Embodiments herein relate to part separation and cleaning devices. In an embodiment, a part separation and cleaning apparatus is included having a liquid holding tub defining an interior volume. The liquid holding tub can include a bottom pan defining a center aperture and an outer perimeter, a perimeter wall attached to the bottom pan adjacent to the outer perimeter thereof and a center sleeve attached to the bottom pan over the central aperture and extending upward away from the bottom pan. The apparatus can further include a motor and a drive shaft. An indexing plate within the liquid holding tub can be connected to the drive shaft. The indexing plate can rotate and can include a plurality of discrete compartments. A control circuit can be configured to cause the drive unit to initiate an indexing movement in response to a received signal. Other embodiments are also included herein.

The present disclosure provides a wafer cleaning apparatus and a cleaning method. The wafer cleaning apparatus includes a tank and a wafer holder. The tank includes a bottom wall, a lateral wall, and a partition wall. The lateral wall is connected to the bottom wall. The partition wall is movably mounted on the lateral wall and divides a cleaning space defined by the bottom wall and the lateral wall into a first compartment and a second compartment. A passage communicating with the first compartment and the second compartment is formed when the partition wall is moved away from the bottom wall and immersed in a cleaning fluid received in the cleaning space. The wafer holder is adapted to be immersed in the cleaning fluid and to move between the first compartment and the second compartment. The present disclosure further provides a method of cleaning the wafer.

An apparatus for disinfecting products is disclosed herein. The apparatus comprises a tank for holding a liquid for receiving microorganisms from the products. The tank comprises a barrier separating the tank to provide two regions of liquid, the two regions of liquid comprising a first region and a second region, wherein the first region is arranged to provide an open channel for the liquid through the tank to enable a product to be carried into, along, and out of a flowpath through the channel; and the second region holds liquid adjacent to at least one ultrasonic transducer for providing ultrasonic energy to the product via the liquid in the second region and through the barrier.

Provided is an endless metal ring manufacturing method for manufacturing an endless metal ring by carrying out a barrel polishing step for polishing the endless metal ring by using a barrel of a resin material, a rolling step for rolling the endless metal ring which was cleaned, and a nitriding step for nitriding the endless metal ring which was rolled, wherein after the barrel polishing step and before the rolling step, provided is a resin removing step for removing resin that has adhered to the endless metal ring.

Disclosed is a bifilar winding system for the manufacture of poloidal field superconducting magnets for nuclear fusion, including two superconducting coil winding production lines which are symmetrically arranged, a dropping fixture, a rotary platform and a winding mold, and an automatic control system. Each of the two winding production lines includes a conductor unwinding device, a straightener, an ultrasonic cleaning machine, a sandblasting and cleaning machine, a bending machine, an inter-turn insulation taping machine. During the winding of a coil, a superconducting conductor is unwound by the conductor unwinding device under the control of the automatic control system, then straightened, ultrasonically cleaned, sandblasted and cleaned, and bent into a desired radius, then wrapped with multiple layers of insulating tape by the inter-turn insulation taping machine, and finally fixed, by the dropping fixture, precisely on the rotary platform at a correct position within a profile of the winding mold.

An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and drying the continuous substrate.

A method and a device for preparing cleaned rock salt are provided in the present disclosure. The method includes examining a plurality of rock salt blocks and positioning a qualified rock salt block; performing a first three-dimensional photographing to determine an area of a contaminant; in response to the area of the contaminant, performing a pre-cleaning process, an enhanced cleaning process, and an ultrasonic cleaning process with movable probes or performing a pre-cleaning process; performing an ultrasonic combined cleaning process; monitoring a turbidity level; in response to the turbidity level being monitored, triggering a monitoring alarm or performing a spray cleaning process, an air knife water removal process, and a hot-air drying process on a corresponding rock salt block; after the drying process, performing a second three-dimensional photographing to determine the area of the contaminant; and storing the corresponding rock salt block or performing an online explosive residue detection.

A part processing apparatus and method is disclosed that includes a media-blasting apparatus and a cleaning apparatus. The media-blasting apparatus is configured to blast a stream of media against a surface of a part, and the cleaning apparatus is configured to clean debris or particles from the surface of the part. The cleaning apparatus includes a first spray-and-wash unit, a first ultrasonic wash unit, a second ultrasonic wash unit, and a second spray-and-wash unit, which may be arranged in the listed order. Each of the units may be configured to utilize hot liquid or water to clean the part being processed. The first ultrasonic wash unit is configured to ultrasonically vibrate a liquid in the first ultrasonic wash unit at a first frequency, and the second ultrasonic wash unit is configured to ultrasonically vibrate a liquid in the second ultrasonic wash unit at a second frequency. The first and second frequencies may be different from each other, such that vibration at the second frequency causes additional debris or particles to be removed from the surface of the part that were not, or could not be, removed from exposure to vibration at the first frequency. The apparatus and method may further include a drying and/or inspection unit for the part after being processed in the cleaning apparatus.

The present disclosure relates to an apparatus for cleaning a transfer plate and a method for cleaning the same. The apparatus for cleaning a transfer plate includes a rack, a cleaning tank, a cleaning roller, at least a part of a cylindrical surface of the cleaning roller is located inside the cleaning tank, and a transfer plate is provided on the cylindrical surface of the cleaning roller fixing mechanism for fixing a transfer plate wound around the cylindrical surface; protrusions are provided on the cylindrical surface, and a vacuum suction hole for sucking the transfer plate is provided on periphery of a protrusion; a friction cleaning device, and the friction cleaning device frictionally cleans the transfer plate through a relative movement between the cleaning roller and the friction cleaning device; a drive device configured to generate a relative movement between the cleaning roller and the friction cleaning device.

The present application discloses a cleaning apparatus and system, including: a transmission assembly; a drive assembly, connected to the transmission assembly and located lower than the transmission assembly; a cleaning assembly, located higher than the transmission assembly; and a waterproof structure, located between the drive assembly and the cleaning assembly.