B23K26/0732

METHOD FOR COATING METAL WORKPIECES
20250353114 · 2025-11-20 ·

A method for coating a metal workpiece by laser deposition welding includes moving the workpiece to be coated, and irradiating a surface of the workpiece by at least one laser beam to generate at least a first irradiation zone and a second irradiation zone on the surface of the workpiece. The second irradiation zone precedes or follows the first irradiation zone along a machining direction. The method further includes introducing a powdery additional material into the first irradiation zone. The additional material at least partially enters the at least one laser beam before impinging on the surface of the workpiece and thereby is at least partially heated.

Apparatus for Laser Annealing and Operating Method Thereof

A method of operating an apparatus for laser annealing, includes reducing temporal or spatial coherency of a plurality of laser beams by beam superimposing; and reducing an electric field inner product magnitude of beams having the reduced temporal or spatial coherency by a fly eye lens array to reduce coherency, and/or by modifying a polarization state between the beams by beam superimposing.

Atomic layer etch systems for selectively etching with halogen-based compounds

A substrate processing system includes a processing chamber, a substrate support, a heat source, a gas delivery system and a controller. The substrate support is disposed in the processing chamber and supports a substrate. The heat source heats the substrate. The gas delivery system supplies a process gas to the processing chamber. The controller controls the gas delivery system and the heat source to iteratively perform an isotropic atomic layer etch process including: during an iteration of the isotropic atomic layer etch process, performing pretreatment, atomistic adsorption, and pulsed thermal annealing; during the atomistic adsorption, exposing a surface of the substrate to the process gas including a halogen species that is selectively adsorbed onto an exposed material of the substrate to form a modified material; and during the pulsed thermal annealing, pulsing the heat source multiple times within a predetermined period to expose and remove the modified material.

Laser reflow apparatus and laser reflow method

The laser reflow apparatus of the present invention comprises a laser pressurization head module for pressing a bonding object, which includes a plurality of electronic components arranged on a substrate by a transmissive pressurization member while irradiating a laser beam through the pressurization member, to bond the electronic components to the substrate; and a bonding object transfer module for transferring the bonding object having transferred from one side of the laser pressurization head module to carry the bonding object to the other side thereof after passing through a reflow process of the laser pressurized head module.