Patent classifications
B01J27/045
METHOD OF FORMING A SEMICONDUCTOR DEVICE USING LAYERED ETCHING AND REPAIRING OF DAMAGED PORTIONS
A method of fabricating a semiconductor device includes plasma etching a portion of a plurality of metal dichalcogenide films comprising a compound of a metal and a chalcogen disposed on a substrate by applying a plasma to the plurality of metal dichalcogenide films. After plasma etching, a chalcogen is applied to remaining portions of the plurality of metal dichalcogenide films to repair damage to the remaining portions of the plurality of metal dichalcogenide films from the plasma etching. The chalcogen is S, Se, or Te.
Supported catalyst for slurry phase hydrocracking of refinery residue and a process for its preparation
The present disclosure relates to a catalyst for slurry phase hydrocracking of refinery residue and a process for its preparation. The present disclosure provides a very simple method for exfoliation of metal sulphide, and a process of that provides effective slurry phase hydrocracking of refinery residue with a high yield.
Method of forming a semiconductor device using layered etching and repairing of damaged portions
A method of fabricating a semiconductor device includes plasma etching a portion of a plurality of metal dichalcogenide films comprising a compound of a metal and a chalcogen disposed on a substrate by applying a plasma to the plurality of metal dichalcogenide films. After plasma etching, a chalcogen is applied to remaining portions of the plurality of metal dichalcogenide films to repair damage to the remaining portions of the plurality of metal dichalcogenide films from the plasma etching. The chalcogen is S, Se, or Te.
Method of forming a semiconductor device using layered etching and repairing of damaged portions
A method of fabricating a semiconductor device includes plasma etching a portion of a plurality of metal dichalcogenide films comprising a compound of a metal and a chalcogen disposed on a substrate by applying a plasma to the plurality of metal dichalcogenide films. After plasma etching, a chalcogen is applied to remaining portions of the plurality of metal dichalcogenide films to repair damage to the remaining portions of the plurality of metal dichalcogenide films from the plasma etching. The chalcogen is S, Se, or Te.
METHOD FOR PRODUCING BENZIMIDAZOLE DERIVATIVE
The present invention relates to a process to prepare a benzimidazole derivative useful as a medicament, an intermediate for preparing the medicament, and a process to prepare the intermediate.
METHOD FOR PRODUCING BENZIMIDAZOLE DERIVATIVE
The present invention relates to a process to prepare a benzimidazole derivative useful as a medicament, an intermediate for preparing the medicament, and a process to prepare the intermediate.
Oxygen reduction catalyst, electrode, membrane electrode assembly, and fuel cell
The present invention relates to an oxygen reduction catalyst, an electrode, a membrane electrode assembly, and a fuel cell, and the oxygen reduction catalyst is an oxygen reduction catalyst containing substituted CoS.sub.2, in which the substituted CoS.sub.2 has a cubic crystal structure, the oxygen reduction catalyst contains the substituted CoS.sub.2 within 0.83 nm from the surface thereof, and the substituted CoS.sub.2 has at least one substitutional atom selected from the group consisting of Cr, Mo, Mn, Tc, Re, Rh, Cu, and Ag in some of Co atom sites.
Micron-scale cerium oxide particle having multi-core single-shell structure and preparation method therefor
The present invention involves micron-scale cerium oxide particles having a multi-cores single-shell structure, comprising: a cerium oxide shell, the shell being composed of crystalline and/or amorphous nano-scale cerium oxide particles; and a plurality of nano-scale cerium oxide grain cores aggregates located in the interior of the shell. Also involved is a preparation method for the micron-scale cerium oxide particle having a multi-cores single-shell structure. A supported catalyst with the micron-scale cerium oxide particles according to the invention as the support have good hydrothermal stability and good sulfur resistance, and the active components of the supported catalyst are not easily embedded, and the supported catalyst has a great application prospect in the field of catalytic oxidation of exhaust emissions such as CO, NO or volatile organic compounds.
supported metal catalyst with synergistic sites, a preparation method therefor and an application thereof
The present invention provides a supported metal catalyst with synergistic sites, a preparation method therefor and an application thereof. The preparation method of this catalyst is to utilize the unsaturated cubane-like structure, M cation with catalytic activity is introduced into the cluster core unit. By using the vertex vacancy as the capturing center, and adjusting the impregnation temperature to maximize the loading of the cluster precursor, as well as depending on the electrostatic adsorption of the support and the confinement of the cluster structural unit, the number of S vacancies and the distance between S vacancies and Miso sites are effectively controlled through liquid phase reduction and atmosphere treatment at room temperature to obtain supported X3MSx/Al2O3 catalyst with Miso-Vs synergistic sites. The method of the present invention achieves the joint enhancement of the activity, product selectivity, and stability of unsaturated carbon oxygen bond selective hydrogenation, carbon chlorine bond selective hydrogenation dechlorination, and carbon hydrogen bond dehydrogenation reactions. This catalyst is mainly used in various catalytic reaction processes in the fields of petrochemical, fine chemical, environmental chemical, and other fields. It has outstanding catalytic performance, excellent activity, selectivity, and good recyclability, and is easy to recover and reuse.
supported metal catalyst with synergistic sites, a preparation method therefor and an application thereof
The present invention provides a supported metal catalyst with synergistic sites, a preparation method therefor and an application thereof. The preparation method of this catalyst is to utilize the unsaturated cubane-like structure, M cation with catalytic activity is introduced into the cluster core unit. By using the vertex vacancy as the capturing center, and adjusting the impregnation temperature to maximize the loading of the cluster precursor, as well as depending on the electrostatic adsorption of the support and the confinement of the cluster structural unit, the number of S vacancies and the distance between S vacancies and Miso sites are effectively controlled through liquid phase reduction and atmosphere treatment at room temperature to obtain supported X3MSx/Al2O3 catalyst with Miso-Vs synergistic sites. The method of the present invention achieves the joint enhancement of the activity, product selectivity, and stability of unsaturated carbon oxygen bond selective hydrogenation, carbon chlorine bond selective hydrogenation dechlorination, and carbon hydrogen bond dehydrogenation reactions. This catalyst is mainly used in various catalytic reaction processes in the fields of petrochemical, fine chemical, environmental chemical, and other fields. It has outstanding catalytic performance, excellent activity, selectivity, and good recyclability, and is easy to recover and reuse.