A vessel system for high-pressure reactions is disclosed. The system includes a plugged polymer cylinder reaction vessel with a pressure vent opening extending radially through the wall of the reaction vessel and a supporting frame into which the vessel is received. Complementing keying structure elements on the vessel and on the frame limit the orientation of the reaction vessel in the supporting frame and the radially extending vent opening to a defined single position.

A microwave reactor constructed to produce a homogeneous heat distribution across the body of the microwave reactor subsequent exposure to microwave irradiation. The microwave reactor includes a body having an exterior wall transparent to microwave irradiation. A microwave sensitized element layer is adjacent the exterior wall and is comprised of a carbide mixture wherein the carbide mixture includes a carbide mixed with either a metal oxide, a ferrite or a nitride. The carbide mixture is in granular form wherein the carbide has a larger particle size than the other component. The microwave sensitized element layer further includes a metal layer that extends the length thereof. The metal layer is positioned in various arrangements within or adjacent to the carbide mixture. The body further includes an inner layer adjacent to the microwave sensitized layer opposite the exterior wall. The inner layer is transparent to microwave irradiation.

Systems and methods of synthesizing nanoparticles on substrates using rapid, high temperature thermal shock. A method involves depositing micro-sized particles or salt precursors on a substrate, and applying a rapid, high temperature thermal pulse or shock to the micro-sized particles or the salt precursors and the substrate to cause the micro-sized particles or the salt precursors to become nanoparticles on the substrate. A system may include a rotatable member that receives a roll of a substrate sheet having micro-sized particles or salt precursors; a motor that rotates the rotatable member so as to unroll consecutive portions of the substrate sheet from the roll; and a thermal energy source that applies a short, high temperature thermal shock to consecutive portions of the substrate sheet that are unrolled from the roll by rotating the first rotatable member. Some systems and methods produce nanoparticles on existing substrate. The nanoparticles may be metallic, ceramic, inorganic, semiconductor, or compound nanoparticles. The substrate may be a carbon-based substrate, a conducting substrate, or a non-conducting substrate. The high temperature thermal shock process may be enabled by electrical Joule heating, microwave heating, thermal radiative heating, plasma heating, or laser heating.

In order to provide a microwave treatment apparatus capable of properly controlling microwave irradiation, a microwave treatment apparatus 1 includes: an irradiating portion that performs microwave irradiation from multiple emitting portions; a moving portion that individually moves the multiple emitting portions; and a control portion that controls movements of the emitting portions by the moving portion, wherein the irradiating portion is such that phases of microwaves that are emitted from the multiple emitting portions are changeable, and the control portion controls phases of microwaves that are emitted by the irradiating portion from the multiple emitting portions.

A vessel system for high-pressure reactions is disclosed. The system includes a plugged polymer cylinder reaction vessel with a pressure vent opening extending radially through the wall of the reaction vessel and a supporting frame into which the vessel is received. Complementing keying structure elements on the vessel and on the frame limit the orientation of the reaction vessel in the supporting frame and the radially extending vent opening to a defined single position.

A vessel system for high-pressure reactions is disclosed. The system includes a plugged polymer cylinder reaction vessel with a pressure vent opening extending radially through the wall of the reaction vessel and a supporting frame into which the vessel is received. Complementing keying structure elements on the vessel and on the frame limit the orientation of the reaction vessel in the supporting frame and the radially extending vent opening to a defined single position.

A vessel system for high-pressure reactions is disclosed. The system includes a plugged polymer cylinder reaction vessel with a pressure vent opening extending radially through the wall of the reaction vessel and a supporting frame into which the vessel is received. Complementing keying structure elements on the vessel and on the frame limit the orientation of the reaction vessel in the supporting frame and the radially extending vent opening to a defined single position.

A fluid treatment device with a new configuration is provided. The fluid treatment device is provided with an upstream treatment unit defined by treatment surfaces that rotate relative to each other, and a downstream treatment unit arranged downstream of the upstream treatment unit. The upstream treatment unit is configured such that, by passing the fluid to be treated into an upstream treatment space defined by the treatment surfaces, the fluid to be treated is subjected to upstream treatment. The downstream treatment unit is provided with a downstream treatment space which performs the function of retaining and mixing the fluid to be treated by means of a labyrinth seal. An upstream outlet of the fluid to be treated from the upstream treatment unit opens into the downstream treatment space, and the downstream treatment space is configured to use the labyrinth seal to perform the function of controlling retention time. The downstream treatment space is provided with narrow seal spaces, and retention spaces arranged upstream of the seal spaces and wider than the seal spaces, and the upstream outlet opens to a retention space.

Disclosed herein are systems, methods, and devices for rapid synthesis of materials. In some embodiments, a system may comprise a material processing apparatus for processing a material, the material processing apparatus comprising a material passage structure in communication with a material feeding inlet, the material passage structure located within a reaction chamber, and the material feeding inlet configured to receive a material and transfer the material to the material passage structure; and a heat source in communication with the reaction chamber, the heat source comprising one or more of: plasma, flame, combustion sources, resistive heaters, heated liquid baths, electromagnetic radiation, and/or induction heaters, wherein the material passage structure is located within, surrounding, or adjacent to the heat source, such that the material passage structure is heated by the heat source and the material is converted to a product within the material passage structure.

Disclosed are single atom dispersions and multi-atom dispersions, and systems and methods for synthesizing the atomic dispersions. An exemplary method of synthesizing atomic dispersions includes: positioning a loaded substrate which includes a substrate which is loaded with at least one of: a precursor of an element or a cluster of an element, applying one or more temperature pulses to the loaded substrate where a pulse of the temperature pulse(s) applies a target temperature for a duration, maintaining a cooling period after the pulse, and providing single atoms of the element dispersed on the substrate after the one or more temperature pulses. The target temperature applied by the pulse is between 500 K and 4000 K, inclusive, and the duration is between 1 millisecond and 1 minute, inclusive.