. The process further comprises adjusting a temperature of the substrate surface greater or equal to the chemical precursor molecule decomposition temperature, thereby remaining greater than a mask temperature, and maintaining the mask temperature below the decomposition temperature, thereby causing a decomposition of the chemical precursor and a growth of a film on the substrate surface, but not on the mask; and heating the substrate surface using a heating device.

The present invention relates to security, or decorative elements, comprising a transparent, or translucent substrate, which may contain indicia or other visible features in or on its surface, and on at least part of the substrate surface, a first layer, comprising transition metal particles having an average diameter of from 5 nm to 500 nm and a binder, on at least part of the first layer a second layer, comprising an organic material and having a refractive index of from 1.2 to 2.3 and having a thickness of from 20 to 1000 nm, wherein the transition metal is silver, copper, gold and palladium, wherein the weight ratio of transition metal particles to binder in the first layer is in the range from 20:1 to 1:2 in case the binder is a polymeric binder, or wherein the weight ratio of transition metal particles to binder in the first layer is in the range from 5:1 to 1:15 in case the binder is an UV curable binder. The security or decorative element show a certain color in transmission and a different color in reflection and a color flop on the coating side. The color in reflection and the color flop of the security or decorative elements are controlled by adjusting the refractive index and thickness of the second layer.

The present invention relates to security, or decorative elements, comprising a transparent, or translucent substrate, which may contain indicia or other visible features in or on its surface, and on at least part of the substrate surface, a first layer, comprising transition metal particles having an average diameter of from 5 nm to 500 nm and a binder, on at least part of the first layer a second layer, comprising an organic material and having a refractive index of from 1.2 to 2.3 and having a thickness of from 20 to 1000 nm, wherein the transition metal is silver, copper, gold and palladium, wherein the weight ratio of transition metal particles to binder in the first layer is in the range from 20:1 to 1:2 in case the binder is a polymeric binder, or wherein the weight ratio of transition metal particles to binder in the first layer is in the range from 5:1 to 1:15 in case the binder is an UV curable binder. The security or decorative element show a certain color in transmission and a different color in reflection and a color flop on the coating side. The color in reflection and the color flop of the security or decorative elements are controlled by adjusting the refractive index and thickness of the second layer.

A method of manufacturing an image pattern for a security device includes providing a metallised substrate; applying a first photosensitive resist layer to a substrate first metal layer exposing the resist layer to radiation; exposing the resist layer to a first reactant substance; activating a cross linking agent in the resist layer; exposing first and second pattern elements of the resist layer to radiation of a wavelength to which the resist layer is responsive whereupon newly-exposed first pattern elements of the first photosensitive resist layer react, resulting in increased solubility by the second etchant substance, the second pattern elements remaining relatively insoluble by the second etchant substance; and applying first and second etchant substances to the substrate whereupon the first pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining second pattern elements of the first metal layer forming an image pattern.

A method for checking an authenticity feature having an optical storage phosphor, to an apparatus for checking, an authenticity feature and to a value document having an authenticity feature. The authenticity feature has an optical storage phosphor. In one step, the optical storage phosphor is subjected to at least one query sequence, respectively comprising at least a first readout process and a second readout process. At least a first and a second readout measurement value are captured, which respectively are based on the detection of an optical emission in response to the respectively first or the respectively second associated readout process. A readout measurement value time series is created and is respectively associated with the at least one query sequence, comprising at least the first readout measurement value respectively associated with the first readout process and the second one respectively associated with the second readout process.

A method for checking an authenticity feature having an optical storage phosphor, to an apparatus for checking, an authenticity feature and to a value document having an authenticity feature. The authenticity feature has an optical storage phosphor. In one step, the optical storage phosphor is subjected to at least one query sequence, respectively comprising at least a first readout process and a second readout process. At least a first and a second readout measurement value are captured, which respectively are based on the detection of an optical emission in response to the respectively first or the respectively second associated readout process. A readout measurement value time series is created and is respectively associated with the at least one query sequence, comprising at least the first readout measurement value respectively associated with the first readout process and the second one respectively associated with the second readout process.

The present invention describes methods and apparatuses for creating superposition shape images by superposed base and revealing layers of lenslet gratings. The superposition shape images form a message recognizable by a human observer or by an image acquisition and computing device such as a smartphone. The superposition shape images may be created by different superposition techniques ranging from 1D moir, 2D moir and level-line moir superposition techniques to lenticular image and phase shift superposition techniques. Moir superposition techniques enable creating superposition shape images at different apparent depth levels. Applications comprise the protection of documents and valuable articles against counterfeits, the creation of eye-catching advertisements as well as the decoration of buildings and exhibitions.

The present invention describes methods and apparatuses for creating superposition shape images by superposed base and revealing layers of lenslet gratings. The superposition shape images form a message recognizable by a human observer or by an image acquisition and computing device such as a smartphone. The superposition shape images may be created by different superposition techniques ranging from 1D moir, 2D moir and level-line moir superposition techniques to lenticular image and phase shift superposition techniques. Moir superposition techniques enable creating superposition shape images at different apparent depth levels. Applications comprise the protection of documents and valuable articles against counterfeits, the creation of eye-catching advertisements as well as the decoration of buildings and exhibitions.

A chemical gas phase deposition process comprises steps of providing a high vacuum chamber, and inside the high vacuum chamber: positioning a substrate surface; positioning a mask parallel to the substrate surface, whereby the mask comprises one or more openings; adjusting a gap of determined dimension between the substrate surface and the mask; and orienting a plurality of chemical precursor beams of at least one precursor species towards the mask with line of sight propagation, each of the plurality of chemical precursor beams being emitted from an independent punctual source, and molecules of the chemical precursor pass through the one or more mask openings to impinge onto the substrate surface for deposition thereon. At least a part of the chemical precursor molecules decompose on the substrate surface at a decomposition temperature. The process further comprises adjusting a temperature of the substrate surface greater or equal to the chemical precursor molecule decomposition temperature, thereby remaining greater than a mask temperature, and maintaining the mask temperature below the decomposition temperature, thereby causing a decomposition of the chemical precursor and a growth of a film on the substrate surface, but not on the mask; and heating the substrate surface using a heating device.