The invention relates to a process for fabricating a device for detecting electromagnetic radiation, comprising an encapsulation structure (20) comprising an encapsulation layer (21) on which a relief (23) rests, and a sealing layer (24), which has a local breakage in continuity at the relief (23).

An integrated CMOS-MEMS device includes a first substrate having a CMOS device, a second substrate having a MEMS device, an insulator layer disposed between the first substrate and the second substrate, a dischargeable ground-contact, an electrical bypass structure, and a contrast stress layer. The first substrate includes a conductor that is conductively connecting to the CMOS devices. The electrical bypass structure has a conducting layer conductively connecting this conductor of the first substrate with the dischargeable ground-contact through a process-configurable electrical connection. The contrast stress layer is disposed between the insulator layer and the conducting layer of the electrical bypass structure.

A sensor device may include a base layer, and an ASIC element disposed on the base layer. The ASIC element may include a plurality of electrical contact points. The sensor device may include a MEMS element. The MEMS element may include a plurality of through-silicon vias. The sensor device may include a plurality of conductive contact elements. Each conductive contact element may be disposed between, and electrically coupling, a respective through-silicon via and a respective electrical contact point. The sensor device may include a protective layer disposed between the ASIC element and the MEMS element. The protective layer may be composed of material(s) having a physical property defined to permit the protective layer to mitigate stress forces directed from the ASIC element to the MEMS element, to prevent corrosion, and/or to prevent leakage current between electrical connections due to pollution and/or humidity.

A micromechanical component includes a substrate that extends along a main extension plane of the micromechanical component, the micromechanical component including a drive mass which is suspended on the substrate via a drive spring of the micromechanical component so as to be able to move relative to the substrate, the micromechanical component including a test mass that is movably suspended relative to the drive mass, the drive spring being disposed in such a way that the drive mass and/or the test mass surround(s) the drive spring at least in part essentially parallel to the main extension plane.

A packaging arrangement is provided that suppresses stress induced by extreme temperature changes during the process of attaching the electronic component. The arrangement includes adding to the package columnar conductors embedded in a solid support substance.

A sensor for detecting a physical variable, including: a sensor element for outputting an electrical signal dependent on the physical variable, a substrate carrying the sensor element, a printed circuit board, conducting the electrical signal, on the substrate, and an embedding compound, in which the sensor element is completely embedded and the printed circuit board is at least partly embedded, wherein at least one compensation element is embodied in the embedding compound, by which compensation element a mechanical stress caused by an element of the sensor at least partly embedded in the embedding compound is counteracted.

An integrated device package is disclosed. The package can include a carrier and an integrated device die having a front side and a back side. A mounting structure can serve to mount the back side of the integrated device die to the carrier. The mounting structure can comprise a first layer over the carrier and a second element between the back side of the integrated device die and the first layer. The first layer can comprise a first insulating material that adheres to the carrier, and the second element can comprise a second insulating material.

An apparatus and method wherein the method comprises: a deformable substrate; a curved support structure configured to support at least a portion of a resistive sensor wherein the resistive sensor comprises a first electrode, a second electrode and a resistive sensor material provided between the electrodes; at least one support configured to space the curved support structure from the deformable substrate so that when the deformable substrate is deformed the curved support structure is not deformed in the same way; wherein the resistive sensor is positioned on the curved support structure so as to limit deformation of the resistive sensor when the deformable substrate is deformed.

An apparatus includes a sensor assembly and a housing assembly. The sensor assembly may have (i) a package surrounding a sensor and (ii) a plurality of terminals integrated with the package. The housing assembly may have (i) a first cavity configured to receive the sensor assembly, (ii) a second cavity configured to receive an electrical connector, (iii) a plurality of ports in communication between the first cavity and the second cavity and (iv) a location feature configured to orient the housing assembly while the housing assembly is mounted to a structure. At least one rib may apply at least one force on the sensor assembly to hold the sensor assembly in the first cavity. The sensor may be outside a plane of the force. The terminals may extend through the ports from the first cavity to the second cavity.

A MEMS device is provided with: a supporting base, having a bottom surface in contact with an external environment; a sensor die, which is of semiconductor material and integrates a micromechanical detection structure; a sensor frame, which is arranged around the sensor die and is mechanically coupled to a top surface of the supporting base; and a cap, which is arranged above the sensor die and is mechanically coupled to a top surface of the sensor frame, a top surface of the cap being in contact with an external environment. The sensor die is mechanically decoupled from the sensor frame.