An apparatus for recirculating fluids in semiconductor systems. The apparatus including a base portion, an inlet portion coupled to a first end of the base portion, and a nozzle coupled to a second end of the base portion. The nozzle including a helical groove extending from a position near a nozzle base portion to a position near a tip of the nozzle portion. The helical groove extending from an exterior surface through the nozzle portion to an interior surface of the nozzle portion. Methods of using the apparatus in a semiconductor recirculation system are also disclosed.

A method for controlling the saturation level of gas in a liquid discharge includes obtaining temperature and pressure measurements of a solvent in a mixing vessel and obtaining a pressure measurement of a source feedstock in a feedstock tank, correlating the temperature and pressure measurements of the solvent to baseline data to generate a theoretical uptake rate for the source feedstock into the solvent and a theoretical flow rate of the source feedstock into the mixing vessel, and determining a required opening setting for a feedstock valve in the feedstock input line in order to achieve a desired liquid displacement in the mixing vessel. The method includes determining an uptake duration and achieving an uptake displacement equivalent to the reverse of the desired liquid displacement. The method includes generating a valve operating control law for how the feedstock valve should function in a cycle.

The invention relates to a high-pressure mixing, dosing and recirculation head for injection or casting reaction molding, said high-pressure mixing, dosing and recirculation head comprising a head body, a mixing chamber, obtained in the head body wherein a valve element or mixing valve slides and in fluid communication with a supply duct, and a self-cleaning element comprising a scraping portion, said self-cleaning element being structured to slide in said supply duct, as well as comprising an apparatus for controlling and commanding mixing, supply and recirculation comprising a plurality of sensors and transducers mounted on board of the head body and of the components parts of the head connected thereto to detect and transform representative physical quantities of at least one operational status of said high-pressure mixing, dosing and recirculation head into electrical signals and an electronic control and storing system adapted to synchronously control and scan said sensors and transducers and adapted to receive and process said electrical signals indicative of said at least one operational status, at the beginning and during the operational phases of said high-pressure mixing, dosing and recirculation head to compare them with each other and with electrical signals representative of a predetermined reference operational status. The invention also relates to a high-pressure mixing, dosing and recirculation method for injection or casting reaction molding.

A nitrous oxide gas mixer includes at least one mixing chamber having at least one nitrous oxide gas connection and at least one oxygen gas connection for introduction of oxygen gas and nitrous oxide gas and at least one flow rate controller, by which a volume flow of the two gases can be respectively adjusted separately and/or together. At least one O.sub.2 emergency button is mounted to the mixing chamber for emergency flooding the mixing chamber with oxygen gas and/or with ambient air.

There is provided an inline saturator system and method for gas exchange with an aqueous-phase liquid. The system comprises a pressure vessel, configured to receive a first liquid and a first gas from external sources and to discharge a second liquid and a second gas from the pressure vessel, and a gas infusion device situated within the pressure vessel. The gas infusion device is configured to receive the first liquid and first gas, to facilitate gas exchange therebetween, producing the second liquid and the second gas, and to discharge the second liquid and second gas into the pressure vessel. The system further includes a recirculation system configured to direct a portion of liquid within the pressure vessel back into the saturator device, where injection of the redirected liquid into the gas infusion device forces the first liquid into the gas infusion device for the gas exchange.

Systems, methods, and software program products for dispensing chemical solutions. A controller receives a signal from a pressure sensor indicative of a pressure of a diluent. The controller determines an expected flow rate of the diluent through an eductor based at least in part on the pressure of the diluent. The controller may further determine an expected concentration of a chemical product in the solution dispensed from a discharge port of the eductor. Based on the expected flow rated and concentration of the chemical product, the controller determines a duration of a dispense stage of a dispensing operation required to dispense a predetermined dose of the chemical product. The controller then causes the diluent to flow through the eductor for the determined duration of the dispense stage. A check valve on the output of the eductor prevents dissimilar chemicals from mixing and reduces a response time of the eductor.

A microbubble device controller includes a box, and a first water pipe, a gas pipe and a bypass pipe installed in the box. The first water pipe is connected to a pump and has a first electromagnetic control valve to open or close the first water pipe. The gas pipe is connected to a gas source and the pump, and has a second electromagnetic control valve to open or close the gas pipe. The bypass pipe is connected to the first water pipe and has a pressure switch in telecommunication connection with the second electromagnetic control valve. The first electromagnetic control valve controls the first water pipe to be in the high flow state or a closed state to affect the bypass pipe. When the bypass pipe is in a high pressure state, the second electromagnetic control valve opens the gas pipe, or closes the gas pipe otherwise.

Systems and methods are described for dissolving ammonia gas in deionized water. The system includes a deionized water source and a gas mixing device including a first inlet for receiving ammonia gas, a second inlet for receiving a transfer gas, and a mixed gas outlet for outputting a gas mixture comprising the ammonia gas and the transfer gas. The system includes a contactor that receives the deionized water and the gas mixture and generates deionized water having ammonia gas dissolved therein. The system includes a sensor in fluid communication with at least one inlet of the contactor for measuring a flow rate of the deionized water, and a controller in communication with the sensor. The controller sets a flow rate of the ammonia gas based on the flow rate of the deionized water measured by the sensor, and a predetermined conductivity set point.

Disclosed are methods for continuous production of ozone strong water, the methods comprising the steps of injecting an acidification agent into a pressurized feed water to maintain a pH value of the pressurized feed water below 7, diffusing a two-phase mixture of O.sub.2-O.sub.3 gas and recirculated water into a body of acidic pressurized water to dissolve ozone into the acidic pressurized water. The disclosed methods include simultaneously maintaining a start-up mode in an upper portion of the dissolution column that favors high efficiency of ozone mass transfer into the acidic pressurized water and a steady state mode in a lower portion of the dissolution column that favors a high concentration of dissolved ozone in the acidic pressurized water coexistent in the body of the acidic pressurized water, wherein an ozone concentration gradient is formed along a height of the body of the acidic pressurized water.

A longitudinal sealer includes a housing, an arm, and a heating element. The housing is configured to be installed in a foam-in-bag system. The arm is movably coupled to the housing. The heating element has a leading edge exposed through an exterior surface of the arm. A position of the arm with respect to the housing is controllable so that the arm is movable between a first location where the leading edge of the heating element is not in contact with a film in a film path of the foam-in-bag system and a second location where the leading edge of the heating element is in contact with the film in the film path of the foam-in-bag system.