An apparatus and method for making a three-dimensional object from a solidifiable material using two photon absorption is described. The use of two photon absorption allows for the creation of a non-solidification zone beneath the exposed surface of a solidifiable material so that no separation is required between the most recently solidified layer of the object and a substrate such as a glass, a film, or a glass/film combination. In addition, when used with a linear scanning device, two photon absorption causes solidification to occur within a small spot area, which provides a means for creating larger, higher resolution objects than DLP systems or laser systems that use single photon absorption.

A first region is formed by injecting a first condition type first dopant into a surface layer portion of an IGBT section of a semiconductor substrate. A second region is formed by injecting a second condition type second dopant into a region of the IGBT section shallower than the first region. An amorphous third region is formed by injecting the first conduction type third dopant into a surface layer portion of a diode section at a concentration higher than that of the second dopant. Thereafter, the IGBT section and the diode section are laser-annealed under conditions in which the third region is partially melted and the first dopant is activated. Subsequently, a surface layer portion which is shallower than the second injection region in the entire region of the IGBT section and the diode section is melted and crystallized by annealing the IGBT section and the diode section.

An adjustment to an irradiation parameter corresponding to a first irradiation unit and/or a second irradiation unit of an irradiation device of an additive manufacturing apparatus may be performed based at least in part on a simulation. The simulation may include simulating generation of a plurality of first calibration patterns by the first irradiation unit and a plurality of second calibration patterns by the second irradiation unit with a simulated change to the irradiation parameter of the irradiation device, and determining a calibration quality value based at least in part on position information relating to the plurality of first calibration patterns and the plurality of second calibration patterns. The calibration quality value may include an indication as to whether a calibration quality of the apparatus would be improved as a result of the adjustment to the irradiation parameter.

A laser processing device includes: a first laser oscillator that emits a first laser beam having a peak wavelength of a first wavelength; a second laser oscillator that emits a second laser beam having a peak wavelength of a second wavelength different than the first wavelength; a drive controller that drives each of the first laser oscillator and the second laser oscillator; and an analyzer that obtains signal light from a workpiece and adjusts one or more processing conditions for the workpiece based on the obtained signal light. The drive controller drives the first laser oscillator and the second laser oscillator according to the one or more processing conditions to change an intensity of at least one of the first laser beam or the second laser beam and irradiate the workpiece with at least one of the first laser beam or the second laser beam.

A laser crystallization device includes a laser oscillator, a stage, and a reflection unit. The stage is configured to support a substrate with a target film disposed on the substrate. The laser oscillator is configured to irradiate an incident laser beam on the target film. The stage is configured to move the substrate such that the incident laser beam scans the target film. The incident laser beam is reflected from the target film to generate a reflected laser beam. The reflection unit includes at least two reflection mirrors positioned at a path of the reflected laser beam. The reflection unit is configured to re-irradiate the reflected laser beam on the target film two or more times through a plurality of paths that are different from a path of the incident laser beam.

There is provided a power control method for a fiber laser processing machine including: a fiber laser oscillator having a plurality of fiber laser modules each of which generates a laser beam; a laser processing head for emitting the laser beam generated from the fiber laser oscillator; and a condenser lens with a prescribed focal length provided between a workpiece and the laser processing head, for irradiating the workpiece with the laser beam having a spot diameter output from the laser processing head, wherein the number of the plurality of fiber laser modules oscillated is adjusted so as to achieve the spot diameter corresponding to the workpiece, and thereby, a beam quality from the laser processing head is adjusted.

A method for forming three-dimensional anchoring structures on a surface is provided. This may result in a thermal barrier coating system exhibiting enhanced adherence for its constituent coatings. The method involves applying a laser beam (10) to a surface (12) of a solid material (14) to form a liquefied bed (16) on the surface of the solid material, then applying a pulse of laser energy (18) to a portion of the liquefied bed to cause a disturbance, such as a splash (20) or a wave (25) of liquefied material outside the liquefied bed. A three-dimensional anchoring structure (22) may thus be formed on the surface upon solidification of the splash or wave of liquefied material.

The invention relates to a method for forming a structuring at surfaces of components using a laser beam. In the invention, a laser beam is directed onto a diffractive optical element. The diffractive optical element is configured such that the laser beam is split into at least two part beams and the part beams are directed at an angle α with respect to the optical axis of the laser beam onto at least one further optical element which is transparent for the laser radiation. The further optical element(s) has/have a first surface and a second surface which is inclined at an angle to the optical axis of the laser beam at which the beam direction of the part beams is changed by optical refraction. A focusing optical lens is arranged in the optical path of the part beams between the further optical element(s) and a component surface to be processed, and the part beams are focused such that they are incident onto the surface of the component at a common position at an angle of incidence β with respect to the optical axis of the laser beam. The distance d1 between the optical elements is changed to change the interference period.

The present disclosure disclosed an ultraviolet laser 3D printing method for the precise temperature control of polymer material and device thereof. The device comprises a thermostat, a laser head, a non-contact type temperature monitoring device, a scanning galvanometer, a processing platform, a powder laying device, a material to be processed, a computer control system and so on. The method comprises: presetting a processing temperature by the control system; during the processing procedure, the temperature rise condition of the processed object is monitored by the non-contact type temperature monitoring device and fed back in real time to the control system; and by recording the rise value of the temperature within a certain period, the system can obtain the absorption capability of the laser and the temperature rise degree of the processed material, so that the laser output power can be calculated according to the preset processing temperature value, and the laser power can be adjusted in real time to precisely control the processing temperature. By means of the above device and method, precise temperature control of ultraviolet laser 3D printing prototyping for polymer materials can be realized.

A laser welding apparatus includes a laser head for irradiating laser beams transferred through a plurality of transferring optical fibers to a processing target connected thereto via a connector, wherein the laser head includes an optical fiber block having an accommodating space for accommodating the plurality of transferring optical fibers to be arranged along a first direction, and an optical system disposed in front of the optical fiber block and irradiating the laser beams transferred through the plurality of transferring optical fibers to the processing target.