A method for continuously processing at least two liquid feed streams is provided. A system for continuously processing at least two liquid feed streams is also provided.

A system includes a high-pressure static mixer. The system also includes a clean fluid system that provides clean fluid to the first high-pressure static mixer at a first fluid velocity and a proppant fluid system that provides a proppant concentrate to the first high-pressure static mixer at a second fluid velocity. Additionally, the system includes a wellhead in fluid communication with the first high-pressure static mixer. The wellhead receives a mixed fluid including the clean fluid and the proppant concentrate from the first high-pressure static mixer.

A wipe dispenser for use in metering out consistent doses of a composition onto a disposable wipe includes a mixing and dispensing assembly. The assembly has a vessel holding a first liquid for the composition and a first pump to convey the first liquid. A bottle having a second pump to convey a second liquid of the composition is stored within the bottle. A funnel arrangement is in downstream communication with the first pump and second pump. The funnel arrangement includes a mixing chamber for mixing the first and second liquids and a dispensing funnel in communication with and downstream of the mixing chamber. A wipe can be pulled through the dispensing funnel and wetted with a mixture of the first liquid and second liquid from the mixing chamber. A push bar attached to the funnel arrangement can selectively apply the force to actuate the first pump and second pump.

A feeding and blending apparatus for a system for continuous processing of powder products comprises at least two system inlets for powder products; and at least two feeding and dosing devices arranged in a row. Each of the at least two feeding and dosing devices comprises, an inlet being connected with a system inlet, at least one feeder, at least one actuator configured to operate the at least one feeder, and an outlet being connected with an inlet of the powder blending device. A separation wall is configured to separate a process area from a technical. Process components of the at least two feeding and dosing devices are positioned in the process area and technical components of the feeding and dosing devices are positioned in the technical area. Connections between the at least one actuator and the at least one feeder pass through the separation wall.

A method for controlling operation of a manure arrangement (10) that includes a manure storage structure (3), an agitator (11), and an agitator motor (8) arranged to actuate the agitator (11). The method including monitoring (S1), while mixing manure in the manure storage structure (3) with the agitator (11), a load quantity indicative of a load on the agitator motor (8). The method further including controlling (S2) operation of the manure arrangement (10) based on the monitored load quantity. A manure arrangement (10) arranged to perform the method is provided.

The invention provides methods for assessing one or more predetermined characteristics or properties of a microfluidic droplet within a microfluidic channel, and regulating one or more fluid flow rates within that channel to selectively alter the predetermined microdroplet characteristic or property using a feedback control.

This application relates to an apparatus for reducing fine dust by using lightweight mixed air. The apparatus may include an apparatus main body configured to introduce and mix external air and remove the fine dust through adsorption, a seal type air mixing unit configured to mix the introduced external air and helium gas, an adsorption solution production unit configured to produce an adsorption solution for adsorbing the fine dust. The apparatus may also include an air bubble generation unit configured to generate air bubbles, emitted to outside, by using the adsorption solution, a flow control unit configured to control flow of air, so as to induce air bubble generation in the air bubble generation unit. The apparatus may further include a controller installed in a part of the apparatus main body and configured to control operations of the above units of the apparatus.

The present disclosure provides a chemical supply apparatus, a cleaning system, and a chemical supply method that can supply a cleaning chemical to two nozzles and also supply the cleaning chemical at a set flow rate to one of the nozzles.

A chemical supply apparatus according to the present disclosure includes: a first cleaning chemical supply pipe; a first mixer that mixes a first chemical and water to generate a first cleaning chemical; and a first supply controller, wherein the first cleaning chemical supply pipe includes an upstream pipe forming a channel from the first mixer to a first junction, a first pipe forming a channel from the first junction to a first nozzle, and a second pipe forming a channel from the first junction to a second nozzle, and the first supply controller is configured to execute a feedback control on the basis of the flow rate of the first cleaning chemical inside the first pipe of the first cleaning chemical supply pipe so that the flow rate of the first cleaning chemical flowing through the first pipe of the first cleaning chemical supply pipe is a set flow rate.

A solid material mixer for mixing two or more solid materials does not require the use of external power sources and moving parts. The mixer includes at least a first chamber or tank, at least one second chamber or tank, one or more main valves and one or more mixing and homogenizing zones. The device is used in a mixing method.

A spatially controllable, for example CD controllable, eductor, and more particularly an eductor that is capable of providing a variable motive fluid and processes using such an eductor are provided.