An endoscope unblocking flush system for back flushing a suction lumen of an endoscope includes a flush source providing pressurized water and a valve mechanism to cut off a suction source from the suction lumen and to open the suction lumen to flow of back flush water from the flush source. The valve mechanism includes a valve housing with ports to connect to the suction lumen, the suction source, and the flush source. A valve member within the housing has passages to connect the suction source to the suction lumen in a run state and to connect the flush source to the suction lumen in a flush state.

The application discloses an auxiliary device for a tank of an ultrasound apparatus which comprises a rack and at least one adapter for a medical instrument. Thereby, the adapter comprises a housing and at least one coupling element which is movable with respect to the housing by way of a drive and which can be coupled to the medical instrument, so that a movement of the coupling element effects an active movement of at least one region of the medical instrument.

A cleaning system includes a surgical tool assembly having a longitudinal shaft and a sleeve surrounding the longitudinal shaft. The system includes an injector head and body that receive the assembly. The head has an inlet coupling that fluidly couples to a pressurized fluid source. The body couples to the head to house the assembly between the head and the body. The body has an outlet coupling to fluidly couple to a vacuum source. When the assembly is housed between the head and the body, at least one fluid pathway is formed between the inlet coupling, the head, the shaft and the sleeve, the body, and the outlet coupling. A positive pressure fluid source is coupled to the inlet coupling and a vacuum source is connected to the outlet coupling to establish a pressure differential across the fluid pathway sufficient to draw the fluid therethrough.

The present invention relates to a method and apparatus for cleaning an oil and gas well riser section or assembly. Even more particularly, the present invention relates to an improved method and apparatus for cleaning oil and gas well riser sections wherein a specially configured cap or pair of caps are fitted to the ends of the riser which enable pressure washing cleaning tools (or a camera) to be inserted into and through the riser cleaner fluid continuously recirculates so that relatively small volume of cleaning fluid (for example between about 700 and 1,000 gallons) is required. The cleaning process uses a volume of cleaning fluid that is discharged from the riser pipe at a relatively high temperature of about between 10 and 180 F. Such a high temperature cleaning fluid could possibly damage the pump that is used for supplying pressurized fluid to the cleaning tool. The present invention provides a method and apparatus for enabling continuous recirculation of fluid to the cleaning tool at a flow rate of between about 7 and 12 gallons per minute while lowering the temperature to about 60 F.

The present invention relates to a method and apparatus for cleaning an oil and gas well riser section or assembly. Even more particularly, the present invention relates to an improved method and apparatus for cleaning oil and gas well riser sections wherein a specially configured cap or pair of caps are fitted to the ends of the riser which enable pressure washing cleaning tools (or a camera) to be inserted into and through the riser cleaner fluid continuously recirculates so that relatively small volume of cleaning fluid (for example between about 700 and 1,000 gallons) is required. The cleaning process uses a volume of cleaning fluid that is discharged from the riser pipe at a relatively high temperature of about between 10 and 180 F. Such a high temperature cleaning fluid could possibly damage the pump that is used for supplying pressurized fluid to the cleaning tool. The present invention provides a method and apparatus for enabling continuous recirculation of fluid to the cleaning tool at a flow rate of between about 7 and 12 gallons per minute while lowering the temperature to about 60 F.

The present disclosure provides a cleaning system, including a first sub-chamber, a second sub-chamber adjacent to the first sub-chamber, and a third sub-chamber adjacent to the second sub-chamber. A first divider is positioned between the first and the second sub-chambers. A second divider is positioned between the second and the third sub-chambers. A vacuum system is coupled to the third sub-chamber to generate a vacuum pressure in the third sub-chamber that is less than a pressure of the first sub-chamber to create a pressure differential to induce a pressurized flow of a first cleaning media from the first sub-chamber to the third sub-chamber through an internal passage of a component positioned in the second sub-chamber. A filtering system is coupled to the first sub-chamber and the third sub-chamber to remove and filter the first cleaning media from the third sub-chamber and return the first cleaning media to the first sub-chamber.

The present disclosure provides a cleaning system, including a first sub-chamber, a second sub-chamber adjacent to the first sub-chamber, and a third sub-chamber adjacent to the second sub-chamber. A first divider is positioned between the first and the second sub-chambers. A second divider is positioned between the second and the third sub-chambers. A vacuum system is coupled to the third sub-chamber to generate a vacuum pressure in the third sub-chamber that is less than a pressure of the first sub-chamber to create a pressure differential to induce a pressurized flow of a first cleaning media from the first sub-chamber to the third sub-chamber through an internal passage of a component positioned in the second sub-chamber. A filtering system is coupled to the first sub-chamber and the third sub-chamber to remove and filter the first cleaning media from the third sub-chamber and return the first cleaning media to the first sub-chamber.

A self-cleaning mechanism for a filtration system, being disclosed, comprising a filter element positioned in a filtration chamber and a suction scanner for cleaning the filter element upon activation of a cleaning session, wherein a linear motion of the suction scanner between an initial position and a final position is automatically regulated by a linear displacement regulator comprising (i) a regulative-fluid compartment in liquid communication with a regulative flow-restrictor; and (ii) a regulative-fluid compression element linearly comoving with the suction scanner for enforcing a regulative-fluid filled in the regulative-fluid compartment, to flow through the regulative flow-restrictor. Further being disclosed are a filtration system comprising said self-cleaning mechanism, and a method for regulating the linear displacement of a suction scanner of a self-cleaning filtration system by said linear displacement regulator.

A self-cleaning mechanism for a filtration system, being disclosed, comprising a filter element positioned in a filtration chamber and a suction scanner for cleaning the filter element upon activation of a cleaning session, wherein a linear motion of the suction scanner between an initial position and a final position is automatically regulated by a linear displacement regulator comprising (i) a regulative-fluid compartment in liquid communication with a regulative flow-restrictor; and (ii) a regulative-fluid compression element linearly comoving with the suction scanner for enforcing a regulative-fluid filled in the regulative-fluid compartment, to flow through the regulative flow-restrictor. Further being disclosed are a filtration system comprising said self-cleaning mechanism, and a method for regulating the linear displacement of a suction scanner of a self-cleaning filtration system by said linear displacement regulator.

The invention relates to a method for rinsing a coating product application device comprising a metering device and a coating product applicator. The metering device comprises a metering pump having an inlet connected to a gas supply channel and a solvent supply channel and an outlet connected to the applicator. Each of the supply channels is provided with a respective valve.

The method comprises at least one step of suction by the metering pump of a volume during at least one suction phase of the metering pump, the valves being alternately in the open configuration during the at least one suction phase, in such a way that the volume sucked in during the at least one suction phase comprises alternately gas and solvent.

The invention further relates to an associated application device.