Provided are a transdermal absorption sheet capable of achieving control of the dissolution rate and suppression of diffusion of a drug, and a method of producing the same. A transdermal absorption sheet includes a sheet portion, and a plurality of needle-like protruding portions formed by a plurality of frustum portions arranged on the sheet portion and needle portions arranged on the frustum portions, in which at least one of the needle-like protruding portions has a cavity portion extending from the sheet portion to the frustum portion.

Methods for fabricating metallic microneedles are disclosed. One method comprises providing a mold pillar; forming an apertured electrically-conductive layer over the mold pillar; and depositing a metal layer over the electrically-conductive layer to provide an apertured microneedle. Another method comprises providing a mold pillar; depositing a first metal layer over the mold pillar to provide a first microneedle; removing the first microneedle from the mold pillar; and depositing a second metal layer over the mold pillar to provide a second microneedle.

A microfluidic chip with high volumetric flow rate is provided that includes at least two vertically stacked microfluidic channel layers, each microfluidic channel layer including an array of spaced apart pillars. Each microfluidic channel layer is interconnected by an inlet/outlet opening that extends through the microfluidic chip. The microfluidic chip is created without wafer to wafer bonding thus circumventing the cost and yield issues associated with microfluidic chips that are created by wafer bonding.

Devices, systems and techniques are described for producing and implementing articles and materials having nanoscale and microscale structures that exhibit superhydrophobic, superoleophobic or omniphobic surface properties and other enhanced properties. In one aspect, a surface nanostructure can be formed by adding a silicon-containing buffer layer such as silicon, silicon oxide or silicon nitride layer, followed by metal film deposition and heating to convert the metal film into balled-up, discrete islands to form an etch mask. The buffer layer can be etched using the etch mask to create an array of pillar structures underneath the etch mask, in which the pillar structures have a shape that includes cylinders, negatively tapered rods, or cones and are vertically aligned. In another aspect, a method of fabricating microscale or nanoscale polymer or metal structures on a substrate is made by photolithography and/or nano imprinting lithography.

Provided is a method for growing a nanowire, including: providing a substrate with a base portion having a first surface and at least one support structure extending above or below the first surface; forming a dielectric coating on the at least one support structure; forming a photoresist coating over the substrate; forming a metal coating over at least a portion of the dielectric coating; removing a portion of the dielectric coating to expose a surface of the at least one support structure; removing a portion of the at least one support structure to form a nanowire growth surface; growing at least one nanowire on the nanowire growth surface of a corresponding one of the at least one support structure, wherein the nanowire comprises a root end attached to the growth surface and an opposing, free end extending from the root end; and elastically bending the at least one nanowire.

A material with a nanotexture comprising structures extending from a substrate. The structures are modified by coating the nanotexture with a protective coating and partially removing the coating, exposing a portion of the structure for functionalization.

A process flow for forming magnetic tunnel junction (MTJ) nanopillars with minimal sidewall residue and minimal sidewall damage is disclosed wherein a pattern is first formed in a hard mask that is an uppermost MTJ layer. Thereafter, the hard mask sidewall is etch transferred through the remaining MTJ layers including a reference layer, free layer, and tunnel barrier between the free layer and reference layer. The etch transfer may be completed in a single RIE step that features a physical component involving inert gas ions or plasma, and a chemical component comprised of ions or plasma generated from one or more of methanol, ethanol, ammonia, and CO. In other embodiments, a chemical treatment with one of the aforementioned chemicals, and a volatilization at 50 C. to 450 C. may follow an etch transfer through the MTJ stack with an ion beam etch or plasma etch involving inert gas ions.

According to the invention there is provided a method of producing a structure comprising the steps of: a) providing a substrate comprising one or more features that correspond to the shape of the structure to be produced, wherein the one or more features comprise a hydrophobic polydimethylsiloxane (PDMS) surface; b) exposing at least a part of the hydrophobic PDMS surface to a plasma so that the part of the hydrophobic PDMS surface that is exposed to the plasma forms a hydrophilic PDMS surface; c) depositing a seed layer onto the hydrophilic PDMS surface by electroless deposition; d) depositing one or more metallic layers onto the seed layer by electrochemical deposition to form the structure; and e) removing the structure from the substrate.

The present invention provides an implantable microneedle and a manufacturing method therefor. An implantable microneedle according to the present invention comprises a coating layer for covering at least one part of the surface of a tip part of the microneedle. When exposed to moisture, the coating layer can be separated from the tip part of the microneedle and thus be implanted.

The invention relates to the field of method of etching a substrate (W), in particular a wafer, in order to produce a grid of micro-protrusion. Such grid of micro-protrusion is generally made using UV photolithography followed by wet and chemical engraving with an etching solution. Most of the currently available methods do not lead to an even attack of the wafer surface by the etching solution because the reaction produces a release of micro-bubbles which, if not properly evacuated, disturb the etching process. In the present invention, substrate(s) (W) are disposed on a magnetic supporting device (1) which is driven in rotation in the etching solution via a magnetic agitator external to the etching solution, so that the magnetic supporting device (1) causes the substrate to rotate at least in a same direction the magnetic supporting device (1). The present invention makes it possible to obtain substrates with good homogeneity.