An apparatus for treating waste of a nuclear reactor pressure vessel includes: a suction unit inserted into the nuclear reactor pressure vessel through a plurality of through-pipes passing through a lower portion of the nuclear reactor pressure vessel to suck waste inside the nuclear reactor pressure vessel; a waste treatment part connected to the suction unit to treat the waste; and a lower collection part connected to the waste treatment part to be positioned under the nuclear reactor pressure vessel with the suction unit therebetween.

Methods and apparatus to treat workpieces are disclosed. A disclosed example equipment is to treat a workpiece with a process fluid, where the workpiece has a workpiece body with at least one cavity that extends from a first opening to a second opening. The example equipment includes a line system for providing the process fluid, where the line system has at least one line duct with an adapter for connecting the line system to the at least one cavity, a process chamber to receive the workpiece in treatment, where the process chamber includes an outlet to discharge a process fluid that has been induced into the cavity, and a suction installation to generate negative pressure, where the suction installation is connected to the process chamber by a suction duct to suction the process fluid from a fluid vessel through the at least one line duct and the at least one cavity into the process chamber.

A safety apparatus includes a safety fabric that in use is positioned in an access opening of a subsurface chamber. The safety fabric has a mesh with a plurality of mesh openings and a band formed around a perimeter of the mesh. At least one safety indicator is attached to the band by at least one strap. The safety indicator may be positioned outside of the access opening by extension of the strap when the safety fabric is positioned in the access opening. The subsurface chamber with the access opening may be an inlet chamber of a lift station.

A safety apparatus includes a safety fabric that in use is positioned in an access opening of a subsurface chamber. The safety fabric has a mesh with a plurality of mesh openings and a band formed around a perimeter of the mesh. At least one safety indicator is attached to the band by at least one strap. The safety indicator may be positioned outside of the access opening by extension of the strap when the safety fabric is positioned in the access opening. The subsurface chamber with the access opening may be an inlet chamber of a lift station.

A foot operated pump includes a water and airtight flexible and collapsible wall between a top plate and a base plate and an interior variable volume chamber. A flexible hose is selectively attachable to either an inlet port or an outlet port on the top plate member. The contents (air and/or liquid) within the variable volume chamber are forced out of the outlet port upon forced downward movement of the top plate member towards the base plate member. As the top plate member returns to a normally relaxed state in separated, angled relation to the base plate, the variable volume chamber enlarges and air is sucked through the inlet port to fill the variable volume chamber. An opposite end of the flexible hose attaches to various adapters and fittings for clearing clogged drain lines and other conduits.

A foot operated pump includes a water and airtight flexible and collapsible wall between a top plate and a base plate and an interior variable volume chamber. A flexible hose is selectively attachable to either an inlet port or an outlet port on the top plate member. The contents (air and/or liquid) within the variable volume chamber are forced out of the outlet port upon forced downward movement of the top plate member towards the base plate member. As the top plate member returns to a normally relaxed state in separated, angled relation to the base plate, the variable volume chamber enlarges and air is sucked through the inlet port to fill the variable volume chamber. An opposite end of the flexible hose attaches to various adapters and fittings for clearing clogged drain lines and other conduits.

A cleaning method includes a first removal step of causing an inert gas to which a pulsation is applied to flow into an exhaust pipe after a silicon single crystal doped with an n-type dopant is produced, to peel and remove a deposit; and a second removal step of causing an atmospheric air to which no pulsation is applied to flow into the exhaust pipe through a chamber to burn a part of the deposit with the atmospheric air, the part being not removable in the first removal step, and peel and remove a burned substance of the deposit.

A cleaning method includes a first removal step of causing an inert gas to which a pulsation is applied to flow into an exhaust pipe after a silicon single crystal doped with an n-type dopant is produced, to peel and remove a deposit; and a second removal step of causing an atmospheric air to which no pulsation is applied to flow into the exhaust pipe through a chamber to burn a part of the deposit with the atmospheric air, the part being not removable in the first removal step, and peel and remove a burned substance of the deposit.

A deposit removing device disclosed herein removes a deposit that adheres to an exhaust pipe through which gas is exhausted from a chamber that manufactures a semiconductor crystal. The deposit removing device includes: a valve that opens and closes an exhaust outlet that communicates with the exhaust pipe; a sealing cover and a fixed table configured to store the valve, into which an inert gas is introduceable, and configured to isolate the exhaust outlet from the outside; and an exhaust outlet opening/closing portion that includes a cylinder for driving the valve and a cylinder for driving the sealing cover or the fixed table. The cylinder drives the valve to open and close the exhaust outlet, and the cylinder drives the sealing cover or the fixed table to introduce the atmosphere into the sealing cover.

A deposit removing device disclosed herein removes a deposit that adheres to an exhaust pipe through which gas is exhausted from a chamber that manufactures a semiconductor crystal. The deposit removing device includes: a valve that opens and closes an exhaust outlet that communicates with the exhaust pipe; a sealing cover and a fixed table configured to store the valve, into which an inert gas is introduceable, and configured to isolate the exhaust outlet from the outside; and an exhaust outlet opening/closing portion that includes a cylinder for driving the valve and a cylinder for driving the sealing cover or the fixed table. The cylinder drives the valve to open and close the exhaust outlet, and the cylinder drives the sealing cover or the fixed table to introduce the atmosphere into the sealing cover.