The present invention relates to an apparatus for the treatment of a chemical product applied to surfaces of items. The apparatus includes: a tunnel chamber, a conveyor belt element, first injection means configured to supply an inert gas in the tunnel chamber, and radiation means configured for the treatment of the chemical product. Furthermore, the apparatus includes a suction chamber in fluid communication with the tunnel chamber, and suction means fluidly connected to the suction chamber. Specifically, the suction chamber is in fluid communication with the tunnel chamber through a plurality of through ducts formed on a wall element separating the chambers, and the conveyor belt element is provided with a plurality of through openings which pass through its thickness.

A method for removing solvent from a solvent containing sweep gas stream obtained from a fertilizer coating process is disclosed. The method can include directly contacting the solvent containing sweep gas stream with an aqueous composition comprising 50% wt/wt to 100% wt/wt of water, condensing at least a portion of the solvent out of the solvent containing sweep gas stream into the aqueous composition to produce a solvent-enriched aqueous composition and a recovered sweep gas stream, and removing the recovered sweep gas stream from the solvent-enriched aqueous composition.

A paint curing system is provided. The paint curing system includes a robot arm, a first light, a lamp panel, and a control module. The robot arm includes a first end and a second end that opposes the first end. The first light is disposed at the second end of the robot arm and is configured to cure paint on a first panel of a vehicle. The lamp panel is positioned adjacent to the vehicle and includes a second light that is configured to cure paint on a second panel of the vehicle. The control module configured to actuate the robot arm and position the first light relative to the first panel of the vehicle, selectively turn on and off the first light, and selectively turn on and off the second light.

A method is provided for depositing a planarization layer over features on a substrate using sequential polymerization chemical vapor deposition. According to one embodiment, the method includes providing a substrate containing a plurality of features with gaps between the plurality of features, delivering precursor molecules by gas phase exposure to the substrate, adsorbing the precursor molecules on the substrate to at least substantially fill the gaps with a layer of the adsorbed precursor molecules, and reacting the precursor molecules to form a polymer layer that at least substantially fills the gaps.

This application relates to omniphobic materials which are physically and chemically modified at their surface to create hierarchically structured materials with both nanoscale and microscale structures that provide the omniphobic properties. Methods of making such omniphobic surfaces with hierarchical structures and uses thereof, including as flexible films that repel contaminants are also disclosed in the application.

Provided is a method of forming a monolayer of nanorods on a substrate, wherein the nanorods are at least substantially vertically aligned, the method including providing a droplet of a solution including the nanorods on a substrate, and controlling the temperature and the evaporation of the solution such that the internal region of the droplet is kept at near equilibrium status to allow formation of the monolayer of nanorods. Also provided is a monolayer of nanorods on the substrate thus obtained. Also provided is an optical arrangement and use of the optical arrangement.

An ultraviolet curing apparatus having: a roller for guiding a film coated with a resin; a first nitrogen gas introduction port and a second nitrogen gas introduction port for introducing nitrogen gas; a UV irradiation portion for irradiating the film with ultraviolet rays from between the first nitrogen gas introduction port and the second nitrogen gas introduction port; an oxygen concentration meter for measuring an oxygen concentration between the film and the UV irradiation portion; an air introduction port for introducing air between the film and the UV irradiation portion; and a controller for controlling at least any one of: an amount of air introduced from the air introduction port, an amount of nitrogen gas introduced from the first nitrogen gas introduction port, and an amount of nitrogen gas introduced from the second nitrogen gas introduction port, so that the oxygen concentration is within a preset oxygen concentration set range.

This application relates to omniphobic materials which are physically and chemically modified at their surface to create hierarchically structured materials with both nanoscale and microscale structures that provide the omniphobic properties. Methods of making such omniphobic surfaces with hierarchical structures and uses thereof, including as flexible films that repel contaminants are also disclosed in the application.

A laminate includes a substrate; an atomic layer deposition film that is disposed on at least one surface of the substrate, and is made of an inorganic material; and a protective film that is bonded to and covers the atomic layer deposition film, and has an adhesive layer that is in contact with the atomic layer deposition film.

Disclosed is a method of generating a recipe for supplying an imprint material onto a substrate, the imprint material being used in imprint processing of forming a pattern on the substrate with the imprint material and a mold. The method includes obtaining first information about a volume of a pattern of the mold, and obtaining second information about a concentration of a condensable gas to be supplied to a space between the mold and the imprint material on the substrate. The condensable gas has a property of being liquefied by contact between the mold and the imprint material. The method further includes generating the recipe based on the first information and the second information.