A synergistic disinfectant composition comprises a C1-8 organic acid, an amino acid based surfactant, an anionic surfactant, and a stabilizing agent. The C1-8 organic acid may include two or more types of the C1-8 organic acids with at least one of the C1-8 organic acids is alpha hydroxyl acid. The disinfectant composition has an antimicrobial activity of log reduction of at least 2 under Biocidal Product Registration (BPR) standard EN13727, EN1276, EN13624 or EN1499, and/or the EPA standard that applies the “Quantitative Methods for Evaluating the Activity of Microbicides used on Hard, Non-Porous Surface” issued by the Organisation for Economic Co-operation and Development (OECD). In addition, the disinfectant composition may be stable during storage and retain their antimicrobial activity after at least one month at 40° C. When desired, the synergistic disinfectant composition may further comprise an oxidizing agent.

Methods and compositions for biofilm remediation are disclosed. Biofilm is reduced and removed from soiled surfaces by providing to a surface in need an effective amount of a composition comprising a biocidal surfactant and at least one organic solvent. According to the invention, the biofilm remediation compositions reduce and remove biofilm formation by administering a one-step cleaner and disinfectant. The biofilm remediation compositions are stable and effective in concentrated and diluted ready-to-use formulations comprising an anionic sulfated or sulfonated surfactant that is not an organocarboxylic acid, a sparingly soluble organic solvent and optionally a soluble organic solvent.

Methods and compositions for biofilm remediation are disclosed. Biofilm is reduced and removed from soiled surfaces by providing to a surface in need an effective amount of a composition comprising a biocidal surfactant and at least one organic solvent. According to the invention, the biofilm remediation compositions reduce and remove biofilm formation by administering a one-step cleaner and disinfectant. The biofilm remediation compositions are stable and effective in concentrated and diluted ready-to-use formulations comprising an anionic sulfated or sulfonated surfactant that is not an organocarboxylic acid, a sparingly soluble organic solvent and optionally a soluble organic solvent.

Methods and compositions for biofilm remediation are disclosed. Biofilm is reduced and removed from soiled surfaces by providing to a surface in need an effective amount of a composition comprising a biocidal surfactant and at least one organic solvent. According to the invention, the biofilm remediation compositions reduce and remove biofilm formation by administering a one-step cleaner and disinfectant. The biofilm remediation compositions are stable and effective in concentrated and diluted ready-to-use formulations comprising an anionic sulfated or sulfonated surfactant that is not an organocarboxylic acid, a sparingly soluble organic solvent and optionally a soluble organic solvent.

Methods of using organophosphorus or organosulfur compounds to disperse, remove, or inhibit the growth of a biofilm, or inhibit the growth of, or kill a fungus or bacteria are provided.

Methods of using organophosphorus or organosulfur compounds to disperse, remove, or inhibit the growth of a biofilm, or inhibit the growth of, or kill a fungus or bacteria are provided.

A method for forming an antimicrobial coating on a substrate is provided. The method comprises dissipating and entrapping (embedding) sulfonated copolymer particles in void spaces or interstices of fibers of a fabric forming an outer layer of a substrate. The sulfonated copolymer is selected from the group of perfluorosulfonic acid polymers such as sulfonated tetrafluoroethylene, polystyrene sulfonates, sulfonated block copolymers, polysulfones such as polyether sulfone, polyketones such as polyether ketone, sulfonated poly(arylene ether), and mixtures thereof. The fibers comprise a thermoplastic polymer having a melting point of less than 120° C., or 45-110° C., or 45-80° C. The sulfonated copolymer forms an antimicrobial coating layer for killing at least 90% microbes in the air within 30 minutes of contact with the coating.

A method for forming an antimicrobial coating on a substrate is provided. The method comprises dissipating and entrapping (embedding) sulfonated copolymer particles in void spaces or interstices of fibers of a fabric forming an outer layer of a substrate. The sulfonated copolymer is selected from the group of perfluorosulfonic acid polymers such as sulfonated tetrafluoroethylene, polystyrene sulfonates, sulfonated block copolymers, polysulfones such as polyether sulfone, polyketones such as polyether ketone, sulfonated poly(arylene ether), and mixtures thereof. The fibers comprise a thermoplastic polymer having a melting point of less than 120° C., or 45-110° C., or 45-80° C. The sulfonated copolymer forms an antimicrobial coating layer for killing at least 90% microbes in the air within 30 minutes of contact with the coating.

A method for forming an antimicrobial coating on a substrate is provided. The method comprises dissipating and entrapping (embedding) sulfonated copolymer particles in void spaces or interstices of fibers of a fabric forming an outer layer of a substrate. The sulfonated copolymer is selected from the group of perfluorosulfonic acid polymers such as sulfonated tetrafluoroethylene, polystyrene sulfonates, sulfonated block copolymers, polysulfones such as polyether sulfone, polyketones such as polyether ketone, sulfonated poly(arylene ether), and mixtures thereof. The fibers comprise a thermoplastic polymer having a melting point of less than 120° C., or 45-110° C., or 45-80° C. The sulfonated copolymer forms an antimicrobial coating layer for killing at least 90% microbes in the air within 30 minutes of contact with the coating.

An antimicrobial wipe is disclosed comprising a substrate and an antimicrobial composition. The antimicrobial composition contains a sulfonated block copolymer having an ion exchange capacity (IEC) of >0.5 meq/g, and (ii) a solvent system. The solvent system contains a mixture of two or more solvents selected from the group consisting of organic solvents, inorganic solvents, terpene-based compounds, and decarboxylated rosin acids. The antimicrobial wipe is in the form of a fabric, a sponge, a toilette, and the like. The sulfonated block copolymer is partially or fully dissolved in the solvent system, such that when the wipe is in contact with a target surface, the sulfonated block copolymer is imparted from the wipe onto the surface forming a coating layer. The coating layer causes a reduction in a microbe concentration by at least 1 log.sub.10 CFU (colony forming units) within 120 minutes upon contact.