A vibration cleaning device, method and system are provided. The vibration cleaning device includes a cleaning module configured to clean an object through a cleaning solution; a cleaning solution delivering module configured to deliver the cleaning solution to the object when the cleaning module performs a cleaning process on the object; a vibrating module configured to vibrate, move and drive the cleaning module to vibrate the object at a predetermined vibration frequency, so that the cleaning module performs vibration cleaning on the object through the cleaning solution; a cleaning tank configured to accommodate the object and the cleaning solution after cleaning the object; a transfer module configured to transfer the uncleaned object to the cleaning tank and transfer the cleaned object out of the cleaning tank; and a control module configured to control working states of the cleaning solution delivering module, the vibrating module and the transfer module.

According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.

The invention relates to a method for washing/cleaning granular material from slag and for washing/cleaning bottom/boiler ash from a thermal waste treatment. In the method, the granular material is added to a process liquid and is subjected to ultrasound therein. According to the invention, it is proposed that the process liquid is located in an upright cleaning channel with an upper feeding end and a lower extraction end, that the granular material is introduced into the cleaning channel from the feeding end, and moves downwards towards the extraction end due to the force of gravity, and is subjected to ultrasound during the sinking movement.

A cleaning apparatus includes a spinner table for holding a workpiece thereon, a cleaning nozzle for supplying cleaning water to the workpiece held on the spinner table, an ultrasonic vibrator for applying ultrasonic vibrations to the cleaning water supplied from the cleaning nozzle to the workpiece, a water layer forming unit for forming a layer of the cleaning water in a clearance between the cleaning nozzle and the workpiece, the water layer forming unit having a cover surrounding the cleaning nozzle, and a drain unit for draining the cleaning water out of the cleaning apparatus, the drain unit having a flow channel for allowing the cleaning water supplied from the cleaning nozzle to the workpiece to flow therethrough.

Embodiments of megasonic cleaning chambers are provided herein. In some embodiments, a megasonic cleaning chamber includes: a chamber body defining an interior volume therein; a substrate support to support a substrate disposed in the interior volume; a supply tube comprising a transparent material configured to direct a cleaning fluid to the substrate support; a megasonic power generator coupled to the supply tube to provide megasonic power to the cleaning fluid; a megasonic transducer coupled to the megasonic power generator and the supply tube to create megasonic waves in the cleaning fluid and to form cavities in the cleaning fluid, wherein the megasonic transducer is configured to direct the megasonic waves and cavities toward the substrate support; and one or more sensors configured to generate a signal indicative of a property of the cavities in the cleaning fluid.

A wafer cleaning apparatus according to the present disclosure includes a rotary table that supports and rotates a wafer so that the wafer rotates about a rotational axis, and an ultrasonic vibration device that vibrates a liquid film so that vibration having an ultrasonic frequency is generated in the liquid film formed on an upper surface of the wafer.

A method for decontaminating a low-temperature article, the method comprising: an applying step including applying a decontamination agent to external surfaces of a low-temperature article and supplying a mist of decontamination agent to a first external surface of said low-temperature article to form a condensed film of the decontamination agent on said first external surface; and a drying step including ultrasonically vibrating vibration boards disposed on a periphery of the low-temperature article to generate sound flows from board surfaces by an ultrasound in a vertical direction, irradiating with ultrasonic waves the low-temperature article with the decontamination agent applied thereto, subjecting said first external surface of the low-temperature article to ultrasonic vibration and acoustic radiation pressure, supplying dry air to the first external surface and drying said first external surface.

A flowback tank cleaning system and method is described. A flowback tank includes a self-cleaning system. A flowback tank cleaning method may include moving solid debris collected at a bottom of a collection section of a flowback tank towards a lift auger using a cleaning auger or a conveyer belt extending along a length of the collection section, the bottom of the collection section including an angled trough, funneling solid debris towards the cleaning auger or conveyor belt by placing the cleaning auger or conveyor belt at a base of the angled trough, spraying fluid downward through a series of fluid outlets, removing the sand so moved by the cleaning auger or conveyer belt from the flowback tank using the lift auger, and removing the fluid from the flowback tank using a drain manifold below the cleaning auger or conveyer belt.

A feed-through ultrasonic cleaning system for winding of a superconducting coil, including a sealed chamber system, a main ultrasonic cleaning system, a deionized water spraying system, a compressed air blow-drying system, and an automatic control system. During the winding of an armored superconducting coil, a superconducting conductor which is fed at a constant speed successively passes through a sealed chamber, an ultrasonic cleaning chamber, a first compressed air blow-drying chamber, a deionized water spray chamber, and a second compressed air blow-drying chamber in the ultrasonic cleaning system.

A continuous cleaning installation 1 of a passing strip S includes a tank 2, an aqueous solution 3 inside the tank 2. It also includes at least a roller 4 immerged in the aqueous solution 3, at least an ultrasound emitter-5, a feed for feeding 6 an aqueous solution and emptying 7 the tank. Moreover, it also includes an aqueous solution level estimator for estimating 8 the aqueous solution level, a distance calculator for calculating 9 for each ultrasound emitter 5 its distance to the aqueous solution level and a power controller for controlling the power 10 of the at least one ultrasound emitter 5 and at least an impermeable closable opening 11 on at least a lateral side of the tank through which the at least one ultrasound emitter 5 can pass.